JPS5588327A - Inspection device for flaw of mask - Google Patents

Inspection device for flaw of mask

Info

Publication number
JPS5588327A
JPS5588327A JP15987378A JP15987378A JPS5588327A JP S5588327 A JPS5588327 A JP S5588327A JP 15987378 A JP15987378 A JP 15987378A JP 15987378 A JP15987378 A JP 15987378A JP S5588327 A JPS5588327 A JP S5588327A
Authority
JP
Japan
Prior art keywords
photomask
stage
flaw
ground glass
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15987378A
Other languages
Japanese (ja)
Other versions
JPS6130731B2 (en
Inventor
Tamotsu Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15987378A priority Critical patent/JPS5588327A/en
Publication of JPS5588327A publication Critical patent/JPS5588327A/en
Publication of JPS6130731B2 publication Critical patent/JPS6130731B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE: To detect only such a flaw as is larger than desired by providing a scattering unit like ground glass on a main surface side in a device to detect luminous parts generated on the main surface of a photomask by irradiating a beam to the end of a light-transmissive substrate of the photomask.
CONSTITUTION: A mask inspection device comprises a control box 1, a stage 3 to provide a photomask 2 thereon, a tubular cover 4 to prevent the ambient beam from coming onto the top of the photomask on the stage, and a lamp house 5 enclosing a lamp. A tungsten lamp 7 in the lamp house feeds a white beam to the photomask 2 through a projection port 16. There is arranged a ground glass 16 closely and in parallel over the stage 3. By arranging so, a luminous part relating to such a small flaw which to exerts no influence on the mask function is gradated by the ground glass, therefore only such luminous part which should be checked by the inspection can easily be observed through scattering and enlarging.
COPYRIGHT: (C)1980,JPO&Japio
JP15987378A 1978-12-27 1978-12-27 Inspection device for flaw of mask Granted JPS5588327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15987378A JPS5588327A (en) 1978-12-27 1978-12-27 Inspection device for flaw of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15987378A JPS5588327A (en) 1978-12-27 1978-12-27 Inspection device for flaw of mask

Publications (2)

Publication Number Publication Date
JPS5588327A true JPS5588327A (en) 1980-07-04
JPS6130731B2 JPS6130731B2 (en) 1986-07-15

Family

ID=15703062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15987378A Granted JPS5588327A (en) 1978-12-27 1978-12-27 Inspection device for flaw of mask

Country Status (1)

Country Link
JP (1) JPS5588327A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5899734A (en) * 1981-12-10 1983-06-14 Fujitsu Ltd Method and apparatus for inspecting photomask
US5306345A (en) * 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5899734A (en) * 1981-12-10 1983-06-14 Fujitsu Ltd Method and apparatus for inspecting photomask
JPH0330811B2 (en) * 1981-12-10 1991-05-01 Fujitsu Ltd
US5306345A (en) * 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers

Also Published As

Publication number Publication date
JPS6130731B2 (en) 1986-07-15

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