JPS587628A - Photosensitive laminated structure - Google Patents

Photosensitive laminated structure

Info

Publication number
JPS587628A
JPS587628A JP10656481A JP10656481A JPS587628A JP S587628 A JPS587628 A JP S587628A JP 10656481 A JP10656481 A JP 10656481A JP 10656481 A JP10656481 A JP 10656481A JP S587628 A JPS587628 A JP S587628A
Authority
JP
Japan
Prior art keywords
film
layer
polyvinyl alcohol
laminated
photoresist layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10656481A
Other languages
Japanese (ja)
Other versions
JPH0136607B2 (en
Inventor
Toshio Marui
丸井 寿雄
Motohide Shimomura
下村 源秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Synthetic Chemical Industry Co Ltd
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP10656481A priority Critical patent/JPS587628A/en
Publication of JPS587628A publication Critical patent/JPS587628A/en
Publication of JPH0136607B2 publication Critical patent/JPH0136607B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain the titled structure having a superior antistatic property and superior properties of isolating oxygen and transmitting ultraviolet rays by laminating a photoresist layer on a specified stretched polyvinyl alcohol film. CONSTITUTION:An unstretched polyvinyl alcohol film having >=500 polymn. degree and >=98mol% saponification degree is uni- or biaxially stretched by >=1.5 times and heat-treated at >=150 deg.C to obtain a stretched polyvinyl alcohol film A having <=5cc/m<2>/24hr oxygen permeability at 20 deg.C and 65% RH and >=35% crystallinity. A photoresist layer B is laminated on the film A, or a film C such as a polyethylene film is further laminated to obtain a photosensitive laminated structure. After exfoliating the film C, the layer B is superposed on a metallic surface in close contact with each other, and it is exposed through the film A. The film A is then exfoliated, and the unexposed part of the layer B is dissolved and removed to develop the layer B.

Description

【発明の詳細な説明】 本発明は、フォトレジスト層の少なくと4片WJKフィ
ルムを積層した構造を有する感光性積層構造−に関する
本のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive laminated structure having a structure in which at least four pieces of WJK film are laminated with a photoresist layer.

ポリエチレンテレフタレートフィルム、ポリオレアイン
フィルムなどの党逓過性支持体上に7オトレジスト層を
形vL14せ、さらに6番に応t、ソの上にポリエチレ
ンフィルムなどの保護フィルムを積層した感光性積層構
造物は公知であり、画像0@区は、この積層構造物から
保護フィルムを剥離除去しえ後鋼板などの金属面に7オ
ドレジスト層が接触するように重ねて圧着し、露先し、
支持体を剥離除責し、ついで溶剤タイプ、アルカリタイ
プ等の現像液で現像することKj秒違唆される。
A photosensitive laminated structure in which 7 photoresist layers are formed on a transparent support such as polyethylene terephthalate film or polyolein film, and a protective film such as polyethylene film is further laminated on top of No. 6. The product is known, and the image 0@ku shows that after peeling and removing the protective film from this laminated structure, the seven odoresist layers are piled up and pressed together so that they are in contact with a metal surface such as a steel plate, and the dew point is applied.
The support is peeled off and then developed with a solvent type developer, an alkaline type developer, etc. for several seconds.

しかしながら従米光遁過性支持体として用いられている
ポリエチレンテレフタレートフィルム等のフィルムは、
(璽)露光後の剥離作業中帯電によりフィル^が手Kま
つわりつくというトラブルを生じること、(りはこりが
吸着しやすいこと、(1)―素遮断性が不足し、又紫外
線透過が必ずしも充分でないので、露光時間、感度の点
で不利となる傾向があること、(4)保lIフィルム/
フォトレジスト層の同の接着力とフォトレジスト層/支
神体の閏の接着力に歇炉な差をつけ、前者の接着力を後
者の接着力より小さくすると共に、後者の接着力もフォ
トレジスト層の損傷を起さない程度の強さにとどめなけ
ればならな匹が、保Ilフィルムと支持体とが木質的に
は同系統の樹脂からなるため、各層間0I111力の差
のコントロールをしKくいこと、(1)支持体の材質に
よっては金属面への加熱圧着時に耐熱性が下足すること
、などの問題点がある。
However, films such as polyethylene terephthalate film, which are used as optically transparent supports,
(1) Problems such as the film clinging to the hand due to charging during the peeling process after exposure, (1) - elemental blocking properties are insufficient, and ultraviolet light transmission is not always sufficient. (4) There is a tendency for there to be disadvantages in terms of exposure time and sensitivity;
The adhesive strength of the photoresist layer and the adhesive strength of the photoresist layer/support body are made to be significantly different, so that the adhesive strength of the former is smaller than that of the latter, and the adhesive strength of the latter is also the same as that of the photoresist layer. The strength must be kept to a level that does not cause damage, but since the protective film and the support are made of resins of the same type of wood, it is difficult to control the difference in the force between each layer. (1) Depending on the material of the support, heat resistance may be insufficient when hot and press-bonded to a metal surface.

