JPS5878437A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5878437A
JPS5878437A JP56176912A JP17691281A JPS5878437A JP S5878437 A JPS5878437 A JP S5878437A JP 56176912 A JP56176912 A JP 56176912A JP 17691281 A JP17691281 A JP 17691281A JP S5878437 A JPS5878437 A JP S5878437A
Authority
JP
Japan
Prior art keywords
pattern
semiconductor device
film
element isolation
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56176912A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6160577B2 (index.php
Inventor
Kazuhiko Hashimoto
一彦 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56176912A priority Critical patent/JPS5878437A/ja
Publication of JPS5878437A publication Critical patent/JPS5878437A/ja
Publication of JPS6160577B2 publication Critical patent/JPS6160577B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/0126—
    • H10W10/13—

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP56176912A 1981-11-04 1981-11-04 半導体装置の製造方法 Granted JPS5878437A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56176912A JPS5878437A (ja) 1981-11-04 1981-11-04 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56176912A JPS5878437A (ja) 1981-11-04 1981-11-04 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5878437A true JPS5878437A (ja) 1983-05-12
JPS6160577B2 JPS6160577B2 (index.php) 1986-12-22

Family

ID=16021926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56176912A Granted JPS5878437A (ja) 1981-11-04 1981-11-04 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5878437A (index.php)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4762805A (en) * 1985-12-17 1988-08-09 Advanced Micro Devices, Inc. Nitride-less process for VLSI circuit device isolation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4762805A (en) * 1985-12-17 1988-08-09 Advanced Micro Devices, Inc. Nitride-less process for VLSI circuit device isolation

Also Published As

Publication number Publication date
JPS6160577B2 (index.php) 1986-12-22

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