JPS5852880A - 半導体素子の製造方法 - Google Patents
半導体素子の製造方法Info
- Publication number
- JPS5852880A JPS5852880A JP56150693A JP15069381A JPS5852880A JP S5852880 A JPS5852880 A JP S5852880A JP 56150693 A JP56150693 A JP 56150693A JP 15069381 A JP15069381 A JP 15069381A JP S5852880 A JPS5852880 A JP S5852880A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- resist
- semiconductor substrate
- window
- insulating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
Landscapes
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56150693A JPS5852880A (ja) | 1981-09-25 | 1981-09-25 | 半導体素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56150693A JPS5852880A (ja) | 1981-09-25 | 1981-09-25 | 半導体素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5852880A true JPS5852880A (ja) | 1983-03-29 |
| JPS6310905B2 JPS6310905B2 (enrdf_load_stackoverflow) | 1988-03-10 |
Family
ID=15502375
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56150693A Granted JPS5852880A (ja) | 1981-09-25 | 1981-09-25 | 半導体素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5852880A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5923565A (ja) * | 1982-07-30 | 1984-02-07 | Hitachi Ltd | 半導体装置の製法 |
| JPS60253277A (ja) * | 1984-05-30 | 1985-12-13 | Oki Electric Ind Co Ltd | 半導体素子の製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06339402A (ja) * | 1993-05-31 | 1994-12-13 | Isao Yoshida | 履物用中敷 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5396671A (en) * | 1977-02-03 | 1978-08-24 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
-
1981
- 1981-09-25 JP JP56150693A patent/JPS5852880A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5396671A (en) * | 1977-02-03 | 1978-08-24 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5923565A (ja) * | 1982-07-30 | 1984-02-07 | Hitachi Ltd | 半導体装置の製法 |
| JPS60253277A (ja) * | 1984-05-30 | 1985-12-13 | Oki Electric Ind Co Ltd | 半導体素子の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6310905B2 (enrdf_load_stackoverflow) | 1988-03-10 |
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