本発明は上記の如き従来法の問題点を解決したものであ
る。
The present invention solves the problems of the conventional method as described above.

本発明の感光性積置構造物は、フィルム入/フォトレジ
ストillよ秒なる一構直頓又社フイルムム/7オトレ
ジスト層B/yイルムCよりなる層構vL<嗜を有し、
(4)の場合はそのままで(ロ)の場合はCt剥離して
から金属@Klが接触するように重合密着し、ムを通し
て露党後ムtlIll離して現像するタイプの積層構造
物において、フィルムAとして 1)延伸倍率が少なくと4−軸に1.5倍以上、I)2
0℃、65%IIIKおける駿素遁過率が5 QC/v
d/24 h、r以下、 ■)結晶化度が35g6以上、 の全ての条件を満たすポリビニルアルコール延伸フィル
ム′を用いる仁とを特徴としてなるものである。
The photosensitive laminated structure of the present invention has a layer structure consisting of film/photoresist layer B/y film C,
In the case of (4), the film is left as it is, and in the case of (b), the film is peeled off, then polymerized and adhered so that the metal @Kl comes into contact with the film. A: 1) Stretching ratio is at least 1.5 times or more in 4-axis, I) 2
At 0°C and 65% IIIK, the release rate of Shunmoto is 5 QC/v
It is characterized by using a stretched polyvinyl alcohol film that satisfies all of the following conditions: d/24h, r or less; (2) crystallinity of 35g6 or more;

本発明においては次のようなすぐれた効果が奏される。The present invention provides the following excellent effects.

+11  帯電防止性がすぐれているので、露光後の剥
離作業中フィルムが手Kまつわりつくなどのトラブルを
全く生じない7 (鵞)ハこりが吸着しないので取扱いが容易となる。
+11 It has excellent antistatic properties, so there are no problems such as the film clinging to your hands during peeling after exposure.7 (Grown) It is easy to handle because it does not attract dust.

情III素遮断性S極めてすぐれており、紫外線透過性
もすぐれているので、露光時間が短縮でき、感度、解像
度も良い。
It has extremely excellent light-blocking properties S and excellent ultraviolet transmittance, so exposure time can be shortened and sensitivity and resolution are also good.

G41  A/B/Cの層構区中B/Cの層間接着性と
A/lの層間接着性の閏に明確な強貢の差があり、さら
にムの結晶化度の調節により接着性を任意#lc設定で
きるので、C會剥離するとIK剥離ミスが生じずかつ露
光後ムを剥離するときく411を損傷しない。
G41 In the A/B/C layer structure, there is a clear difference in the interlayer adhesion of B/C and A/L, and the adhesion can be further improved by adjusting the crystallinity of Mu. Since #lc can be set arbitrarily, IK peeling errors will not occur when C is peeled off, and the #lc will not be damaged when peeling off after exposure.

11)  耐熱性が良好であるので金M面への加熱圧着
KIIL)ラブルを生じない。
11) Since the heat resistance is good, heat and pressure bonding to the gold M surface (KIIL) does not cause any trouble.

