JPS6156612B2 - - Google Patents
Info
- Publication number
- JPS6156612B2 JPS6156612B2 JP17139781A JP17139781A JPS6156612B2 JP S6156612 B2 JPS6156612 B2 JP S6156612B2 JP 17139781 A JP17139781 A JP 17139781A JP 17139781 A JP17139781 A JP 17139781A JP S6156612 B2 JPS6156612 B2 JP S6156612B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- chamber
- cover
- helium
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000001307 helium Substances 0.000 claims description 16
- 229910052734 helium Inorganic materials 0.000 claims description 16
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 12
- 229910052790 beryllium Inorganic materials 0.000 description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Radiography Using Non-Light Waves (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56171397A JPS5873116A (ja) | 1981-10-28 | 1981-10-28 | Ｘ線露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56171397A JPS5873116A (ja) | 1981-10-28 | 1981-10-28 | Ｘ線露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5873116A JPS5873116A (ja) | 1983-05-02 |
| JPS6156612B2 true JPS6156612B2 (enExample) | 1986-12-03 |
Family
ID=15922394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56171397A Granted JPS5873116A (ja) | 1981-10-28 | 1981-10-28 | Ｘ線露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5873116A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61104619A (ja) * | 1984-10-29 | 1986-05-22 | Fujitsu Ltd | Ｘ線露光装置 |
| JPS62237727A (ja) * | 1986-04-09 | 1987-10-17 | Hitachi Ltd | Ｘ線露光装置およびその方法 |
-
1981
- 1981-10-28 JP JP56171397A patent/JPS5873116A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5873116A (ja) | 1983-05-02 |
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