JPS589143A - 金属イオンを含まないフオ−トレジスト現像液組成物 - Google Patents

金属イオンを含まないフオ−トレジスト現像液組成物

Info

Publication number
JPS589143A
JPS589143A JP5947782A JP5947782A JPS589143A JP S589143 A JPS589143 A JP S589143A JP 5947782 A JP5947782 A JP 5947782A JP 5947782 A JP5947782 A JP 5947782A JP S589143 A JPS589143 A JP S589143A
Authority
JP
Japan
Prior art keywords
developer composition
composition according
carbon atoms
surfactant
carbons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5947782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0326380B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
ジヨン・ダツドレイ・カウストン
ポ−ル・エドワ−ド・ベツカ−・ジユニア−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22958085&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS589143(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of JPS589143A publication Critical patent/JPS589143A/ja
Publication of JPH0326380B2 publication Critical patent/JPH0326380B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP5947782A 1981-04-10 1982-04-09 金属イオンを含まないフオ−トレジスト現像液組成物 Granted JPS589143A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25291581A 1981-04-10 1981-04-10
US252915 1981-04-10

Publications (2)

Publication Number Publication Date
JPS589143A true JPS589143A (ja) 1983-01-19
JPH0326380B2 JPH0326380B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-10

Family

ID=22958085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5947782A Granted JPS589143A (ja) 1981-04-10 1982-04-09 金属イオンを含まないフオ−トレジスト現像液組成物

Country Status (3)

Country Link
EP (1) EP0062733B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS589143A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3268203D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58150949A (ja) * 1982-01-21 1983-09-07 イ−ストマン　コダック　カンパニ− ポジ型感光性組成物用の現像溶液
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
JPS60254043A (ja) * 1984-05-30 1985-12-14 Yotsukaichi Gosei Kk ポジ型感光材料用現像剤
JPS61151537A (ja) * 1984-12-25 1986-07-10 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液
JPS62175757A (ja) * 1986-01-29 1987-08-01 Konishiroku Photo Ind Co Ltd 感光性平版印刷版の現像液及び現像方法
JPS636026A (ja) * 1986-06-27 1988-01-12 Nippon Zeon Co Ltd ノボラツク樹脂の精製方法
JPS63131137A (ja) * 1986-11-21 1988-06-03 オーシージー　マイクロエレクトロニック　マテリアルズ　インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液
US4833067A (en) * 1985-08-06 1989-05-23 Tokyo Ohka Kogyo Co., Ltd. Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3230171A1 (de) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
JPS59220732A (ja) * 1983-05-31 1984-12-12 Toshiba Corp フオトレジスト現像液
US4556629A (en) * 1983-12-21 1985-12-03 Morton Thiokol, Inc. Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
DE3580827D1 (de) * 1984-10-09 1991-01-17 Hoechst Japan K K Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen.
US4710449A (en) * 1986-01-29 1987-12-01 Petrarch Systems, Inc. High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
US4806453A (en) * 1986-05-07 1989-02-21 Shipley Company Inc. Positive acting bilayer photoresist development
DE3638629A1 (de) * 1986-11-11 1988-05-26 Schering Ag Mittel und verfahren zur entfernung von fotoresisten
GB2226150A (en) * 1988-12-15 1990-06-20 Nordisk Tidningsplat Ab A developer for use with lithographic printing plates
JP2670711B2 (ja) * 1990-05-29 1997-10-29 富士写真フイルム株式会社 ネガ型感光性樹脂組成物用現像液
GB9404301D0 (en) * 1994-03-04 1994-04-20 Atotech Uk Limited Stripper compositions and their use

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5264877A (en) * 1975-11-26 1977-05-28 Toshiba Corp Production of semiconductor device
JPS5351971A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor
JPS5474432A (en) * 1977-10-25 1979-06-14 Eastman Kodak Co Method of developing photosensitive quinone diazide composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5264877A (en) * 1975-11-26 1977-05-28 Toshiba Corp Production of semiconductor device
JPS5351971A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor
JPS5474432A (en) * 1977-10-25 1979-06-14 Eastman Kodak Co Method of developing photosensitive quinone diazide composition

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58150949A (ja) * 1982-01-21 1983-09-07 イ−ストマン　コダック　カンパニ− ポジ型感光性組成物用の現像溶液
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
JPS60254043A (ja) * 1984-05-30 1985-12-14 Yotsukaichi Gosei Kk ポジ型感光材料用現像剤
JPS61151537A (ja) * 1984-12-25 1986-07-10 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液
US4833067A (en) * 1985-08-06 1989-05-23 Tokyo Ohka Kogyo Co., Ltd. Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant
JPS62175757A (ja) * 1986-01-29 1987-08-01 Konishiroku Photo Ind Co Ltd 感光性平版印刷版の現像液及び現像方法
JPS636026A (ja) * 1986-06-27 1988-01-12 Nippon Zeon Co Ltd ノボラツク樹脂の精製方法
JPS63131137A (ja) * 1986-11-21 1988-06-03 オーシージー　マイクロエレクトロニック　マテリアルズ　インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液

Also Published As

Publication number Publication date
EP0062733B1 (en) 1986-01-02
EP0062733A1 (en) 1982-10-20
DE3268203D1 (en) 1986-02-13
JPH0326380B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-10

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