本発明における上記のような顕著な効果は上記特i!O
条件を満たすポリビニルアルコール延伸フィルムを用い
ることKよってはじめて奏されるのであって、ポリビニ
ルアルコール延伸フィルムに代えて通常の未延伸のポリ
ビニルアルコールフィルムを用いても到底かかるすぐれ
え効果は奏しえない、即ち通常の未延伸のポリビニルア
ルコールフィルムを用%/%友場合は、蛸環境条件によ
る物性変化が大きく、該フィルム上へのフォトレジスト
■の形代が円滑にでIK<いこと、@曽素遮断性が必ず
しも充分ではないこと、k17オトレジスト層との接着
が強すぎる傾向があ夛、露光後のフィルムの剥離が円滑
に行いえない場合があること、などの問題点がある。
The above-mentioned remarkable effects of the present invention are the above-mentioned special i! O
This can only be achieved by using a polyvinyl alcohol stretched film that satisfies the conditions, and even if a normal unstretched polyvinyl alcohol film is used instead of the polyvinyl alcohol stretched film, such excellent effects cannot be achieved. When using a normal unstretched polyvinyl alcohol film, the physical properties change greatly depending on the environmental conditions, and the photoresist pattern on the film cannot be smoothly applied. There are problems such as not necessarily having sufficient properties, adhesion with the k17 photoresist layer tending to be too strong, and peeling of the film after exposure may not be smooth.

本発明(おiてフィルム上を構区するポリビニルアルコ
ール系フィルムは先にも述べたようEl)〜■)の条件
を全て温良すことが要求される。
The present invention (in particular, the polyvinyl alcohol film constituting the film is required to satisfy all of the conditions (El) to (■) as mentioned above).

I)延伸倍率が少なくとも一軸に1.5倍以上であるこ
と。
I) The stretching ratio is 1.5 times or more in at least one direction.

延伸倍率が1.5倍乗溝では本発明の目的にとっては未
延伸フィルムと木質鈎KFi変わらず、所期の効果が充
分Kti奏されない。
When the stretching ratio is 1.5 times, for the purpose of the present invention, there is no difference between the unstretched film and the wooden hook KFi, and the desired effect Kti is not sufficiently exerted.

なお延伸は一軸延伸又は二軸延伸のいずれであってもよ
く、好ましい倍率は一輪延伸の場合で2倍以上、二輪延
伸の場合で面積倍率で2.5倍以上である。特に好まし
いのは面積倍率4倍以上の二輪延伸の場合である。
Note that the stretching may be either uniaxial stretching or biaxial stretching, and the preferable magnification is 2 times or more in the case of one-wheel stretching, and 2.5 times or more in area magnification in the case of two-wheel stretching. Particularly preferred is the case of two-wheel stretching with an area magnification of 4 times or more.

I)20℃、65%RHfCおける酸素透過率が5ce
/d/24 k r以下、好ましくは2cc/m/24
 h r以下であること。
I) Oxygen permeability at 20°C and 65% RHfC is 5ce
/d/24k r or less, preferably 2cc/m/24
Must be less than or equal to hr.

酸素透過率が5cc/m’/24 k r t−越える
と積層フィルムの保存安定性が悪く、感度の点で不利と
なる。
If the oxygen permeability exceeds 5 cc/m'/24 krt-, the storage stability of the laminated film will be poor, resulting in a disadvantage in terms of sensitivity.

i)結晶化度が55%以上、好ましくは40%以上であ
ること。
i) Crystallinity is 55% or more, preferably 40% or more.

結晶化度が35%未満では環境条件による物性変化が大
きくて積層フィルムを円滑に製造しがたく、又7オトレ
ジスト層Bとの接着力が過多となり、露光後人を剥離す
るときトを損傷するおそれがある。
If the crystallinity is less than 35%, the physical properties change greatly depending on the environmental conditions, making it difficult to smoothly produce a laminated film, and the adhesive force with the photoresist layer B will be excessive, causing damage to the photoresist layer when it is peeled off after exposure. There is a risk.

厚与は特に限定はなく通常7〜50声程度の範囲から選
ばれるが、この範囲の中で#i50声未満、好ましくi
j20声未満、さらに好ましくti17声米満とするこ
とが解像変、ノ・ンダもぐり防止、活性光照射時開の短
縮などの点で望ましい。
There is no particular limitation on the welfare, and it is usually selected from the range of about 7 to 50 voices, but within this range, #i is less than 50 voices, preferably i
It is desirable to set the pitch to be less than 20 tones, more preferably to 17 tones, from the viewpoints of resolution change, prevention of noise and blurring, and shortening of the opening time when irradiated with active light.

