JPS5899734A - フォト・マスク検査方法及びその装置 - Google Patents

フォト・マスク検査方法及びその装置

Info

Publication number
JPS5899734A
JPS5899734A JP56198905A JP19890581A JPS5899734A JP S5899734 A JPS5899734 A JP S5899734A JP 56198905 A JP56198905 A JP 56198905A JP 19890581 A JP19890581 A JP 19890581A JP S5899734 A JPS5899734 A JP S5899734A
Authority
JP
Japan
Prior art keywords
mask
photo
pattern
photomask
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56198905A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0330811B2 (enExample
Inventor
Shogo Matsui
正五 松井
Kenichi Kobayashi
賢一 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56198905A priority Critical patent/JPS5899734A/ja
Publication of JPS5899734A publication Critical patent/JPS5899734A/ja
Publication of JPH0330811B2 publication Critical patent/JPH0330811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning In General (AREA)
JP56198905A 1981-12-10 1981-12-10 フォト・マスク検査方法及びその装置 Granted JPS5899734A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56198905A JPS5899734A (ja) 1981-12-10 1981-12-10 フォト・マスク検査方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56198905A JPS5899734A (ja) 1981-12-10 1981-12-10 フォト・マスク検査方法及びその装置

Publications (2)

Publication Number Publication Date
JPS5899734A true JPS5899734A (ja) 1983-06-14
JPH0330811B2 JPH0330811B2 (enExample) 1991-05-01

Family

ID=16398888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56198905A Granted JPS5899734A (ja) 1981-12-10 1981-12-10 フォト・マスク検査方法及びその装置

Country Status (1)

Country Link
JP (1) JPS5899734A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110194A (ja) * 1983-11-18 1985-06-15 株式会社ニコン 基板の洗浄装置
JPH0774134A (ja) * 1994-07-19 1995-03-17 Dainippon Screen Mfg Co Ltd 基板洗浄方法及び基板洗浄装置
CN108515035A (zh) * 2018-03-22 2018-09-11 林雪莲 一种音乐教学用口琴清洗设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5588327A (en) * 1978-12-27 1980-07-04 Hitachi Ltd Inspection device for flaw of mask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5588327A (en) * 1978-12-27 1980-07-04 Hitachi Ltd Inspection device for flaw of mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110194A (ja) * 1983-11-18 1985-06-15 株式会社ニコン 基板の洗浄装置
JPH0774134A (ja) * 1994-07-19 1995-03-17 Dainippon Screen Mfg Co Ltd 基板洗浄方法及び基板洗浄装置
CN108515035A (zh) * 2018-03-22 2018-09-11 林雪莲 一种音乐教学用口琴清洗设备

Also Published As

Publication number Publication date
JPH0330811B2 (enExample) 1991-05-01

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