JPS5840828A - 自動枚葉処理型プラズマ反応処理装置 - Google Patents

自動枚葉処理型プラズマ反応処理装置

Info

Publication number
JPS5840828A
JPS5840828A JP8567782A JP8567782A JPS5840828A JP S5840828 A JPS5840828 A JP S5840828A JP 8567782 A JP8567782 A JP 8567782A JP 8567782 A JP8567782 A JP 8567782A JP S5840828 A JPS5840828 A JP S5840828A
Authority
JP
Japan
Prior art keywords
wafer
plasma reaction
conveyor
processing
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8567782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0219969B2 (ko
Inventor
Akira Uehara
植原　晃
Hiroyuki Kiyota
清田　浩之
Juichi Miyazaki
宮崎　重一
Hisashi Nakane
中根　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO DENSHI KAGAKU KABUSHIKI
Tokyo Denshi Kagaku KK
Original Assignee
TOKYO DENSHI KAGAKU KABUSHIKI
Tokyo Denshi Kagaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO DENSHI KAGAKU KABUSHIKI, Tokyo Denshi Kagaku KK filed Critical TOKYO DENSHI KAGAKU KABUSHIKI
Priority to JP8567782A priority Critical patent/JPS5840828A/ja
Publication of JPS5840828A publication Critical patent/JPS5840828A/ja
Publication of JPH0219969B2 publication Critical patent/JPH0219969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Automatic Assembly (AREA)
  • Feeding Of Workpieces (AREA)
  • Structure Of Belt Conveyors (AREA)
  • Framework For Endless Conveyors (AREA)
  • Drying Of Semiconductors (AREA)
JP8567782A 1982-05-22 1982-05-22 自動枚葉処理型プラズマ反応処理装置 Granted JPS5840828A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8567782A JPS5840828A (ja) 1982-05-22 1982-05-22 自動枚葉処理型プラズマ反応処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8567782A JPS5840828A (ja) 1982-05-22 1982-05-22 自動枚葉処理型プラズマ反応処理装置

Publications (2)

Publication Number Publication Date
JPS5840828A true JPS5840828A (ja) 1983-03-09
JPH0219969B2 JPH0219969B2 (ko) 1990-05-07

Family

ID=13865459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8567782A Granted JPS5840828A (ja) 1982-05-22 1982-05-22 自動枚葉処理型プラズマ反応処理装置

Country Status (1)

Country Link
JP (1) JPS5840828A (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62130515A (ja) * 1985-12-02 1987-06-12 Toshiba Mach Co Ltd 半導体製造装置
JPH01148220U (ko) * 1988-03-31 1989-10-13
JPH08188215A (ja) * 1994-12-29 1996-07-23 Sony Corp 搬送装置
JP2016098065A (ja) * 2014-11-20 2016-05-30 東京技研工業株式会社 ワイヤー搬送装置用間隔調整具

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421174A (en) * 1977-07-18 1979-02-17 Tokyo Ouka Kougiyou Kk Plasma reaction processor
JPS5457867A (en) * 1977-10-17 1979-05-10 Nichiden Varian Kk Vacuum processor with automatic wafer feeder

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421174A (en) * 1977-07-18 1979-02-17 Tokyo Ouka Kougiyou Kk Plasma reaction processor
JPS5457867A (en) * 1977-10-17 1979-05-10 Nichiden Varian Kk Vacuum processor with automatic wafer feeder

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62130515A (ja) * 1985-12-02 1987-06-12 Toshiba Mach Co Ltd 半導体製造装置
JPH0616488B2 (ja) * 1985-12-02 1994-03-02 東芝機械株式会社 半導体製造装置
JPH01148220U (ko) * 1988-03-31 1989-10-13
JPH08188215A (ja) * 1994-12-29 1996-07-23 Sony Corp 搬送装置
JP2016098065A (ja) * 2014-11-20 2016-05-30 東京技研工業株式会社 ワイヤー搬送装置用間隔調整具

Also Published As

Publication number Publication date
JPH0219969B2 (ko) 1990-05-07

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