JPS5880545A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS5880545A
JPS5880545A JP56178988A JP17898881A JPS5880545A JP S5880545 A JPS5880545 A JP S5880545A JP 56178988 A JP56178988 A JP 56178988A JP 17898881 A JP17898881 A JP 17898881A JP S5880545 A JPS5880545 A JP S5880545A
Authority
JP
Japan
Prior art keywords
light
reticle
foreign object
foreign matter
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56178988A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0326379B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Nobuyuki Akiyama
秋山　伸幸
Mitsuyoshi Koizumi
小泉　光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56178988A priority Critical patent/JPS5880545A/ja
Publication of JPS5880545A publication Critical patent/JPS5880545A/ja
Publication of JPH0326379B2 publication Critical patent/JPH0326379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP56178988A 1981-11-10 1981-11-10 縮小投影露光装置 Granted JPS5880545A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56178988A JPS5880545A (ja) 1981-11-10 1981-11-10 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56178988A JPS5880545A (ja) 1981-11-10 1981-11-10 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS5880545A true JPS5880545A (ja) 1983-05-14
JPH0326379B2 JPH0326379B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-10

Family

ID=16058144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56178988A Granted JPS5880545A (ja) 1981-11-10 1981-11-10 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS5880545A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008519965A (ja) * 2004-11-12 2008-06-12 ブイエフエス・テクノロジーズ・リミテッド 粒子検出器、システムおよび方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008519965A (ja) * 2004-11-12 2008-06-12 ブイエフエス・テクノロジーズ・リミテッド 粒子検出器、システムおよび方法

Also Published As

Publication number Publication date
JPH0326379B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-04-10

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