JPS5457867A - Vacuum processor with automatic wafer feeder - Google Patents

Vacuum processor with automatic wafer feeder

Info

Publication number
JPS5457867A
JPS5457867A JP12433777A JP12433777A JPS5457867A JP S5457867 A JPS5457867 A JP S5457867A JP 12433777 A JP12433777 A JP 12433777A JP 12433777 A JP12433777 A JP 12433777A JP S5457867 A JPS5457867 A JP S5457867A
Authority
JP
Japan
Prior art keywords
automatic wafer
vacuum processor
wafer feeder
feeder
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12433777A
Other languages
Japanese (ja)
Inventor
Nobuyuki Takahashi
Jiyuichi Abe
Riyuuji Sugimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICHIDEN VARIAN KK
Original Assignee
NICHIDEN VARIAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICHIDEN VARIAN KK filed Critical NICHIDEN VARIAN KK
Priority to JP12433777A priority Critical patent/JPS5457867A/en
Publication of JPS5457867A publication Critical patent/JPS5457867A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP12433777A 1977-10-17 1977-10-17 Vacuum processor with automatic wafer feeder Pending JPS5457867A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12433777A JPS5457867A (en) 1977-10-17 1977-10-17 Vacuum processor with automatic wafer feeder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12433777A JPS5457867A (en) 1977-10-17 1977-10-17 Vacuum processor with automatic wafer feeder

Publications (1)

Publication Number Publication Date
JPS5457867A true JPS5457867A (en) 1979-05-10

Family

ID=14882838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12433777A Pending JPS5457867A (en) 1977-10-17 1977-10-17 Vacuum processor with automatic wafer feeder

Country Status (1)

Country Link
JP (1) JPS5457867A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57152141A (en) * 1981-03-17 1982-09-20 Nec Kyushu Ltd Inspecting device for semiconductor substrate
JPS5840828A (en) * 1982-05-22 1983-03-09 Tokyo Denshi Kagaku Kabushiki Automatic sheet fed type plasma reaction treatment device
JPS58118124A (en) * 1982-01-06 1983-07-14 Hitachi Ltd Wafer loading method
JPS58120654U (en) * 1982-02-10 1983-08-17 日本電気ホームエレクトロニクス株式会社 Wafer transfer device
JPS6027141A (en) * 1983-07-25 1985-02-12 Ushio Inc Wafer setting mechanism
JPS60167346A (en) * 1984-12-21 1985-08-30 Hitachi Ltd Wafer pushing-up device
JPS63202917A (en) * 1987-02-18 1988-08-22 Tokyo Electron Ltd Ashing system
JPS63308921A (en) * 1987-05-14 1988-12-16 バルツァース・アクチェンゲゼルシャフト Plasma reactor equipped with vacuum load lock
JPH02224237A (en) * 1990-01-16 1990-09-06 Hitachi Ltd Vacuum treatment method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845178A (en) * 1971-09-23 1973-06-28
JPS5039070A (en) * 1973-06-29 1975-04-10
JPS5193158A (en) * 1975-02-13 1976-08-16

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845178A (en) * 1971-09-23 1973-06-28
JPS5039070A (en) * 1973-06-29 1975-04-10
JPS5193158A (en) * 1975-02-13 1976-08-16

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57152141A (en) * 1981-03-17 1982-09-20 Nec Kyushu Ltd Inspecting device for semiconductor substrate
JPS58118124A (en) * 1982-01-06 1983-07-14 Hitachi Ltd Wafer loading method
JPS58120654U (en) * 1982-02-10 1983-08-17 日本電気ホームエレクトロニクス株式会社 Wafer transfer device
JPS5840828A (en) * 1982-05-22 1983-03-09 Tokyo Denshi Kagaku Kabushiki Automatic sheet fed type plasma reaction treatment device
JPH0219969B2 (en) * 1982-05-22 1990-05-07 Tokyo Ohka Kogyo Co Ltd
JPS6027141A (en) * 1983-07-25 1985-02-12 Ushio Inc Wafer setting mechanism
JPS6334622B2 (en) * 1983-07-25 1988-07-11 Ushio Electric Inc
JPS60167346A (en) * 1984-12-21 1985-08-30 Hitachi Ltd Wafer pushing-up device
JPS624856B2 (en) * 1984-12-21 1987-02-02 Hitachi Ltd
JPS63202917A (en) * 1987-02-18 1988-08-22 Tokyo Electron Ltd Ashing system
JPS63308921A (en) * 1987-05-14 1988-12-16 バルツァース・アクチェンゲゼルシャフト Plasma reactor equipped with vacuum load lock
JPH02224237A (en) * 1990-01-16 1990-09-06 Hitachi Ltd Vacuum treatment method

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