JPS5914641A - シリコ−ン系被覆の形成方法 - Google Patents
シリコ−ン系被覆の形成方法Info
- Publication number
- JPS5914641A JPS5914641A JP57123914A JP12391482A JPS5914641A JP S5914641 A JPS5914641 A JP S5914641A JP 57123914 A JP57123914 A JP 57123914A JP 12391482 A JP12391482 A JP 12391482A JP S5914641 A JPS5914641 A JP S5914641A
- Authority
- JP
- Japan
- Prior art keywords
- silicone
- coating
- film
- group
- baking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
- H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57123914A JPS5914641A (ja) | 1982-07-16 | 1982-07-16 | シリコ−ン系被覆の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57123914A JPS5914641A (ja) | 1982-07-16 | 1982-07-16 | シリコ−ン系被覆の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5914641A true JPS5914641A (ja) | 1984-01-25 |
| JPH0226778B2 JPH0226778B2 (https=) | 1990-06-12 |
Family
ID=14872463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57123914A Granted JPS5914641A (ja) | 1982-07-16 | 1982-07-16 | シリコ−ン系被覆の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5914641A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01164323U (https=) * | 1988-04-28 | 1989-11-16 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5550645A (en) * | 1978-10-06 | 1980-04-12 | Hitachi Ltd | Semiconductor device |
| JPS5813632A (ja) * | 1981-07-17 | 1983-01-26 | Japan Synthetic Rubber Co Ltd | 耐熱性薄膜形成能を有するラダ−状低級アルキルポリシルセスキオキサン |
-
1982
- 1982-07-16 JP JP57123914A patent/JPS5914641A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5550645A (en) * | 1978-10-06 | 1980-04-12 | Hitachi Ltd | Semiconductor device |
| JPS5813632A (ja) * | 1981-07-17 | 1983-01-26 | Japan Synthetic Rubber Co Ltd | 耐熱性薄膜形成能を有するラダ−状低級アルキルポリシルセスキオキサン |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01164323U (https=) * | 1988-04-28 | 1989-11-16 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0226778B2 (https=) | 1990-06-12 |
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