JPS54116226A - Formation method for positive type resist image - Google Patents

Formation method for positive type resist image

Info

Publication number
JPS54116226A
JPS54116226A JP2305978A JP2305978A JPS54116226A JP S54116226 A JPS54116226 A JP S54116226A JP 2305978 A JP2305978 A JP 2305978A JP 2305978 A JP2305978 A JP 2305978A JP S54116226 A JPS54116226 A JP S54116226A
Authority
JP
Japan
Prior art keywords
radiation
irradiated
formula
copolymer
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2305978A
Other languages
Japanese (ja)
Other versions
JPS608493B2 (en
Inventor
Kenichi Kawashima
Junji Sato
Konoe Miura
Chihiro Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Mitsubishi Kasei Corp
Original Assignee
Fujitsu Ltd
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Mitsubishi Kasei Corp filed Critical Fujitsu Ltd
Priority to JP2305978A priority Critical patent/JPS608493B2/en
Publication of JPS54116226A publication Critical patent/JPS54116226A/en
Publication of JPS608493B2 publication Critical patent/JPS608493B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Abstract

PURPOSE:To enhance sensitivity without deteriorating excellent fine image formation capability of a (meth)acrylic ester copolymer, by treating a radiation sensitive layer irradiated by radiation with a specified quaternary ammonium salt solution. CONSTITUTION:A copolymer having units of formula I in which R<1> and R<2> are H or methyl, and units of formula II in which R<3> is methyl, cyano, or halogen and R<4> is lower alkyl, especially a n-butyl-alpha-cyanoacrylate-methacrylic acid copolymer is dissolved in a solvent, if necessary, together with an additive like a sensitizer, and this solution is coated on a substrate. The radiation sensitive layer formed is prebaked, if needed, then, irradiated with a radiation in a predetermined pattern, and developed with a solvent, such as alcohols, dissolving a quaternary ammonium salt of formula III in which R<5>-R<7> are alkyl, and X is halogen, to eliminate the parts irradiated by radiation.
JP2305978A 1978-03-01 1978-03-01 Method for forming a positive resist image Expired JPS608493B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2305978A JPS608493B2 (en) 1978-03-01 1978-03-01 Method for forming a positive resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2305978A JPS608493B2 (en) 1978-03-01 1978-03-01 Method for forming a positive resist image

Publications (2)

Publication Number Publication Date
JPS54116226A true JPS54116226A (en) 1979-09-10
JPS608493B2 JPS608493B2 (en) 1985-03-04

Family

ID=12099849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2305978A Expired JPS608493B2 (en) 1978-03-01 1978-03-01 Method for forming a positive resist image

Country Status (1)

Country Link
JP (1) JPS608493B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS5857128A (en) * 1981-09-30 1983-04-05 Toshiba Corp Positive type photoresist developing solution
JPS5868745A (en) * 1981-10-21 1983-04-23 Hitachi Ltd Production of relief structural body
JPS58114033A (en) * 1981-12-28 1983-07-07 Fujitsu Ltd Formation of pattern
JPH049956A (en) * 1990-04-27 1992-01-14 Mitsubishi Electric Corp Developer composition for positive type photoresist

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62248887A (en) * 1986-04-21 1987-10-29 Matsushita Refrig Co Scroll type compressor
JPH0842468A (en) * 1995-04-03 1996-02-13 Hitachi Ltd Scroll compressor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS5857128A (en) * 1981-09-30 1983-04-05 Toshiba Corp Positive type photoresist developing solution
JPS5868745A (en) * 1981-10-21 1983-04-23 Hitachi Ltd Production of relief structural body
JPH0237580B2 (en) * 1981-10-21 1990-08-24 Hitachi Ltd
JPS58114033A (en) * 1981-12-28 1983-07-07 Fujitsu Ltd Formation of pattern
JPH049956A (en) * 1990-04-27 1992-01-14 Mitsubishi Electric Corp Developer composition for positive type photoresist

Also Published As

Publication number Publication date
JPS608493B2 (en) 1985-03-04

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