JPS5880545A - Method and device for detecting foreign matter - Google Patents

Method and device for detecting foreign matter

Info

Publication number
JPS5880545A
JPS5880545A JP56178988A JP17898881A JPS5880545A JP S5880545 A JPS5880545 A JP S5880545A JP 56178988 A JP56178988 A JP 56178988A JP 17898881 A JP17898881 A JP 17898881A JP S5880545 A JPS5880545 A JP S5880545A
Authority
JP
Japan
Prior art keywords
light
reticle
foreign object
foreign matter
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56178988A
Other languages
Japanese (ja)
Other versions
JPH0326379B2 (en
Inventor
Nobuyuki Akiyama
秋山 伸幸
Mitsuyoshi Koizumi
小泉 光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56178988A priority Critical patent/JPS5880545A/en
Publication of JPS5880545A publication Critical patent/JPS5880545A/en
Publication of JPH0326379B2 publication Critical patent/JPH0326379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Abstract

PURPOSE:To detect the presence or absence of foreign matter after setting of a reticle in an exposure optical path by retreating a filter and an exposure control means from the optical path when foreign matter is detected and using the light from the light source directly as illuminating light for detection of foreign matter. CONSTITUTION:Light of a mercury arc lamp 1 of a foreign matter detector irradiates the surface of a reticle 7 by passing through a condenser lens 2, a mirror 5 and a condenser lens 6. When foreign matter 11 exists on the surface of the reticle 7, the irradiating light falls onto the matter 11 and generates reflected and scattered light. Therefore, plural pieces of photoelectric detectors 16 are provided on the upper side of the reticle 7. The reflected and scattered light is detected by the detectors 16 and the electric signals corresponding to said light are compared with a set value, whereby the presence of absence of the foreign matter is detected. It is possible to detect the presence or absence of the stuck foreign matter after setting the reticle in the exposure optical path by keeping the photodetectors 16 retreated from the exposure optical path during exposure.

Description

【発明の詳細な説明】 本発明は縮小投影式露光装置のレチクルに付着する異物
ン検出てる方法及び装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for detecting foreign matter adhering to a reticle of a reduction projection type exposure apparatus.

縮小投影式露光装置とは回路パターンを有する乾板であ
るレチクルに光を透過させて、ウェハのホトレジスト上
に回路パターンを縮小【、て投影露光させる装置である
。縮小投影式露光装置の構成を第1図に基づいて説明す
る。
A reduction projection exposure apparatus is an apparatus that transmits light through a reticle, which is a dry plate having a circuit pattern, to reduce and project the circuit pattern onto a photoresist on a wafer. The configuration of the reduction projection type exposure apparatus will be explained based on FIG. 1.

光源の水銀灯lよりの光はコンデンサレンズ2、単色光
とする為の干渉フィルタ3、絞シ4、ミラ5、コンデン
サレンズ61に通り、回路パター77Aを有する乾板で
あるレチクル7を照射する。回路パターン7Aは縮小投
影レンズ8で動小さねてウェハ9のホトレジスト上に投
影露光される。この際1回に露光される面積はチップ1
個分であるので、ウェハ9 f x 、 y方向に動か
して、1チップ分づつMyfiTることにより、ウニへ
9全体を露光する。
Light from a mercury lamp 1 as a light source passes through a condenser lens 2, an interference filter 3 for monochromatic light, an aperture 4, a mirror 5, and a condenser lens 61, and illuminates a reticle 7, which is a dry plate having a circuit pattern 77A. The circuit pattern 7A is reduced in size by a reduction projection lens 8 and projected onto the photoresist on the wafer 9. At this time, the area exposed at one time is 1 chip.
Since the wafer 9 is moved in the f x and y directions and MyfiT is applied one chip at a time, the entire surface of the wafer 9 is exposed to light.

この際に、レチクル7上に異物が付着している場合は、
露光光が゛遮断されるので、異物の付着個所に相当する
パターンの投影像の個所に露光光が届かず、ウェハの現
象後肢個所にピンホールを生じ、該ウェハが不良品とな
る。しかも、ウェハの各チップ部分は連続して自動的に
露光されるので、異物の付着を見逃すと全チップが不良
となる。従って、レチクル上の付着異物を常時検査し、
露光中に異物が付着したら、i[ちに警報を発し、露光
な中止Tると共に、レチクルを交換することが望まtす
る。
At this time, if there is a foreign object on the reticle 7,
Since the exposure light is blocked, the exposure light does not reach the area of the projected image of the pattern corresponding to the area to which the foreign matter has adhered, and pinholes are formed at the hind limbs of the wafer, resulting in the wafer being defective. Furthermore, since each chip portion of the wafer is automatically and continuously exposed, if foreign matter is overlooked, all chips will be defective. Therefore, we constantly inspect the reticle for foreign matter,
If foreign matter adheres during exposure, it is desirable to immediately issue an alarm, stop the exposure, and replace the reticle.

