JPS5856341A - 熱処理方法および熱処理装置 - Google Patents

熱処理方法および熱処理装置

Info

Publication number
JPS5856341A
JPS5856341A JP56155601A JP15560181A JPS5856341A JP S5856341 A JPS5856341 A JP S5856341A JP 56155601 A JP56155601 A JP 56155601A JP 15560181 A JP15560181 A JP 15560181A JP S5856341 A JPS5856341 A JP S5856341A
Authority
JP
Japan
Prior art keywords
core tube
gas
tube
flange
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56155601A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0250619B2 (OSRAM
Inventor
Kiyohiro Kawasaki
清弘 川崎
Keiichi Kagawa
恵一 香川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56155601A priority Critical patent/JPS5856341A/ja
Publication of JPS5856341A publication Critical patent/JPS5856341A/ja
Publication of JPH0250619B2 publication Critical patent/JPH0250619B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/60—
JP56155601A 1981-09-29 1981-09-29 熱処理方法および熱処理装置 Granted JPS5856341A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56155601A JPS5856341A (ja) 1981-09-29 1981-09-29 熱処理方法および熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56155601A JPS5856341A (ja) 1981-09-29 1981-09-29 熱処理方法および熱処理装置

Publications (2)

Publication Number Publication Date
JPS5856341A true JPS5856341A (ja) 1983-04-04
JPH0250619B2 JPH0250619B2 (OSRAM) 1990-11-02

Family

ID=15609583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56155601A Granted JPS5856341A (ja) 1981-09-29 1981-09-29 熱処理方法および熱処理装置

Country Status (1)

Country Link
JP (1) JPS5856341A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60109405U (ja) * 1983-12-28 1985-07-25 オカモト株式会社 スパイク付靴底
US4748812A (en) * 1986-08-29 1988-06-07 Isuzu Motors Limited Turbo compound engine
JPH02205569A (ja) * 1989-01-31 1990-08-15 Fujimori Kogyo Kk 蓋の製造方法
JPH06224205A (ja) * 1993-06-07 1994-08-12 Tokyo Electron Tohoku Ltd 熱処理方法及びその装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3755016A (en) * 1972-03-20 1973-08-28 Motorola Inc Diffusion process for compound semiconductors
JPS507420A (OSRAM) * 1973-05-18 1975-01-25
JPS56122124A (en) * 1980-02-29 1981-09-25 Chiyou Lsi Gijutsu Kenkyu Kumiai Heat treating device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3755016A (en) * 1972-03-20 1973-08-28 Motorola Inc Diffusion process for compound semiconductors
JPS507420A (OSRAM) * 1973-05-18 1975-01-25
JPS56122124A (en) * 1980-02-29 1981-09-25 Chiyou Lsi Gijutsu Kenkyu Kumiai Heat treating device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60109405U (ja) * 1983-12-28 1985-07-25 オカモト株式会社 スパイク付靴底
US4748812A (en) * 1986-08-29 1988-06-07 Isuzu Motors Limited Turbo compound engine
JPH02205569A (ja) * 1989-01-31 1990-08-15 Fujimori Kogyo Kk 蓋の製造方法
JPH06224205A (ja) * 1993-06-07 1994-08-12 Tokyo Electron Tohoku Ltd 熱処理方法及びその装置

Also Published As

Publication number Publication date
JPH0250619B2 (OSRAM) 1990-11-02

Similar Documents

Publication Publication Date Title
CN102031567B (zh) 热处理装置和冷却方法
US7144823B2 (en) Thermal treatment apparatus
JP4355441B2 (ja) 熱処理装置及び熱処理方法及び半導体デバイスの製造方法
JPS5856341A (ja) 熱処理方法および熱処理装置
JP5036172B2 (ja) 基板処理装置、基板処理方法および半導体装置の製造方法
JP2002009010A (ja) 熱処理装置及びその方法
JPS62140413A (ja) 縦型拡散装置
JP3240180B2 (ja) 熱処理装置
JP3081886B2 (ja) 成膜方法
JPS612330A (ja) 処理装置
JP4806127B2 (ja) 薄膜形成方法
JPH0574757A (ja) 半導体装置用高圧酸化炉
JP3287308B2 (ja) 酸化膜の作製方法
JP5145792B2 (ja) 枚葉式の熱処理装置及び熱処理方法
JP2002289602A (ja) 半導体基板処理装置
KR20100029576A (ko) 웨이퍼 어닐링장치
JP3250843B2 (ja) 半導体製造装置
JPH05299370A (ja) 熱処理装置
JP3308702B2 (ja) 熱処理方法
JP2662318B2 (ja) 半導体基体への不純物の拡散方法
JPS63166218A (ja) 半導体熱処理装置のウエ−ハ冷却方法
JPH10209141A (ja) 半導体製造装置及び膜形成方法
JP2000012473A (ja) 熱処理炉
JPS6272130A (ja) 気相反応方法及びその方法の実施に直接使用する気相反応装置
JPH11111709A (ja) 熱処理方法