上記条件を満足するポリビニルアルコール延伸フィルム
を得るには次の点に留意することが望ましい。
In order to obtain a stretched polyvinyl alcohol film that satisfies the above conditions, it is desirable to pay attention to the following points.

度の高いもの(たとえば98そル%以F:、)を用いた
方が、延伸フィルムの強度向上、e*遮断性向上の点で
好ましい。
It is preferable to use one with a high degree of F (for example, 98% or higher) in terms of improving the strength of the stretched film and improving the e* barrier properties.

・ ポリビニルアルコール延伸フィルムとしては可塑剤
の含有量の少ない方、できれば可−期を全く用いない方
が、着素遮断性の向E、感光性積層構造物におけるフィ
ルムへのフォトレジスト層の成分の移行防止、結晶化度
の向上の点で好まし^。
・For polyvinyl alcohol stretched films, it is better to use less plasticizer content, or if possible, no plasticizer at all, to improve the dye barrier properties and to reduce the amount of components in the photoresist layer to the film in photosensitive laminated structures. Preferable in terms of prevention of migration and improvement of crystallinity.

O延伸倍率は高い方が、延伸フィルムの強度向上、薄膜
化、酸素遮断性向上、感光性積場構造物における各層間
の接着性のパツンス、結晶化度の向上の点で好ましい。
A higher O stretching ratio is preferable from the viewpoints of improving the strength of the stretched film, making it thinner, improving oxygen barrier properties, and improving the adhesion strength between layers in the photosensitive stack structure and crystallinity.

・ 延伸後は150℃以上に加熱略理し友方が、延伸フ
ィルムの寸法安定性、結晶化度の向上、酸素遮断性の向
上の点から好ましい。
- After stretching, it is preferable to heat the film to 150° C. or higher in order to improve the dimensional stability, crystallinity, and oxygen barrier properties of the stretched film.

・ 延伸フィルムの機械物性は、引張強度が2000’
1m以上でかつ初期弾性率が2,0XIO”1以上であ
ることが好ましい。
・The mechanical properties of the stretched film include a tensile strength of 2000'
It is preferable that the length is 1 m or more and the initial elastic modulus is 2.0XIO"1 or more.

次に未発明Kかける7オトレジスト層Bとしてハ、公知
のアルカリ現像タイプ、溶剤現像タイプ、乾式現像タイ
プの感光性樹脂組成物の層がいずれも用いつる。
Next, as the uninvented photoresist layer B, a layer of a known alkali development type, solvent development type, or dry development type photosensitive resin composition can be used.

本発明におけるフィルムCとしてはフォトレジスト層1
の保II場又は支持層としての役割を果すものであって
、〆リエチレンフイルム、ポリプロピレンフィルム、ポ
リエチレンやポリプロピレンがラミネートされ九紙、ポ
リエステルフィルム、セルロース系フィルム、ナイロン
フィルムなどがあげられる。このフィルムは延伸フィル
ムであうフィルムCはフォトレジスト層Bと強くは接着
しないことが要求される。
As the film C in the present invention, the photoresist layer 1
It plays a role as a storage layer or support layer for the film, and examples include polyethylene film, polypropylene film, paper laminated with polyethylene or polypropylene, polyester film, cellulose film, and nylon film. It is required that film C, which is a stretched film, does not strongly adhere to photoresist layer B.

本発明の積層構造物の層構aは フィルムA/フォトレジスト層B一層構aK)が基本と
なるが、通常は保存、運搬、取扱等の点から フィルムA/フォトレジスト層B/フィルムC・・・層
構e、(ロ) と5層構造にすることが多い。
The layer structure a of the laminated structure of the present invention is basically a single-layer structure aK) of film A/photoresist layer B, but usually from the viewpoint of storage, transportation, handling, etc. ... Layer structure e, (b) It is often made into a five-layer structure.

層構成(イ)にあっては、フィルムA上に感光性樹脂組
成物の溶剤溶液を流延、噴霧、ロールコート、押出コー
ト攻ど任意の手段で自存し、乾燥すればよい。
In the layer structure (a), a solvent solution of the photosensitive resin composition may be placed on the film A by any method such as casting, spraying, roll coating, or extrusion coating, and then dried.

