JPS5873116A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS5873116A
JPS5873116A JP56171397A JP17139781A JPS5873116A JP S5873116 A JPS5873116 A JP S5873116A JP 56171397 A JP56171397 A JP 56171397A JP 17139781 A JP17139781 A JP 17139781A JP S5873116 A JPS5873116 A JP S5873116A
Authority
JP
Japan
Prior art keywords
mask
chamber
cover
helium
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56171397A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6156612B2 (enExample
Inventor
Yoshihiro Yoneyama
米山　義弘
Motoya Taniguchi
素也 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56171397A priority Critical patent/JPS5873116A/ja
Publication of JPS5873116A publication Critical patent/JPS5873116A/ja
Publication of JPS6156612B2 publication Critical patent/JPS6156612B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Radiography Using Non-Light Waves (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56171397A 1981-10-28 1981-10-28 Ｘ線露光装置 Granted JPS5873116A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56171397A JPS5873116A (ja) 1981-10-28 1981-10-28 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56171397A JPS5873116A (ja) 1981-10-28 1981-10-28 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS5873116A true JPS5873116A (ja) 1983-05-02
JPS6156612B2 JPS6156612B2 (enExample) 1986-12-03

Family

ID=15922394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56171397A Granted JPS5873116A (ja) 1981-10-28 1981-10-28 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS5873116A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104619A (ja) * 1984-10-29 1986-05-22 Fujitsu Ltd Ｘ線露光装置
JPS62237727A (ja) * 1986-04-09 1987-10-17 Hitachi Ltd Ｘ線露光装置およびその方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104619A (ja) * 1984-10-29 1986-05-22 Fujitsu Ltd Ｘ線露光装置
JPS62237727A (ja) * 1986-04-09 1987-10-17 Hitachi Ltd Ｘ線露光装置およびその方法

Also Published As

Publication number Publication date
JPS6156612B2 (enExample) 1986-12-03

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