JPS59155923A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS59155923A
JPS59155923A JP58031113A JP3111383A JPS59155923A JP S59155923 A JPS59155923 A JP S59155923A JP 58031113 A JP58031113 A JP 58031113A JP 3111383 A JP3111383 A JP 3111383A JP S59155923 A JPS59155923 A JP S59155923A
Authority
JP
Japan
Prior art keywords
resin
layer
resin layer
film
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58031113A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0425694B2 (enrdf_load_stackoverflow
Inventor
Kazuhiko Tsuji
和彦 辻
Masaru Sasago
勝 笹子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58031113A priority Critical patent/JPS59155923A/ja
Publication of JPS59155923A publication Critical patent/JPS59155923A/ja
Publication of JPH0425694B2 publication Critical patent/JPH0425694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58031113A 1983-02-25 1983-02-25 半導体装置の製造方法 Granted JPS59155923A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58031113A JPS59155923A (ja) 1983-02-25 1983-02-25 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58031113A JPS59155923A (ja) 1983-02-25 1983-02-25 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS59155923A true JPS59155923A (ja) 1984-09-05
JPH0425694B2 JPH0425694B2 (enrdf_load_stackoverflow) 1992-05-01

Family

ID=12322342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58031113A Granted JPS59155923A (ja) 1983-02-25 1983-02-25 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS59155923A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0425694B2 (enrdf_load_stackoverflow) 1992-05-01

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