JPS5868745A - 浮き彫り構造体の製造方法 - Google Patents

浮き彫り構造体の製造方法

Info

Publication number
JPS5868745A
JPS5868745A JP56167174A JP16717481A JPS5868745A JP S5868745 A JPS5868745 A JP S5868745A JP 56167174 A JP56167174 A JP 56167174A JP 16717481 A JP16717481 A JP 16717481A JP S5868745 A JPS5868745 A JP S5868745A
Authority
JP
Japan
Prior art keywords
group
radiation
solution
ether
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56167174A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0237580B2 (enrdf_load_stackoverflow
Inventor
Koichi Hatada
畑田　耕一
Yutaka Tsubokura
豊 坪倉
Shigeru Danjo
滋 檀上
Hiraaki Yuuki
結城　平明
Hiroaki Aritome
有留　宏明
Susumu Nanba
難波　進
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56167174A priority Critical patent/JPS5868745A/ja
Publication of JPS5868745A publication Critical patent/JPS5868745A/ja
Publication of JPH0237580B2 publication Critical patent/JPH0237580B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56167174A 1981-10-21 1981-10-21 浮き彫り構造体の製造方法 Granted JPS5868745A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56167174A JPS5868745A (ja) 1981-10-21 1981-10-21 浮き彫り構造体の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56167174A JPS5868745A (ja) 1981-10-21 1981-10-21 浮き彫り構造体の製造方法

Publications (2)

Publication Number Publication Date
JPS5868745A true JPS5868745A (ja) 1983-04-23
JPH0237580B2 JPH0237580B2 (enrdf_load_stackoverflow) 1990-08-24

Family

ID=15844785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56167174A Granted JPS5868745A (ja) 1981-10-21 1981-10-21 浮き彫り構造体の製造方法

Country Status (1)

Country Link
JP (1) JPS5868745A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654585A (ja) * 1991-02-15 1994-02-25 York Internatl Corp 交流電動機駆動装置
JP2015028987A (ja) * 2013-07-30 2015-02-12 東京エレクトロン株式会社 現像処理方法、プログラム、コンピュータ記憶媒体及び現像処理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143019A (en) * 1976-05-25 1977-11-29 Toshiba Corp Developing agent for positive type radiation sensitive material
JPS53120430A (en) * 1977-03-29 1978-10-20 Toshiba Corp Developing liquid for resist sensitive to radioactive ray
JPS54116226A (en) * 1978-03-01 1979-09-10 Fujitsu Ltd Formation method for positive type resist image

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143019A (en) * 1976-05-25 1977-11-29 Toshiba Corp Developing agent for positive type radiation sensitive material
JPS53120430A (en) * 1977-03-29 1978-10-20 Toshiba Corp Developing liquid for resist sensitive to radioactive ray
JPS54116226A (en) * 1978-03-01 1979-09-10 Fujitsu Ltd Formation method for positive type resist image

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654585A (ja) * 1991-02-15 1994-02-25 York Internatl Corp 交流電動機駆動装置
JP2015028987A (ja) * 2013-07-30 2015-02-12 東京エレクトロン株式会社 現像処理方法、プログラム、コンピュータ記憶媒体及び現像処理装置

Also Published As

Publication number Publication date
JPH0237580B2 (enrdf_load_stackoverflow) 1990-08-24

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