JPH0319537B2 - - Google Patents

Info

Publication number
JPH0319537B2
JPH0319537B2 JP56091029A JP9102981A JPH0319537B2 JP H0319537 B2 JPH0319537 B2 JP H0319537B2 JP 56091029 A JP56091029 A JP 56091029A JP 9102981 A JP9102981 A JP 9102981A JP H0319537 B2 JPH0319537 B2 JP H0319537B2
Authority
JP
Japan
Prior art keywords
film
photoresist layer
polyvinyl alcohol
water
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56091029A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57205737A (en
Inventor
Toshio Marui
Motohide Shimomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP9102981A priority Critical patent/JPS57205737A/ja
Publication of JPS57205737A publication Critical patent/JPS57205737A/ja
Publication of JPH0319537B2 publication Critical patent/JPH0319537B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9102981A 1981-06-12 1981-06-12 Photosensitive laminate structure Granted JPS57205737A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9102981A JPS57205737A (en) 1981-06-12 1981-06-12 Photosensitive laminate structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9102981A JPS57205737A (en) 1981-06-12 1981-06-12 Photosensitive laminate structure

Publications (2)

Publication Number Publication Date
JPS57205737A JPS57205737A (en) 1982-12-16
JPH0319537B2 true JPH0319537B2 (enrdf_load_stackoverflow) 1991-03-15

Family

ID=14015088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9102981A Granted JPS57205737A (en) 1981-06-12 1981-06-12 Photosensitive laminate structure

Country Status (1)

Country Link
JP (1) JPS57205737A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS584141A (ja) * 1981-07-01 1983-01-11 Muromachi Kagaku Kogyo Kk 感光性積層体及びその使用方法
JPS61208047A (ja) * 1985-03-11 1986-09-16 Daicel Chem Ind Ltd 導電性膜のパタ−ン形成方法
JPS6275632A (ja) * 1985-09-30 1987-04-07 Daicel Chem Ind Ltd 感光レジスト積層体

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52110010A (en) * 1976-03-12 1977-09-14 Unitika Ltd Method of preventing adhesion of photosensitive resin
JPS5836331B2 (ja) * 1977-07-12 1983-08-09 旭化成株式会社 レジスト像の形成法

Also Published As

Publication number Publication date
JPS57205737A (en) 1982-12-16

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