JPH0326379B2 - - Google Patents
Info
- Publication number
- JPH0326379B2 JPH0326379B2 JP56178988A JP17898881A JPH0326379B2 JP H0326379 B2 JPH0326379 B2 JP H0326379B2 JP 56178988 A JP56178988 A JP 56178988A JP 17898881 A JP17898881 A JP 17898881A JP H0326379 B2 JPH0326379 B2 JP H0326379B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- reticle
- optical system
- exposure
- foreign matter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56178988A JPS5880545A (ja) | 1981-11-10 | 1981-11-10 | 縮小投影露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56178988A JPS5880545A (ja) | 1981-11-10 | 1981-11-10 | 縮小投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5880545A JPS5880545A (ja) | 1983-05-14 |
| JPH0326379B2 true JPH0326379B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-04-10 |
Family
ID=16058144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56178988A Granted JPS5880545A (ja) | 1981-11-10 | 1981-11-10 | 縮小投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5880545A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101311487B1 (ko) * | 2004-11-12 | 2013-09-25 | 엑스트랄리스 테크놀로지스 엘티디. | 입자 검출기, 시스템 및 방법 |
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1981
- 1981-11-10 JP JP56178988A patent/JPS5880545A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5880545A (ja) | 1983-05-14 |