従来のこの種の異物検出装置としては、米国GCA社の
動小投影式自動マスクアライナ「DsW」に採用してい
る異物検出装置がある。この装置のm要ン第2図に示T
0第2図から明らかなように、レチクル7上の異物11
の有無の検出を、レチクル7の露光光路への搬入途中で
行っている。即ち、レチクル7の搬入路の上方にレーザ
発振器12を1dき、集光レンズ13でレーザ光を搬入
さhるレチクル7の表面に集光させるようにしである。
As a conventional foreign matter detection device of this type, there is a foreign matter detection device employed in a moving small projection type automatic mask aligner "DsW" manufactured by GCA of the United States. The main features of this device are shown in Figure 2.
0 As is clear from FIG. 2, a foreign object 11 on the reticle 7
Detection of the presence or absence of the reticle 7 is performed while the reticle 7 is being carried into the exposure optical path. That is, a laser oscillator 12 is placed 1d above the path for carrying in the reticle 7, and a condensing lens 13 focuses the laser beam onto the surface of the reticle 7 into which it is carried.

異物11乞付着したレチクル7が搬入され、異物11が
レーザ集光点の真下に来ると、レーザ光は異物に反射し
て散乱する。集光点の周辺にレンズ14と光−受光素子
15を設け、光電受光素子15にて散乱光を受光し、光
電受光素子15よりの区気他号により図示せざる検出器
により異物付着の有無を判断表示する。
When the reticle 7 with the foreign object 11 attached thereto is carried in and the foreign object 11 comes directly under the laser focal point, the laser light is reflected by the foreign object and scattered. A lens 14 and a light-receiving element 15 are provided around the condensing point, and the photoelectric light receiving element 15 receives the scattered light, and a detector (not shown) detects the presence or absence of foreign matter based on the distance from the photoelectric light receiving element 15. Display the judgment.

上記の異物検査装置はレチクル搬入の途中で行うもので
ある為、レチクルヲ露光光路にセットした後の異物を検
出することはできない。然るに、露光中でもレチクル上
に異物が付着するi=J能性がある為に、レチクルを露
光光路にセットした後で異物付着の有無を検出出来る異
物検出装置が望まれている。
Since the above-mentioned foreign object inspection apparatus performs the inspection during the reticle being carried in, it is not possible to detect foreign objects after the reticle is set in the exposure optical path. However, since there is a possibility that foreign matter may adhere to the reticle even during exposure, there is a need for a foreign matter detection device that can detect the presence or absence of foreign matter after the reticle is set on the exposure optical path.

本発明の目的は、上記した従来技術の欠点をな(シ、レ
チクルを露光光路にセットした状態でレチクルに付着し
た異物を検出することができる縮小投影式露光装置のレ
チクルの異物検出方法及び装#を提供Tるにある。
It is an object of the present invention to overcome the above-mentioned drawbacks of the prior art. # is provided in Tru.

本発明による異物検出方法及び装置は、光源からの光を
フィルタにより単色光とTると共に光量を1節して、回
路パターン乞有Tるレチクルを照明l−、ウェハのホト
レジスト上に回路パターン像を縮小投影する縮小投影式
露光装置におけるレチクル上の異物の検出方法及び検出
装置に係るものである・ しかして、本発明による異物検出方法は、異物検出時に
前記フィルタ及び光ta節手段を光路より退去して前記
の光源よりの元をそのまま異物検出用の照明光として用
い、該照明光でレチクル面を照射し、該レチクル面より
の反射散乱光を光電受光素子にて受光し、該素子よりの
出力に基づいて異物の有無を判断することヲ特徴とする
方法である。
The foreign object detection method and apparatus according to the present invention filter light from a light source to monochromatic light and reduce the amount of light to one level, illuminate a reticle with a circuit pattern, and image the circuit pattern on the photoresist of the wafer. This invention relates to a method and apparatus for detecting a foreign object on a reticle in a reduction projection type exposure apparatus that projects a reduced image.The method for detecting a foreign object according to the present invention, when detecting a foreign object, removes the filter and the optical coupling means from the optical path. After moving out, the source from the light source is used as illumination light for foreign object detection, the reticle surface is irradiated with the illumination light, the reflected and scattered light from the reticle surface is received by a photoelectric receiving element, and the light is emitted from the element. This method is characterized by determining the presence or absence of foreign matter based on the output of.

また、本発明による異物検出装置は、異物検出時に前記
フィルタ及び光量調節手段を光路よシ退去して、前記の
光源よりの光をそのまま異物検出用の照明光として用い
、該照明光がレチクル面に到る光路に、該照明光を部分
的に透過する透光手段を有す遮光板を設け、該照明光に
てレチクル面を部分的に照射すると共に、該照射部分を
レチクル全面に移動させる遮光板の走査手段を設け、前
記照射部分に向けられて照射部分の移動と共に移動し、
該レチクル面よりの反射散乱光を受光Tる複数個の光電
受光素子、及び該素子よりの出力に基づいて異物の有無
を判断表示する手段を設けてなることを特徴とする装置
である。
Further, the foreign object detection device according to the present invention removes the filter and the light amount adjusting means from the optical path when detecting a foreign object, and uses the light from the light source as it is as illumination light for foreign object detection, so that the illumination light illuminates the surface of the reticle. A light shielding plate having a light-transmitting means that partially transmits the illumination light is provided on the optical path leading to the illumination light, and the reticle surface is partially irradiated with the illumination light, and the irradiated portion is moved to the entire surface of the reticle. providing a scanning means for a light-shielding plate, which is directed toward the irradiated portion and moves with the movement of the irradiated portion;
This apparatus is characterized by being provided with a plurality of photoelectric light receiving elements that receive reflected and scattered light from the reticle surface, and means for determining and displaying the presence or absence of foreign matter based on the output from the elements.