層構vL(ロ)にあっては、フィルムA上に7オトレジ
スト層Bを形成し、ついでその上からフィルムCf積層
する方法が採用され、又まずフィルムC上に7オトレジ
スト層Bを形成し、ついでその−ヒからフィルムAを積
層する方法も採用される。
In the layer structure vL (b), a method is adopted in which 7 photoresist layers B are formed on film A, and then film Cf is laminated thereon, and 7 photoresist layers B are first formed on film C, A method may also be adopted in which the film A is then laminated from the above steps.

かくして得られたA/B、又tiA/B/Cの層構成を
有する積層構造物は堆積し或いはロール巻きして保存、
出荷、実用に供される。
The thus obtained laminated structure having a layer structure of A/B or tiA/B/C is stored by being deposited or rolled,
It will be shipped and put into practical use.

未発明の感光性積層構造物の使用法は常法と特に異なる
ところはない。典型的な事例を述べれば、1@構威(イ
)Kあってはそのままで、層構tL@KToってはまず
フィルムCを剥離する。次にA/IIよ抄なる積層物を
銅張り積層板などの金属*KBiliが金属面に接触す
るように重ね、加圧接着する。この際加圧接着は加熱ロ
ールを用いて行うのが通常である。
The method of using the uninvented photosensitive laminate structure is not particularly different from conventional methods. To describe a typical case, 1@structure (a) K remains as it is, but film C is peeled off first in layer structure tL@KTo. Next, a laminate made of paper A/II is stacked so that the metal *KBili such as a copper-clad laminate is in contact with the metal surface, and bonded under pressure. At this time, pressure bonding is usually performed using a heated roll.

2 原画をフィルムAの側からあて、活性光で露光する
2. Place the original image on the film A side and expose it to active light.

1 露光機フィルムAを剥離する3 ℃m像液でフォトレジストjBの未露光部を溶解除去し
て現像する。
1. Peel off the exposure machine film A. Dissolve and remove the unexposed portions of the photoresist jB with a 3° C.m developing solution and develop.

1 以下常法に従い銅メッキ、ハンダメッキ、レジスト
剥離、銅エツチングなどを行う。
1. Copper plating, solder plating, resist peeling, copper etching, etc. are performed in accordance with conventional methods.

次に例をあげて本発明をさらに説明する。なお結晶化度
、酸素透過率の測定は下記による。
The invention will now be further explained by way of example. The crystallinity and oxygen permeability were measured as follows.

結晶化度二四塩化員素とキシレンによる密度匂配管を用
いて25℃における密度を測定し、その密度よ抄結晶化
度を算出した。
Crystallinity The density at 25°C was measured using a density tube using ditetrachloride and xylene, and the crystallinity of the paper was calculated from the density.

酸素透過率:20℃、!5961Hで100時間調湿し
九試料について、20℃、65%の酸素透過率をMOC
ON OX−TRAM  100で測定した。
Oxygen permeability: 20℃,! 5961H for 100 hours and the oxygen permeability of 65% at 20°C for nine samples.
Measured with ON OX-TRAM 100.

例I A:延伸倍率7.5倍(縦5倍、横2.5倍)、厚み1
5声、酸素透過率0−6 ’!/m/24h r (2
0℃、65%RH)、結晶化度46g6のポリビニルア
ルコール二軸延伸フィルム(可塑剤使用量0、延伸後2
10℃で20秒問銖処理、ポリビニルアルコールの重合
度1700、ケン化度99モル%、引張l1ik度50
00智、初期弾性率5.5 X 10”m ) B:アルカリ可溶タイプのアクリル共重合体系フォトレ
ジスト C:厚み50μのポリエチレンテレフタレートフィルム C上にロールコータ−を用いてBのメチルエチルケトン
溶液を塗布して礼儀し良。tt像後のlの厚み#i25
μであっ九。次Klの上からAを重ねて圧着することに
よ#)A/B/Cの6層構造とし、これをロール巻きし
た。
Example I A: Stretching ratio: 7.5 times (length: 5 times, width: 2.5 times), thickness: 1
5 voices, oxygen permeability 0-6'! /m/24h r (2
0°C, 65% RH), polyvinyl alcohol biaxially stretched film with crystallinity of 46g6 (plasticizer usage amount 0, after stretching 2
Treatment at 10°C for 20 seconds, degree of polymerization of polyvinyl alcohol 1700, degree of saponification 99 mol%, tensile degree 50
B: Alkali-soluble acrylic copolymer photoresist C: Methyl ethyl ketone solution of B was applied onto polyethylene terephthalate film C with a thickness of 50 μm using a roll coater. Please be polite. Thickness of l after tt image #i25
μ and nine. Next, layer A was layered on top of Kl and pressed to form a 6-layer structure of #) A/B/C, which was then rolled.

