JPS5913341A - 試料の搬送位置決め方法 - Google Patents

試料の搬送位置決め方法

Info

Publication number
JPS5913341A
JPS5913341A JP57121202A JP12120282A JPS5913341A JP S5913341 A JPS5913341 A JP S5913341A JP 57121202 A JP57121202 A JP 57121202A JP 12120282 A JP12120282 A JP 12120282A JP S5913341 A JPS5913341 A JP S5913341A
Authority
JP
Japan
Prior art keywords
cassette
sample
vacuum chuck
arm
stopper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57121202A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0550137B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Toru Tojo
東条　徹
Kazuyoshi Sugihara
和佳 杉原
Mitsuo Tabata
光雄 田畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP57121202A priority Critical patent/JPS5913341A/ja
Publication of JPS5913341A publication Critical patent/JPS5913341A/ja
Publication of JPH0550137B2 publication Critical patent/JPH0550137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Jigs For Machine Tools (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP57121202A 1982-07-14 1982-07-14 試料の搬送位置決め方法 Granted JPS5913341A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57121202A JPS5913341A (ja) 1982-07-14 1982-07-14 試料の搬送位置決め方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57121202A JPS5913341A (ja) 1982-07-14 1982-07-14 試料の搬送位置決め方法

Publications (2)

Publication Number Publication Date
JPS5913341A true JPS5913341A (ja) 1984-01-24
JPH0550137B2 JPH0550137B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-07-28

Family

ID=14805387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57121202A Granted JPS5913341A (ja) 1982-07-14 1982-07-14 試料の搬送位置決め方法

Country Status (1)

Country Link
JP (1) JPS5913341A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263997A (ja) * 1989-03-31 1990-10-26 Suzuki Motor Co Ltd 塗装処理装置
JPH032397A (ja) * 1989-05-29 1991-01-08 Suzuki Motor Corp 電着塗装装置
WO2014059725A1 (zh) * 2012-10-17 2014-04-24 深圳市华星光电技术有限公司 基板传送系统以及基板定位装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4820790U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1971-07-13 1973-03-09
JPS5066174A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-10-12 1975-06-04
JPS5435652U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1977-08-15 1979-03-08
JPS5453369U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1977-09-20 1979-04-13

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4820790U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1971-07-13 1973-03-09
JPS5066174A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-10-12 1975-06-04
JPS5435652U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1977-08-15 1979-03-08
JPS5453369U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1977-09-20 1979-04-13

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263997A (ja) * 1989-03-31 1990-10-26 Suzuki Motor Co Ltd 塗装処理装置
JPH032397A (ja) * 1989-05-29 1991-01-08 Suzuki Motor Corp 電着塗装装置
WO2014059725A1 (zh) * 2012-10-17 2014-04-24 深圳市华星光电技术有限公司 基板传送系统以及基板定位装置

Also Published As

Publication number Publication date
JPH0550137B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-07-28

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