本発明による異物検出装置の好ましい態様においては、
前記透光手段が、ピンホール又はスリットである。
In a preferred embodiment of the foreign object detection device according to the present invention,
The light transmitting means is a pinhole or a slit.

本発明による異物検出装置の他の好ましい態様において
は、前記透光手段が、レンズを嵌装したピンホール又は
スリットであシ、該レンズが透過光をレチクル表面又は
裏面に集光せしめるようにしである。また、更に好まし
い態様においては、遮光板がレチクルの厚さに相当する
幅で上下に移動可能としである。
In another preferred embodiment of the foreign object detection device according to the present invention, the light transmitting means is a pinhole or a slit fitted with a lens, and the lens focuses the transmitted light on the front or back surface of the reticle. be. Furthermore, in a more preferred embodiment, the light shielding plate is movable up and down by a width corresponding to the thickness of the reticle.

い態様においては前記光゛成骨光素子が、先端にレンズ
、ピンホール板又はスリット板を有している。
In another embodiment, the optical bone optical element has a lens, a pinhole plate, or a slit plate at its tip.

次に、先ず本発明の方法を第3図に基づいて説明する。Next, first, the method of the present invention will be explained based on FIG.

第3図には第1図に示したと同様の縮小投影式結党装置
を水銀灯lよりレチクル7までの部分のみ記載しである
。異物検出用照明光として水銀灯1よりの光をそのまま
使用する。即ち、この側光装置では水銀灯1の光で露光
の為にレチクル7を照射しているが、該露光光は干渉フ
ィルタ3で単色光とし、絞シ4で光量χ調節しであるの
で、その強度は極めて弱い。そこで、異物検出時は、干
渉フィルタ3を矢印のように光路より退去させ、絞り4
Y充分開放して光路を塞がないよ−うにして、水銀灯1
の光をそのまま使用する。
FIG. 3 shows only the portion from the mercury lamp 1 to the reticle 7 of a reduction projection type coalescing device similar to that shown in FIG. The light from the mercury lamp 1 is used as it is as the illumination light for foreign object detection. That is, in this side illumination device, the reticle 7 is irradiated with light from the mercury lamp 1 for exposure, but the exposure light is made into monochromatic light by the interference filter 3, and the light amount χ is adjusted by the diaphragm 4. The strength is extremely weak. Therefore, when detecting a foreign object, the interference filter 3 is moved out of the optical path as shown by the arrow, and the aperture 4 is
Y Make sure to open the mercury lamp 1 sufficiently so as not to block the optical path.
Use the light as is.

水銀灯lの光はコンデンサレンズ2、ミラ5、及びコン
デンサレンズ6を通りレチクル7面を照射Tる。レチク
ル7面に異物11が存在すると、照射光が異物11に当
り反射散乱光を発生する。そこで、レチクル7の上側に
レチクルの照明面に向けて複数個の光電受光素子16を
設けておき、該素子164Cてこの反射散乱光を受光さ
せ、受光量に応する出力電気信号を得る。この出力を検
出器(図示せず)で設定値と比較でることにより異物0
)fi無を検出する。光電受光素子16は露光光路を妨
害l。
The light from the mercury lamp 1 passes through a condenser lens 2, a mirror 5, and a condenser lens 6 and illuminates the reticle 7 surface. If a foreign object 11 exists on the surface of the reticle 7, the irradiated light hits the foreign object 11 and generates reflected and scattered light. Therefore, a plurality of photoelectric light receiving elements 16 are provided above the reticle 7 so as to face the illumination surface of the reticle, and the reflected and scattered light is received by the element 164C, thereby obtaining an output electric signal corresponding to the amount of light received. By comparing this output with the set value using a detector (not shown), it is possible to eliminate foreign particles.
) Detect fi absence. The photoelectric light receiving element 16 obstructs the exposure optical path.

