JPS5842152A - 走査荷電粒子線による試料のアニール加熱装置 - Google Patents

走査荷電粒子線による試料のアニール加熱装置

Info

Publication number
JPS5842152A
JPS5842152A JP14115781A JP14115781A JPS5842152A JP S5842152 A JPS5842152 A JP S5842152A JP 14115781 A JP14115781 A JP 14115781A JP 14115781 A JP14115781 A JP 14115781A JP S5842152 A JPS5842152 A JP S5842152A
Authority
JP
Japan
Prior art keywords
signal
vertical
scanning
horizontal
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14115781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6332221B2 (ru
Inventor
Shigetomo Yamazaki
山崎　茂朋
Masahiro Inoue
雅裕 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akashi Seisakusho KK
Original Assignee
Akashi Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akashi Seisakusho KK filed Critical Akashi Seisakusho KK
Priority to JP14115781A priority Critical patent/JPS5842152A/ja
Publication of JPS5842152A publication Critical patent/JPS5842152A/ja
Publication of JPS6332221B2 publication Critical patent/JPS6332221B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP14115781A 1981-09-08 1981-09-08 走査荷電粒子線による試料のアニール加熱装置 Granted JPS5842152A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14115781A JPS5842152A (ja) 1981-09-08 1981-09-08 走査荷電粒子線による試料のアニール加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14115781A JPS5842152A (ja) 1981-09-08 1981-09-08 走査荷電粒子線による試料のアニール加熱装置

Publications (2)

Publication Number Publication Date
JPS5842152A true JPS5842152A (ja) 1983-03-11
JPS6332221B2 JPS6332221B2 (ru) 1988-06-29

Family

ID=15285450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14115781A Granted JPS5842152A (ja) 1981-09-08 1981-09-08 走査荷電粒子線による試料のアニール加熱装置

Country Status (1)

Country Link
JP (1) JPS5842152A (ru)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158861A (en) * 1978-05-12 1979-12-15 Philips Nv Method of and device for injecting ion
JPS5679438A (en) * 1979-12-04 1981-06-30 Toshiba Corp Working device for charged particle beam

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158861A (en) * 1978-05-12 1979-12-15 Philips Nv Method of and device for injecting ion
JPS5679438A (en) * 1979-12-04 1981-06-30 Toshiba Corp Working device for charged particle beam

Also Published As

Publication number Publication date
JPS6332221B2 (ru) 1988-06-29

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