JPS5457867A - Vacuum processor with automatic wafer feeder - Google Patents
Vacuum processor with automatic wafer feederInfo
- Publication number
- JPS5457867A JPS5457867A JP12433777A JP12433777A JPS5457867A JP S5457867 A JPS5457867 A JP S5457867A JP 12433777 A JP12433777 A JP 12433777A JP 12433777 A JP12433777 A JP 12433777A JP S5457867 A JPS5457867 A JP S5457867A
- Authority
- JP
- Japan
- Prior art keywords
- automatic wafer
- vacuum processor
- wafer feeder
- feeder
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12433777A JPS5457867A (en) | 1977-10-17 | 1977-10-17 | Vacuum processor with automatic wafer feeder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12433777A JPS5457867A (en) | 1977-10-17 | 1977-10-17 | Vacuum processor with automatic wafer feeder |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5457867A true JPS5457867A (en) | 1979-05-10 |
Family
ID=14882838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12433777A Pending JPS5457867A (en) | 1977-10-17 | 1977-10-17 | Vacuum processor with automatic wafer feeder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5457867A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57152141A (en) * | 1981-03-17 | 1982-09-20 | Nec Kyushu Ltd | Inspecting device for semiconductor substrate |
JPS5840828A (en) * | 1982-05-22 | 1983-03-09 | Tokyo Denshi Kagaku Kabushiki | Automatic sheet fed type plasma reaction treatment device |
JPS58118124A (en) * | 1982-01-06 | 1983-07-14 | Hitachi Ltd | Wafer loading method |
JPS58120654U (en) * | 1982-02-10 | 1983-08-17 | 日本電気ホームエレクトロニクス株式会社 | Wafer transfer device |
JPS6027141A (en) * | 1983-07-25 | 1985-02-12 | Ushio Inc | Wafer setting mechanism |
JPS60167346A (en) * | 1984-12-21 | 1985-08-30 | Hitachi Ltd | Wafer pushing-up device |
JPS63202917A (en) * | 1987-02-18 | 1988-08-22 | Tokyo Electron Ltd | Ashing system |
JPS63308921A (en) * | 1987-05-14 | 1988-12-16 | バルツァース・アクチェンゲゼルシャフト | Plasma reactor equipped with vacuum load lock |
JPH02224237A (en) * | 1990-01-16 | 1990-09-06 | Hitachi Ltd | Vacuum treatment method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4845178A (en) * | 1971-09-23 | 1973-06-28 | ||
JPS5039070A (en) * | 1973-06-29 | 1975-04-10 | ||
JPS5193158A (en) * | 1975-02-13 | 1976-08-16 |
-
1977
- 1977-10-17 JP JP12433777A patent/JPS5457867A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4845178A (en) * | 1971-09-23 | 1973-06-28 | ||
JPS5039070A (en) * | 1973-06-29 | 1975-04-10 | ||
JPS5193158A (en) * | 1975-02-13 | 1976-08-16 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57152141A (en) * | 1981-03-17 | 1982-09-20 | Nec Kyushu Ltd | Inspecting device for semiconductor substrate |
JPS58118124A (en) * | 1982-01-06 | 1983-07-14 | Hitachi Ltd | Wafer loading method |
JPS58120654U (en) * | 1982-02-10 | 1983-08-17 | 日本電気ホームエレクトロニクス株式会社 | Wafer transfer device |
JPS5840828A (en) * | 1982-05-22 | 1983-03-09 | Tokyo Denshi Kagaku Kabushiki | Automatic sheet fed type plasma reaction treatment device |
JPH0219969B2 (en) * | 1982-05-22 | 1990-05-07 | Tokyo Ohka Kogyo Co Ltd | |
JPS6027141A (en) * | 1983-07-25 | 1985-02-12 | Ushio Inc | Wafer setting mechanism |
JPS6334622B2 (en) * | 1983-07-25 | 1988-07-11 | Ushio Electric Inc | |
JPS60167346A (en) * | 1984-12-21 | 1985-08-30 | Hitachi Ltd | Wafer pushing-up device |
JPS624856B2 (en) * | 1984-12-21 | 1987-02-02 | Hitachi Ltd | |
JPS63202917A (en) * | 1987-02-18 | 1988-08-22 | Tokyo Electron Ltd | Ashing system |
JPS63308921A (en) * | 1987-05-14 | 1988-12-16 | バルツァース・アクチェンゲゼルシャフト | Plasma reactor equipped with vacuum load lock |
JPH02224237A (en) * | 1990-01-16 | 1990-09-06 | Hitachi Ltd | Vacuum treatment method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5425187A (en) | Photoelectric semiconductor | |
JPS5619074A (en) | Automatic zerooradiography processor | |
JPS54146380A (en) | Automatic small pie feeder | |
JPS5457867A (en) | Vacuum processor with automatic wafer feeder | |
JPS5460874A (en) | Wafer | |
GB2001724B (en) | Vacuum chucks | |
JPS5420567A (en) | Automatic feeder | |
JPS5414294A (en) | Automatic sample feeder | |
JPS5424732A (en) | Automatic weatherrsensing water feeder | |
JPS5470679A (en) | Automatic hemadynamometer | |
JPS5473371A (en) | Automatic material feeder | |
JPS5492891A (en) | Automatic egg feeder | |
JPS541579A (en) | Automatic plate feeder | |
SU689966A1 (en) | Vacuum feeder | |
JPS5366055A (en) | Automatic vacuum dryer | |
SU638169A2 (en) | Vacuum integrated circuit | |
JPS5386358A (en) | Automatic husker | |
JPS5467500A (en) | Envelope processor | |
JPS5493884A (en) | Automatic hemadynamometer | |
JPS53125818A (en) | Automatic palyer | |
JPS554687A (en) | Automatic count adjustment device | |
JPS5364447A (en) | Automatic coaxial multipolar inverter | |
JPS5465377A (en) | Vacuum bulb | |
JPS5474571A (en) | Automatic material feeder | |
JPS53117532A (en) | Automatic harvester |