ない個所に設けるか、異物検出後、総光時は露光光路よ
り退去せしめるようにしておくことか必要である。また
、異物検出時は、ウニ/X9上に設けたシャッタ10(
第1図参照)を閉じるか、ウエノ)9を露光光路より退
去せしめておくことは勿論である・ レチクル7上にはクロム等で作られた回路ノくターン7
Aが存在する。回路ノくターン7A O)厚みは薄く、
10μm以下、一般に数μmであり、七〇)縁部は主と
して光の進入方向に平行になっているQ)で、照明光で
レチクル74’照射した場合に、回路ノくターン7Aに
よる反射散乱光も発生するが、そσ)散乱光は弱(背景
光として観察される。従って、異物11の有無の判断は
一個の光電受光素子16Q)異物11よりの散乱光の受
光量と回路ノ(ターン7Aよりの散乱光、即ち背緻光の
受光量との比較により行なわわる。光電受光素子16を
第3図に示すように使用し、光電受光素子16の受光領
域の制限又は照明光の照射領域の制限を行なわない場合
は、光電受光素子16が相当範囲の背景光を受光するこ
とになるので、検出できる異物の大ぎさはこの背景光の
受光量より大な散乱光を発生する(素子が受光できる)
大きさとなる。この大きさは概ね直径Iμm以上である
Either it must be installed in a location where there is no foreign object, or it must be moved out of the exposure optical path during full exposure after foreign matter is detected. In addition, when detecting a foreign object, the shutter 10 (
Of course, it is necessary to close the reticle (see Figure 1) or move the reticle (see Fig. 1) out of the exposure optical path.
A exists. Circuit turn 7A O) The thickness is thin,
10 μm or less, generally several μm, and 70) the edges are mainly parallel to the direction of light entry Q) When the reticle 74' is illuminated with illumination light, reflected and scattered light by the circuit nozzle 7A σ) The scattered light is weak (observed as background light. Therefore, the presence or absence of the foreign object 11 can be determined by the single photoelectric receiving element 16Q) and the amount of scattered light received from the foreign object 11 and the circuit (turn). This is done by comparing the amount of scattered light from 7A, that is, the amount of backlight received.The photoelectric light receiving element 16 is used as shown in FIG. If this restriction is not applied, the photoelectric light receiving element 16 will receive a considerable range of background light, and the size of the foreign object that can be detected will generate scattered light that is larger than the amount of background light received (the element is (Can receive light)
It becomes the size. This size is approximately I μm or more in diameter.

直径側μm以上の異物の検出では検出能力が不充分な場
合は前述の光電受光素子の受光領域の制限又は照明光の
照射領域の制4821−行う。このように制限を行なっ
た検出方法については、次の本発明の詳細な説明より自
から明らかにされるであろう。
If the detection ability is insufficient to detect a foreign substance with a diameter of μm or more, the above-mentioned restriction of the light receiving area of the photoelectric receiving element or restriction of the illumination light irradiation area is carried out. The detection method with such limitations will become clear from the detailed description of the invention that follows.

次に本発明の装置を実施例を示す第4図及び第5図に基
づいて説明する。この実施例の装置は、本発明の方法を
照射光の照射領域を制限して実施する装置である。勿論
、この装置においても、異物検出時には干渉フィルタ及
び絞シを光路より退去させて、水銀灯ようの光を異物検
出用の照明光11#I として使用する。照明光がレチクル7面に到る光路の、
コンデンサレンズ6とレチクル7の間に照明光を部分的
に透過する透光手段を有する遮光仮題を配置しである。
Next, the apparatus of the present invention will be explained based on FIGS. 4 and 5 showing an embodiment. The apparatus of this embodiment is an apparatus that implements the method of the present invention by limiting the irradiation area of the irradiation light. Of course, in this device as well, when detecting a foreign object, the interference filter and the diaphragm are removed from the optical path, and the light from the mercury lamp is used as the illumination light 11#I for detecting the foreign object. The optical path where the illumination light reaches the 7 surfaces of the reticle,
A light-shielding tent having a light-transmitting means that partially transmits illumination light is arranged between the condenser lens 6 and the reticle 7.

遮光板側は片側を直線ガイド19で支持され、レチクル
7に平行にレチクルの一方の方向、例えばY方向(矢印
21で示す。)に移動可能とされ、更に露光光路より退
去出来るよう透光手段として、第4図P装置では、遮光
板側の移動方向21に直角で、レチクル7の幅を超える
リットnにシリンドリカルレンズ23Y嵌装した透光手
段が設けである。シリンドリカルレンズ乙は透過光をレ
チクル7の表面又は裏面に集光せしめるようにしである
。第5図の装置においてはレチクル7の表面に集光せし
めるようにしである。
The light shielding plate side is supported on one side by a linear guide 19, and is movable parallel to the reticle 7 in one direction of the reticle, for example, the Y direction (indicated by an arrow 21), and is further provided with a light transmitting means so that it can be moved out of the exposure optical path. In the device shown in FIG. 4, a light-transmitting means is provided in which a cylindrical lens 23Y is fitted in a slit n that is perpendicular to the movement direction 21 on the light-shielding plate side and that exceeds the width of the reticle 7. The cylindrical lens B is designed to focus the transmitted light onto the front or back surface of the reticle 7. In the apparatus shown in FIG. 5, the light is focused on the surface of the reticle 7.

シリンドリカルレンズるより集光されたレチクル7の表
面の帯状光を符号スで示しである。
The band-shaped light on the surface of the reticle 7, which is focused by the cylindrical lens, is indicated by the symbol S.

また遮光仮題の下面には、スリブ)22又はシリよるレ
チクル7の照明部分に向けて複数個の光電受光素子16
が取付けである。また、図示してないが、これらの装置
には光′成受光素子16よりの電気信号を入力し5、入
力値を設定値と比較することにより異物の有無を検出し
、こtiv表示する検出器が設けられである。
In addition, on the lower surface of the light-shielding tentative title, a plurality of photoelectric light receiving elements 16 are arranged toward the illuminated part of the reticle 7 by a sleeve 22 or a sill.
is the installation. In addition, although not shown in the figure, an electrical signal from the light-generating light-receiving element 16 is input to these devices 5, and the presence or absence of a foreign object is detected by comparing the input value with a set value. A container is provided.