上記積層構造物からCを剥離した後、銅張り積層板上K
B側が接触するようにA/Bを重ね、温度100℃で加
熱加圧することにより接着し喪。
After peeling C from the above laminated structure, K on the copper-clad laminate
Layer A and B so that the B sides are in contact and bond by heating and pressurizing at a temperature of 100°C.

ついでA面の上から原画シートを載せ、露光機によ抄露
光しく露光量90ミリジユール)、その後人を剥離した
。ついで員酸ソーダの296水溶液からなる現像液で5
分間現像を行った。
Next, an original sheet was placed on the A side, exposed to light using an exposure machine (exposure dose: 90 millijoules), and then the film was peeled off. Then, with a developer consisting of a 296 aqueous solution of sodium acid,
Developing was performed for a minute.

結果を第1麦に示す。The results are shown in the first barley.

対照例1 厚み50μのポリエチレンテレフタレートフィルム上に
例1のBを塗布、礼儀し、次にその上からポリエチレン
フィルムを重ねて圧着することによシ5層構造とし、こ
れをロール巻きした。
Comparative Example 1 B of Example 1 was coated on a polyethylene terephthalate film having a thickness of 50 μm, and then a polyethylene film was overlaid and pressure-bonded to form a five-layer structure, which was then rolled.

上記積層構造物からポリエチレンフィルムを剥離し先後
、銅貼9積層板上KB側が接触するように重ね、温度1
00℃て加熱加圧することにより接着した。
The polyethylene film was peeled off from the above laminated structure, and the copper-plated 9 laminate was stacked so that the KB sides were in contact with each other, and the temperature was 1.
Adhesion was achieved by heating and pressing at 00°C.

ついでポリエチレンテレフタレートフィルムの上からj
l[Iliシートを載せ、露光機によに露光しく露光量
90ミリジエール)、その後ポリエチレンテレフタレー
トフィルムを剥離し九。ついで炭酸ソーダの2g6水溶
液からなる現像液で5分間現像を行っ九。
Then, from above the polyethylene terephthalate film,
1 [Place the Ili sheet and expose to light using an exposure machine with an exposure dose of 90 mD], then peel off the polyethylene terephthalate film. Next, the film was developed for 5 minutes with a developer consisting of 2 g of sodium carbonate in water.9.

結果を第111に合せて示す。The results are shown in conjunction with No. 111.

対照例2〜5 ポリビニルアルコール二軸延伸フィルムAに代えて次の
フィルムを用い喪ほかは例1と同様にして実験を行った
Control Examples 2 to 5 Experiments were conducted in the same manner as in Example 1 except for the use of the following films in place of polyvinyl alcohol biaxially stretched film A.

結果を第1表に合せて示す。The results are also shown in Table 1.

対照例2 厚み25声のポリビニルアルコール米延伸フィルム(ポ
リビニルアルコール01合度1800、ケン化度99モ
ル%、可塑剤含量11%)対照例5 延伸倍率−倍(縦2倍、横2倍)、厚み18P1酸素逓
過亭4o:/d/24hr (20℃、65* RH)
、111+1+化度52 %のポリビニルアルコール二
輪延伸フィルム(可塑剤含有量O11、ポリビニルアル
コールの重4度f700、ケン化度99モル!%) $1    麦 峯 対照例1にあってはぼりエチレンフィルムのラミネ
ート性。
Control example 2 Polyvinyl alcohol rice stretched film with a thickness of 25 mm (polyvinyl alcohol 01 degree 1800, degree of saponification 99 mol%, plasticizer content 11%) Control example 5 Stretching ratio - times (2 times vertical, 2 times horizontal), thickness 18P1 Oxygen Passage 4o:/d/24hr (20℃, 65*RH)
, 111+1+ polyvinyl alcohol two-wheel stretched film with a degree of 52% (plasticizer content O11, weight of polyvinyl alcohol 4 degrees F700, degree of saponification 99 mol!%) $1 Mugamine In contrast to control example 1, the ethylene film was Lamination property.

