JPS5837719B2 - ハイブリツドマイクロカイロソウチト ソノセイゾウホウホウ - Google Patents
ハイブリツドマイクロカイロソウチト ソノセイゾウホウホウInfo
- Publication number
- JPS5837719B2 JPS5837719B2 JP49114794A JP11479474A JPS5837719B2 JP S5837719 B2 JPS5837719 B2 JP S5837719B2 JP 49114794 A JP49114794 A JP 49114794A JP 11479474 A JP11479474 A JP 11479474A JP S5837719 B2 JPS5837719 B2 JP S5837719B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- marking
- sonoseizouhouhou
- sochito
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C11/00—Auxiliary processes in photography
- G03C11/02—Marking or applying text
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0514—Photodevelopable thick film, e.g. conductive or insulating paste
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/16—Inspection; Monitoring; Aligning
- H05K2203/161—Using chemical substances, e.g. colored or fluorescent, for facilitating optical or visual inspection
-
- H10W72/5449—
-
- H10W72/932—
-
- H10W90/754—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Structure Of Printed Boards (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40452573A | 1973-10-09 | 1973-10-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5065872A JPS5065872A (enExample) | 1975-06-03 |
| JPS5837719B2 true JPS5837719B2 (ja) | 1983-08-18 |
Family
ID=23599946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49114794A Expired JPS5837719B2 (ja) | 1973-10-09 | 1974-10-07 | ハイブリツドマイクロカイロソウチト ソノセイゾウホウホウ |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5837719B2 (enExample) |
| DE (1) | DE2443850C3 (enExample) |
| FR (1) | FR2247049B1 (enExample) |
| GB (1) | GB1471163A (enExample) |
| IL (1) | IL45626A (enExample) |
| IT (1) | IT1019493B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5930545Y2 (ja) * | 1976-09-28 | 1984-08-31 | 日本電気株式会社 | 印刷配線板 |
| FR2381627B1 (fr) * | 1978-01-20 | 1983-06-10 | Ibm | Procede de formation de caracteres sur des touches de clavier et touches de clavier portant des caracteres formes selon ce procede |
| GB2182207B (en) * | 1985-10-29 | 1988-12-14 | Marconi Instruments Ltd | Electrical circuit identification |
| US4668603A (en) * | 1986-06-26 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Method of making raised relief circuit board with soldered connections having nomenclature applied thereto |
| GB2211667A (en) * | 1986-12-29 | 1989-07-05 | Motorola Inc | Method for inspecting printed circuit boards for missing or misplaced components |
| CN1025460C (zh) * | 1988-06-17 | 1994-07-13 | 精工爱普生株式会社 | 多功能电子表 |
| JPH05308176A (ja) * | 1992-04-30 | 1993-11-19 | Nec Corp | 印刷配線基板 |
| JP2833521B2 (ja) * | 1995-05-18 | 1998-12-09 | 日本電気株式会社 | 配線基板 |
-
1974
- 1974-09-09 IL IL45626A patent/IL45626A/en unknown
- 1974-09-13 DE DE2443850A patent/DE2443850C3/de not_active Expired
- 1974-10-07 JP JP49114794A patent/JPS5837719B2/ja not_active Expired
- 1974-10-07 IT IT53386/74A patent/IT1019493B/it active
- 1974-10-08 GB GB4354174A patent/GB1471163A/en not_active Expired
- 1974-10-08 FR FR7433876A patent/FR2247049B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IL45626A0 (en) | 1974-11-29 |
| JPS5065872A (enExample) | 1975-06-03 |
| DE2443850A1 (de) | 1975-04-17 |
| IL45626A (en) | 1976-10-31 |
| DE2443850B2 (de) | 1977-09-22 |
| GB1471163A (en) | 1977-04-21 |
| DE2443850C3 (de) | 1980-04-03 |
| FR2247049B1 (enExample) | 1978-05-05 |
| IT1019493B (it) | 1977-11-10 |
| FR2247049A1 (enExample) | 1975-05-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5837719B2 (ja) | ハイブリツドマイクロカイロソウチト ソノセイゾウホウホウ | |
| US6094965A (en) | Semiconductor calibration structures and calibration wafers for ascertaining layer alignment during processing and calibrating multiple semiconductor wafer coating systems | |
| TWI238456B (en) | Composite layer method for minimizing PED effect | |
| JP3146816B2 (ja) | 電子部品の製造方法 | |
| JPS6074624A (ja) | レジスト膜の形成方法 | |
| JPS59141230A (ja) | パタ−ン形成方法 | |
| JPS5931852B2 (ja) | フォトレジスト露光用マスク | |
| JPH0385544A (ja) | レジストパターン形成方法 | |
| KR100688784B1 (ko) | 스텝퍼의 도스 캘리브레이션 방법 | |
| JPS5974552A (ja) | レジスト膜の乾燥硬化方法 | |
| GB2234365A (en) | Strain gauge encapsulation process | |
| JP2710512B2 (ja) | 印刷配線板の製造方法 | |
| JPH03261955A (ja) | 現像方法 | |
| JPS6385601A (ja) | カラ−フイルタ−を有する受光素子の製造方法 | |
| KR100334338B1 (ko) | 인쇄회로기판의 포토 솔더 레지스트 건조방법 | |
| JPH06325913A (ja) | チップ抵抗器の製造方法 | |
| JPH0594904A (ja) | 電子部品のマーキング方法 | |
| JPH03251464A (ja) | 部分凸を有するグレーズの形成方法 | |
| JPS59155930A (ja) | 微細パタ−ンの形成方法 | |
| KR20030053690A (ko) | 얼라인먼트 측정 방법 | |
| JP2589471B2 (ja) | 半導体装置の製造方法 | |
| JPS6337304A (ja) | カラ−フイルタ−の製造方法 | |
| JPH06188538A (ja) | 薄膜回路形成法 | |
| JPH03184323A (ja) | 高段差基板上の高精度レジストパターン形成方法 | |
| JPH08124479A (ja) | シャドウマスクの製造方法 |