第4図の装置においては、レチクル7は遮光板側の一動
位置毎に、スリット〃の巾の光束によシミ15分的に照
射される。従って回路パターンに反射して生じる散乱光
、即ち背景光は著しく低減され、−個の光電受光素子1
6に、より受光される背景光の光電が低減される。従つ
゛て異物が存在するときは、異物による散乱光の強度が
小さJとも、即ち異物の大きさが小さくとも、異物の有
無を検出することができる。また、遮光板20 Y、 
2]の方向に片道移動することにより、レチクル7の全
面を走査し、全面に亘り異物□、Qi有無を検出するこ
とができる。   lこの装置によるときは、スリット
四の幅其他の条件にもよるが、概ね加μm以上の異物を
完全に検出することができる。
In the apparatus shown in FIG. 4, the reticle 7 is irradiated with a light beam having the width of the slit for 15 minutes at each moving position on the light shielding plate side. Therefore, the scattered light reflected on the circuit pattern, that is, the background light, is significantly reduced, and - photoelectric receiving elements 1
6, the photoelectricity of the background light received is reduced. Therefore, when a foreign object is present, the presence or absence of the foreign object can be detected even if the intensity of the light scattered by the foreign object is small, that is, even if the size of the foreign object is small. In addition, the light shielding plate 20Y,
By moving one way in the direction 2], the entire surface of the reticle 7 can be scanned, and the presence or absence of foreign matter □ and Qi can be detected over the entire surface. 1 When using this device, it is possible to completely detect foreign matter of about 1 μm or more, although it depends on the width of the slit 4 and other conditions.

第5図の装置においては、レチクル7は遮光板側の移動
位置毎に帯状光Uの狭い幅の領域で部分的に照射される
。しかしながら、帯状光24Fiスリツトρの巾の光束
をシリンドリカルレンズおで集光して形成されたもので
あるので、帯状党別の全体としての光量は、レンズ器が
ない場合のスリット四の透過光量に等しく(レンズによ
る吸収等がないとする。)、帯状党別の照度は、レンズ
おがない場合の透過光の照射帯の照度より大きい。従っ
て、光電受光素子16の背景光の受光量は、第4図の装
置の場合と殆んど変らないが、異物が存在した場合に、
異物を照射する光が強くなっているので、その反射散乱
光が強くなり、更に小さな異物をも検出することができ
る。この装置では・スリット幅その他の案件によるが、
概ね5/Jm以上の異物を完全に検出することができる
In the apparatus shown in FIG. 5, the reticle 7 is partially irradiated with a narrow region of the band-shaped light U at each moving position on the light-shielding plate side. However, since the band-shaped light is formed by condensing the light beam with a width of 24 Fi slit ρ using a cylindrical lens, the overall light amount for each band is equal to the amount of light transmitted through slit 4 without a lens device. Equally (assuming there is no absorption by the lens, etc.), the illuminance of each band is greater than the illuminance of the irradiation band of the transmitted light when there is no lens. Therefore, the amount of background light received by the photoelectric light receiving element 16 is almost the same as in the case of the device shown in FIG. 4, but if a foreign object is present,
Since the light irradiating the foreign object becomes stronger, the reflected and scattered light becomes stronger, making it possible to detect even smaller foreign objects. With this device, depending on the slit width and other matters,
Foreign matter of approximately 5/Jm or more can be completely detected.

第5図の装置においては、シリンドリカルレンズ乙の東
元位置をレチクル7の表面としである。
In the apparatus shown in FIG. 5, the eastern position of the cylindrical lens B is the surface of the reticle 7.

この場合、レチクル7表面に異物が付着している14 
 にi とぎは、′該異物より強力な散乱光が発生するので、微
小な異物、例えば5pm以上の異物、!検出できるが、
レチクル7面面に異物が付着しているときは、照射光が
拡がってあたるので、反射拡散光が弱くなり%検出可能
な異物の大きさも、例えば10μm以上と、大きくなる
In this case, if foreign matter is attached to the surface of the reticle 7,
``Because the foreign object generates more powerful scattered light, it is difficult to remove a minute foreign object, for example, a foreign object of 5 pm or more. Although it can be detected,
When a foreign object is attached to the surface of the reticle 7, the irradiation light is spread out and reflected, the diffused light becomes weaker, and the size of the foreign object that can be detected becomes larger, for example, 10 μm or more.

そこで、本発明の装置の一態様においては、レンズ付ス
リットを有する遮光板を・レチクルの厚さに相当Tる幅
で上下に移動可能としである。実施例を第6図に示す。
Therefore, in one embodiment of the apparatus of the present invention, a light shielding plate having a slit with a lens is movable up and down by a width T corresponding to the thickness of the reticle. An example is shown in FIG.