本対鳳111に&うてはぼりエテレンテレフIレートフ
ィルムaigs+*。
Hon vs. Otori 111 & Utehabori Eterenteleph I rate film aigs+*.

例2 A: 延伸倍率9.6倍(ItL5.2倍、横5倍)、
厚み14μ、酸素透過率0.5 tl’:/lit/ 
24 k r(20℃、65g6RH)、結晶化度50
g6のポリビニルアルコール二軸延伸フィルム(可塑剤
使用量0、延伸後210℃で20emaa理、ポリビニ
ルアルコールの重合度1200、ケン化度99モル%) B: アルカリ可溶タイプのアクリル共重合体系ホトレ
ジスト フイルムム上にロールコータ−を用いてBのメチルエチ
ルクトン溶液を塗布して乾燥した。乾燥後のBの厚みは
25声であう九。
Example 2 A: Stretching ratio 9.6 times (ItL 5.2 times, width 5 times),
Thickness 14μ, oxygen permeability 0.5 tl': /lit/
24k r (20℃, 65g6RH), crystallinity 50
G6 polyvinyl alcohol biaxially stretched film (plasticizer usage amount 0, 20 emaa temperature at 210°C after stretching, polyvinyl alcohol polymerization degree 1200, saponification degree 99 mol%) B: Alkali-soluble type acrylic copolymer photoresist film A methyl ethyl lactone solution (B) was applied onto the film using a roll coater and dried. The thickness of B after drying is 9 with 25 tones.

このA/Bの21111fi物を銅張抄積膳板上にBが
金属面に接融するように重ね、温度100℃で加熱加圧
することによ抄接着し、以下例1と同様にして露光、現
像した。
This 21111fi product of A/B was stacked on a copper-clad paper board so that B was fused to the metal surface, and the paper was bonded by heating and pressing at a temperature of 100°C, and then exposed in the same manner as in Example 1. , developed.

結果を第211に示す。The results are shown in No. 211.

対照例4〜5 フイルムムとして厚み25μの〆リエチレンテレフタレ
ートフイルム(対照例4)、対照例2で用いたポリビニ
ルアルコール未延伸フィルム(対照例5)を用いたほか
打倒2と同様にして露光、現像を行った。
Control Examples 4 to 5 In addition to using a polyethylene terephthalate film with a thickness of 25 μm (Control Example 4) and the unstretched polyvinyl alcohol film used in Control Example 2 (Control Example 5), exposure and development were carried out in the same manner as in Overturning 2. went.

結果を第2衰に合せて示す。The results are shown along with the second decay.

第   2   表 例3、対照例6 ポリビニルアルコール二軸延伸フィルム^に代えて次の
フィルムを用い、かつフォトレジスト8として溶剤可溶
タイプのアクリル共重合体系フォトレジストを用い九は
かは例1と同様にして実験を行う九。なお現像#11,
1.1− トリクロルエタンからなる現像液を用いて8
0秒間行つた。
Table 2 Example 3, Comparative Example 6 The following film was used instead of the polyvinyl alcohol biaxially stretched film, and a solvent-soluble acrylic copolymer photoresist was used as the photoresist 8. 9. Conduct experiments in the same way. Furthermore, development #11,
1.1- 8 using a developer consisting of trichloroethane
It lasted 0 seconds.

結果をII5!Eに示す。II5 the result! Shown in E.

