JPS5588327A - Inspection device for flaw of mask - Google Patents
Inspection device for flaw of maskInfo
- Publication number
- JPS5588327A JPS5588327A JP15987378A JP15987378A JPS5588327A JP S5588327 A JPS5588327 A JP S5588327A JP 15987378 A JP15987378 A JP 15987378A JP 15987378 A JP15987378 A JP 15987378A JP S5588327 A JPS5588327 A JP S5588327A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- stage
- flaw
- ground glass
- lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
PURPOSE: To detect only such a flaw as is larger than desired by providing a scattering unit like ground glass on a main surface side in a device to detect luminous parts generated on the main surface of a photomask by irradiating a beam to the end of a light-transmissive substrate of the photomask.
CONSTITUTION: A mask inspection device comprises a control box 1, a stage 3 to provide a photomask 2 thereon, a tubular cover 4 to prevent the ambient beam from coming onto the top of the photomask on the stage, and a lamp house 5 enclosing a lamp. A tungsten lamp 7 in the lamp house feeds a white beam to the photomask 2 through a projection port 16. There is arranged a ground glass 16 closely and in parallel over the stage 3. By arranging so, a luminous part relating to such a small flaw which to exerts no influence on the mask function is gradated by the ground glass, therefore only such luminous part which should be checked by the inspection can easily be observed through scattering and enlarging.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15987378A JPS5588327A (en) | 1978-12-27 | 1978-12-27 | Inspection device for flaw of mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15987378A JPS5588327A (en) | 1978-12-27 | 1978-12-27 | Inspection device for flaw of mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5588327A true JPS5588327A (en) | 1980-07-04 |
JPS6130731B2 JPS6130731B2 (en) | 1986-07-15 |
Family
ID=15703062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15987378A Granted JPS5588327A (en) | 1978-12-27 | 1978-12-27 | Inspection device for flaw of mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5588327A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5899734A (en) * | 1981-12-10 | 1983-06-14 | Fujitsu Ltd | Method and apparatus for inspecting photomask |
US5306345A (en) * | 1992-08-25 | 1994-04-26 | Particle Solutions | Deposition chamber for deposition of particles on semiconductor wafers |
-
1978
- 1978-12-27 JP JP15987378A patent/JPS5588327A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5899734A (en) * | 1981-12-10 | 1983-06-14 | Fujitsu Ltd | Method and apparatus for inspecting photomask |
JPH0330811B2 (en) * | 1981-12-10 | 1991-05-01 | Fujitsu Ltd | |
US5306345A (en) * | 1992-08-25 | 1994-04-26 | Particle Solutions | Deposition chamber for deposition of particles on semiconductor wafers |
Also Published As
Publication number | Publication date |
---|---|
JPS6130731B2 (en) | 1986-07-15 |
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