第6図において、遮光板側は直線ガイド19に沿って移
動する遮光板本体20Aに2枚の板ばねあで支持されて
いる。また遮光板側は図示せざ乞手段により板ばねあの
個所でレチクル7の厚さに相当する幅で上下に移動可能
とされている。其他の構成は第5図に示す装置と同じで
ある。第6図では、照射光がシリンドリカルレンズ乙に
よってレチクル7の裏側に集光され、裏側に帯状光5が
形成されている状態を示しである。
In FIG. 6, the light shielding plate side is supported by a light shielding plate main body 20A that moves along a linear guide 19 by two leaf springs. Further, the light shielding plate side can be moved up and down by a width corresponding to the thickness of the reticle 7 at the location where the plate spring is located by means of an urging means (not shown). The other configuration is the same as the device shown in FIG. FIG. 6 shows a state in which the irradiated light is focused on the back side of the reticle 7 by the cylindrical lens B, and a band-shaped light 5 is formed on the back side.

この装置においては、遮光板側の移動の際に、往路と復
路で遮光板Iの高さを変えて移動すれば−往復でレチク
ル7の表と裏についた微小な異物な丁べて検出すること
ができる。また、遮光板21)を上下に移動する方法に
変えて、装着したシリンドリカルレンズ乙の焦点位置の
異なる2個の遮光仮題を使用するか、焦点位置が異なる
シリンドリカルレンズるを嵌着した2個のスリット22
ヲ有する一個の遮光板を使用してもよい。
In this device, when moving the light shielding plate side, if the height of the light shielding plate I is changed in the forward and return trips, minute foreign objects attached to the front and back sides of the reticle 7 can be detected in both directions. be able to. In addition, instead of moving the light shielding plate 21) up and down, it is possible to use two light shielding tentative lenses with different focal positions of the attached cylindrical lens, or to use two light shielding tentative lenses with different focal positions of the attached cylindrical lens. slit 22
A single light-shielding plate may be used.

本発明の装置において、透光手段として前述のスリット
又はシリンドリカルレンズを嵌装したスリットに代えて
円形、短形又は正方形等の孔(ピンホール)としてもよ
い。これらの孔(ピンホール)とするときは、孔の大き
さによるが一般に長孔(スリット)の場合に較べて異物
検出能を高くすることができる。しかしながら遮光板を
XY方向に移動しなければレチクル全面を走査すること
ができない。勿論、レンズには普通のレンズを使用する
。また、一般に光電受光素子の設置台数を少(すること
ができる。異物検出能は光電受光素子の受光する背景光
の光量と異物よりの反射散乱光の光量との差によって決
る。従って異物検出能者を出来るだけ大きくすることが
必要である。受光する背景光の光ltヲ小さくてるため
kは、光電受光素子の受光領域における照明区域を狭く
するか(照度一定条件)、受光領域自身を狭くすればよ
い。長孔の幅を小さくTるとか、長孔を小径の円孔、角
孔等に変えること、この径を出来る丈小さくすることは
照明区域を狭くすることに役立つ。
In the device of the present invention, a circular, rectangular or square hole (pinhole) may be used as the light transmitting means instead of the above-mentioned slit or a slit fitted with a cylindrical lens. When using these holes (pinholes), the foreign matter detection ability can generally be made higher than when using elongated holes (slits), although it depends on the size of the hole. However, the entire surface of the reticle cannot be scanned unless the light shielding plate is moved in the X and Y directions. Of course, use regular lenses. In addition, it is generally possible to reduce the number of photoelectric light-receiving elements installed. The foreign object detection ability is determined by the difference between the amount of background light received by the photoelectric light-receiving element and the amount of reflected and scattered light from the foreign object. Therefore, the foreign object detection ability It is necessary to make the light receiving area as large as possible.In order to reduce the amount of background light to be received, k should be made by narrowing the illumination area in the light receiving area of the photoelectric light receiving element (constant illuminance condition), or narrowing the light receiving area itself. Making the width of the long hole smaller, changing the long hole to a smaller diameter circular hole, square hole, etc., and reducing the diameter as much as possible will help narrow the illuminated area.

一方、これによりレチクルの全面走査操作が逐次面倒に
なる。レンズの使用は照度が大となる故実質的に照明区
域を狭くてることにはならない。また、ft*受元受子
素子光領域自身を狭くすることは、光磁受光素子の先端
にレンズ又はスリット、ピンホール専有する板を設ける
ことにより達成できる〇 異物よりの反射散乱光の光量を大にする為には、照明光
の光度を大とてるしかない。照明光の光源111゜ を強力なものにすれば、それに応じて背景光も大となる
。が、異物よりの反射散乱光との光度の差が大となるの
で異物検出能の向上に′は役立つ。本発明の装置では、
本体の露光装置の光源を使用するが一光度を大とする為
に異物咳出時にはフィルタ及び絞りを除いている。こね
以上強力な照明光ン得る為には、別の光源より光を導入
′しなければならない。このことは装置ン複雑にするの
で不利である。本発明の装置では、上述の処理により充
分な検出能を発揮することができ、更に好まI7い態様
によれば、レンズによシ異物を照射する照明光を更に強
力にすることにより更に検出能馨向上せしめている。
On the other hand, this makes the entire reticle scanning operation progressively more troublesome. The use of lenses does not substantially narrow down the illuminated area since the illuminance is high. In addition, narrowing the light area of the ft* receiver element itself can be achieved by providing a lens, slit, or plate dedicated to a pinhole at the tip of the magneto-optical receiver element.〇The amount of reflected and scattered light from foreign objects can be reduced The only way to make it bigger is to increase the intensity of the illumination light. If the light source 111° of the illumination light is made more powerful, the background light will be increased accordingly. However, since the difference in luminous intensity between the reflected and scattered light from the foreign object becomes large, '' is useful for improving the ability to detect foreign objects. In the device of the present invention,
The light source of the exposure device on the main body is used, but in order to increase the luminous intensity, the filter and diaphragm are removed when a foreign object is coughed up. In order to obtain more powerful illumination light, it is necessary to introduce light from another light source. This has the disadvantage of complicating the device. The apparatus of the present invention can exhibit sufficient detection ability through the above-described processing, and in a further preferred embodiment, the detection ability can be further improved by making the illumination light that illuminates the lens more powerful. It is improving your morale.