例5 延伸倍率5.5倍(縦5.5倍、横1倍)、厚み17N
S酸素透過率0.6 cc/j/24kr (20℃、
65%RH)、結晶化度4596のポリビニルアルコー
ル−軸延伸フィルム(可塑剤使用量1%、延伸後200
℃で20秒間熱処理、ポリビニルアルコールの重合度1
500、ケン化度99モルg6)対照例6 延伸倍率1.4倍(Ill、4倍、横1倍)、厚み20
μ、酸素透過率5.5 cc/vIl/24br(2Q
”C,65%RB)、結晶化度50g6のポリビニルア
ルコール−軸延伸フィルム(ポリビニルアルコールの重
合度1500、ケン化度99モル%)
Example 5 Stretching ratio: 5.5 times (length: 5.5 times, width: 1 time), thickness: 17N
S oxygen permeability 0.6 cc/j/24kr (20℃,
65%RH), polyvinyl alcohol-axially stretched film with a crystallinity of 4596 (plasticizer usage amount 1%, after stretching 200%
Heat treatment at ℃ for 20 seconds, polymerization degree of polyvinyl alcohol 1
500, saponification degree 99 mol g6) Control example 6 Stretching ratio 1.4 times (Ill, 4 times, width 1 times), thickness 20
μ, oxygen permeability 5.5 cc/vIl/24br (2Q
"C, 65% RB), polyvinyl alcohol-axially stretched film with crystallinity 50g6 (polyvinyl alcohol polymerization degree 1500, saponification degree 99 mol%)

Claims (1)

【特許請求の範囲】[Claims] 1.74ルムA/フォトレジスト層Bよ抄なる層構vt
ta)又はフィルム入/フォトレジスト層B/フィルム
Cよ抄なる層構成(ロ)を有し、G()の場合はそのま
まで←)の場合はCを剥離してから金属1iKIが接触
するように重合密着し、ムを通して露光後Aを剥離して
現像するタイプの積層構造物において、フィルムAとし
て 1)延伸倍率が少々くとも一軸に1.5倍以上、■) 
20℃、651i R11Kおける酸素透過率が508
/m/24kr以下、 −)結晶化度が55−以上、 のポリビニルアルコール延伸フィルムを用いることを特
徴としてなる感光性積層構造物。 2、フィルムAが面積倍率2.5倍以上のポリビニルア
ルコール二軸延伸フィルムである特許Il哀の範S第1
項記載の構造物。 1 ム上KB會毅は九後す上(Cを積層して層構a(c
4を形成してなる特許請求の範囲第1項記載の構造物。 tC上KBt設は九後B上KAt積層して層構成(ロ)
を形成してなる特許請求の範囲第1項記載の構造物。
Layer structure consisting of 1.74 lume A/photoresist layer B vt
ta) or a film-containing/photoresist layer B/film C layer structure (b), in the case of G(), leave it as it is; in the case of ←), peel off C and then make contact with the metal 1iKI. In a laminated structure of the type in which A is polymerized and adhered to the film, and A is peeled off and developed after exposure through a film, as film A: 1) the stretching ratio is at least 1.5 times or more uniaxially;
Oxygen transmission rate at 20℃, 651i R11K is 508
/m/24 kr or less, -) A photosensitive laminate structure characterized by using a polyvinyl alcohol stretched film having a crystallinity of 55 or more. 2. Patent Il Ai Range S 1, in which the film A is a polyvinyl alcohol biaxially stretched film with an area magnification of 2.5 times or more
Structures described in Section. 1 The upper KB meeting is the upper layer (C) and the layer structure a (c
4. The structure according to claim 1, wherein the structure comprises: 4. KBt on tC is layered by laminating KAt on Kugo B (b)
2. A structure according to claim 1, which is formed of:
JP10656481A 1981-07-07 1981-07-07 Photosensitive laminated structure Granted JPS587628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10656481A JPS587628A (en) 1981-07-07 1981-07-07 Photosensitive laminated structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10656481A JPS587628A (en) 1981-07-07 1981-07-07 Photosensitive laminated structure

Publications (2)

Publication Number Publication Date
JPS587628A true JPS587628A (en) 1983-01-17
JPH0136607B2 JPH0136607B2 (en) 1989-08-01

Family

ID=14436782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10656481A Granted JPS587628A (en) 1981-07-07 1981-07-07 Photosensitive laminated structure

Country Status (1)

Country Link
JP (1) JPS587628A (en)

Also Published As

Publication number Publication date
JPH0136607B2 (en) 1989-08-01

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