JPS587628A - 感光性積層構造物 - Google Patents

感光性積層構造物

Info

Publication number
JPS587628A
JPS587628A JP10656481A JP10656481A JPS587628A JP S587628 A JPS587628 A JP S587628A JP 10656481 A JP10656481 A JP 10656481A JP 10656481 A JP10656481 A JP 10656481A JP S587628 A JPS587628 A JP S587628A
Authority
JP
Japan
Prior art keywords
film
layer
polyvinyl alcohol
laminated
photoresist layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10656481A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0136607B2 (enrdf_load_stackoverflow
Inventor
Toshio Marui
丸井 寿雄
Motohide Shimomura
下村 源秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP10656481A priority Critical patent/JPS587628A/ja
Publication of JPS587628A publication Critical patent/JPS587628A/ja
Publication of JPH0136607B2 publication Critical patent/JPH0136607B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP10656481A 1981-07-07 1981-07-07 感光性積層構造物 Granted JPS587628A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10656481A JPS587628A (ja) 1981-07-07 1981-07-07 感光性積層構造物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10656481A JPS587628A (ja) 1981-07-07 1981-07-07 感光性積層構造物

Publications (2)

Publication Number Publication Date
JPS587628A true JPS587628A (ja) 1983-01-17
JPH0136607B2 JPH0136607B2 (enrdf_load_stackoverflow) 1989-08-01

Family

ID=14436782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10656481A Granted JPS587628A (ja) 1981-07-07 1981-07-07 感光性積層構造物

Country Status (1)

Country Link
JP (1) JPS587628A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0136607B2 (enrdf_load_stackoverflow) 1989-08-01

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