以上の如(、本発明の方法及び装置によるときは、縮小
投影式露光装置の露光光路に装着後のレチクル上の異物
付着の有無を随時検出Tることができる。また、他の光
源を使用せず露光装置の光源を利用するので、装置を簡
単にすることができる。しかも優れた検出精度をあげる
ことができ、適切な条件で実施することによりレチクル
表面及び裏面に付着する約5μm以上の異物を検出Tる
ことができる。従って、本発明の方法及び装置により装
着後のレチクルについて、随時又は間欠的に、例えば3
分毎に、異物の有無を検出できるので、不良ウニ八を製
造する虞れが著しく減少し、本発明の方法及び装置によ
り縮小投影式露光装置の付加価値を大幅に向上すること
ができる。
As described above, when using the method and apparatus of the present invention, it is possible to detect at any time the presence or absence of foreign matter on the reticle after it is attached to the exposure optical path of the reduction projection exposure apparatus. Since the light source of the exposure device is used instead of the reticle, the equipment can be simplified.Moreover, it can improve the detection accuracy, and by performing the test under appropriate conditions, it can detect particles of approximately 5 μm or more that adhere to the front and back surfaces of the reticle. Therefore, the method and apparatus of the present invention can be used to detect foreign objects at any time or intermittently, for example, with respect to the reticle after mounting.
Since the presence or absence of foreign matter can be detected every minute, the risk of producing defective products is significantly reduced, and the added value of the reduction projection exposure apparatus can be greatly improved by the method and apparatus of the present invention.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は縮小投射式露光装置の一例の構成図、第2図は
従来の異物検出装置の一例のa要因、第3図は本発明の
異物検出方法の説明の為の原理図、第4図(at 、 
(b)及び第5図ta+ 、 (bl 、 (elは本
発明の装置のそれぞれ異なる実施例の平面図(a図)、
正面図(b図)及び側面図(0図、但し第5図のみ)、
第6図(al 、 (b)は本発明の装置の更に異なる
実施例の正面図(a図)及び側面図(b図)である。 1・・・水m灯、2.6・・・コンデンサレンズ、3・
・・干渉フィルタ、4・・・絞υ、5・・・ミラ、7・
・・レチクル、7A・・・回路パターン、8・・・細′
小投影レンズ、9・・・ウニ八、10・・・シャッタ、
11・・・異物、12,15゜16・・・光゛越受光素
子、19・・・血縁カイト、茄・・・遮光板、n・・・
スリット、n・・・シリンドリカルレンズ、看。 5・・・帯状光、あ・・・板ばね。 第1関 第4図 (a) j14因 (b) 第5図(Φ 第5IIA(b)
FIG. 1 is a configuration diagram of an example of a reduction projection type exposure device, FIG. 2 is a factor a of an example of a conventional foreign object detection device, FIG. 3 is a principle diagram for explaining the foreign object detection method of the present invention, and FIG. Figure (at,
(b) and FIG.
Front view (Figure b) and side view (Figure 0, but only Figure 5),
6(a) and 6(b) are a front view (a) and a side view (b) of still another embodiment of the device of the present invention. 1... Water lamp, 2.6... Condenser lens, 3.
...Interference filter, 4...Aperture υ, 5...Mira, 7.
...Reticle, 7A...Circuit pattern, 8...Fine'
Small projection lens, 9... Sea urchin eight, 10... Shutter,
11... Foreign matter, 12,15° 16... Light transmissive light receiving element, 19... Kin kite, eggplant... Light shielding plate, n...
Slit, n...Cylindrical lens, see. 5... band-shaped light, ah... leaf spring. 1st section Figure 4 (a) j14 cause (b) Figure 5 (Φ 5IIA (b)

Claims (1)

