JPS59114534A - 感光性ポリエステル樹脂組成物 - Google Patents
感光性ポリエステル樹脂組成物Info
- Publication number
- JPS59114534A JPS59114534A JP22551582A JP22551582A JPS59114534A JP S59114534 A JPS59114534 A JP S59114534A JP 22551582 A JP22551582 A JP 22551582A JP 22551582 A JP22551582 A JP 22551582A JP S59114534 A JPS59114534 A JP S59114534A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- polyester resin
- units
- glycol
- integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Paints Or Removers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22551582A JPS59114534A (ja) | 1982-12-22 | 1982-12-22 | 感光性ポリエステル樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22551582A JPS59114534A (ja) | 1982-12-22 | 1982-12-22 | 感光性ポリエステル樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59114534A true JPS59114534A (ja) | 1984-07-02 |
| JPH0349096B2 JPH0349096B2 (enExample) | 1991-07-26 |
Family
ID=16830518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22551582A Granted JPS59114534A (ja) | 1982-12-22 | 1982-12-22 | 感光性ポリエステル樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59114534A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH076700A (ja) * | 1993-06-16 | 1995-01-10 | Nec Corp | 熱伝導冷却形マイクロ波管装置 |
-
1982
- 1982-12-22 JP JP22551582A patent/JPS59114534A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH076700A (ja) * | 1993-06-16 | 1995-01-10 | Nec Corp | 熱伝導冷却形マイクロ波管装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0349096B2 (enExample) | 1991-07-26 |
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