【特許請求の範囲】 1、光源よりの光をフィルタにより単色光と−「ると共
に光景を調節して、回路パターンケ有するレチクル’に
照明し、ウェハのホトレジスト上に回路パターン像を縮
小投影する縮小投影式露光装置におけるレチクル上の異
物の検出方法にお−いて、異物検出時に前記フィルタ及
び光を調節手段を光路より退去して、前記の光源よりの
光をそのまま異物検出用の照明光として用い、該照明光
でレチクル面を照射し、該レチクル面よりの反射散乱光
な光電受光素子にて受光し、該素子よりの出力に基づい
て異−物の有無ン判断することχ特徴とする異物検出方
法。 2、光源よりの光ケフィルタにより単色光とすると共に
光量を調節して、回路パターンを有するレチクルを照明
し、ウェハのホトレジストに回路パターン像を縮小投影
する紬小投影弐鮎光装置におけるレチクル上の異物検出
装置において、異物2.1 検出時に前記フィルタ及び光量調節手段を光路より退去
して、前記の光源よりの光なそのまま異物検出用の照明
光として用い、該照明光がレチクル面に到る光路に、該
照明光を部分的に透過する透光手段を有す遮光板を設け
、該照明光にてレチクル面を部分的に照射すると共に、
該照射部分をレチクル全面に移動させる遮光板の走査手
段を設け、前記照射部分に向けられて照射部分の移動と
共に移動l2、該レチクル面よりの反射散乱光を受光す
る複数個の光電受光素子、及び該素子よりの出力に基づ
いて異物の有無を判断表示する手段を設けてなることを
特徴とする異物検出装置。 3、前記透光手段が、ピンホール又Lスリットである特
許請求の範囲第2項の異物検出装置。 4、前記透光手段が、レンズを嵌装したピンホール又は
スリットであり、該レンズが透過光をレチクル表面又は
裏面に集光せしめるようにしである特許請求の範囲第2
項の異物検出装置。 5、前記遮光板が、レチクルの厚さに相当する幅で上下
に移動可能としである特許請求の範囲第4項の異物検出
装置。 6.前記光電受光素子が、先端にレンズ、ピンホール板
又はスリット板を有する特許請求の範囲第3項、第4項
又は第5項の異物検出装置。
[Claims] 1. Reduction in which the light from the light source is filtered into monochromatic light and the sight is adjusted to illuminate the reticle having the circuit pattern, and the circuit pattern image is reduced and projected onto the photoresist of the wafer. In a method for detecting a foreign object on a reticle in a projection exposure apparatus, when detecting a foreign object, the filter and the light adjusting means are removed from the optical path, and the light from the light source is used as illumination light for detecting the foreign object. , the reticle surface is irradiated with the illumination light, the reflected and scattered light from the reticle surface is received by a photoelectric receiving element, and the presence or absence of a foreign object is determined based on the output from the element. Detection method. 2. The light emitted from the light source is made into monochromatic light by a filter, and the amount of light is adjusted to illuminate a reticle having a circuit pattern, and the circuit pattern image is reduced and projected onto the photoresist of the wafer. In a foreign object detection device on a reticle, when foreign object 2.1 is detected, the filter and light amount adjustment means are removed from the optical path, and the light from the light source is used as it is as illumination light for foreign object detection, and the illumination light is directed to the reticle surface. A light shielding plate having a light-transmitting means that partially transmits the illumination light is provided on the optical path leading to the illumination light, and the reticle surface is partially irradiated with the illumination light, and
a light shielding plate scanning means for moving the irradiated portion over the entire surface of the reticle; a plurality of photoelectric light receiving elements directed toward the irradiated portion and moved along with the movement of the irradiated portion; a plurality of photoelectric light receiving elements that receive reflected and scattered light from the reticle surface; and means for determining and displaying the presence or absence of a foreign object based on the output from the element. 3. The foreign object detection device according to claim 2, wherein the light transmitting means is a pinhole or an L slit. 4. Claim 2, wherein the light transmitting means is a pinhole or a slit fitted with a lens, and the lens focuses transmitted light on the front or back surface of the reticle.
Foreign object detection device. 5. The foreign object detection device according to claim 4, wherein the light shielding plate is movable up and down with a width corresponding to the thickness of the reticle. 6. The foreign object detection device according to claim 3, 4, or 5, wherein the photoelectric light receiving element has a lens, a pinhole plate, or a slit plate at its tip.
JP56178988A 1981-11-10 1981-11-10 Method and device for detecting foreign matter Granted JPS5880545A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56178988A JPS5880545A (en) 1981-11-10 1981-11-10 Method and device for detecting foreign matter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56178988A JPS5880545A (en) 1981-11-10 1981-11-10 Method and device for detecting foreign matter

Publications (2)

Publication Number Publication Date
JPS5880545A true JPS5880545A (en) 1983-05-14
JPH0326379B2 JPH0326379B2 (en) 1991-04-10

Family

ID=16058144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56178988A Granted JPS5880545A (en) 1981-11-10 1981-11-10 Method and device for detecting foreign matter

Country Status (1)

Country Link
JP (1) JPS5880545A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008519965A (en) * 2004-11-12 2008-06-12 ブイエフエス・テクノロジーズ・リミテッド Particle detector, system and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008519965A (en) * 2004-11-12 2008-06-12 ブイエフエス・テクノロジーズ・リミテッド Particle detector, system and method

Also Published As

Publication number Publication date
JPH0326379B2 (en) 1991-04-10

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