JPS58224165A - 真空蒸着装置 - Google Patents
真空蒸着装置Info
- Publication number
- JPS58224165A JPS58224165A JP10621782A JP10621782A JPS58224165A JP S58224165 A JPS58224165 A JP S58224165A JP 10621782 A JP10621782 A JP 10621782A JP 10621782 A JP10621782 A JP 10621782A JP S58224165 A JPS58224165 A JP S58224165A
- Authority
- JP
- Japan
- Prior art keywords
- steel
- differential pressure
- chamber
- transverse direction
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 238000007738 vacuum evaporation Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 5
- 229910000831 Steel Inorganic materials 0.000 abstract description 21
- 239000010959 steel Substances 0.000 abstract description 21
- 238000010894 electron beam technology Methods 0.000 abstract description 11
- 238000007747 plating Methods 0.000 abstract description 9
- 238000007740 vapor deposition Methods 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 238000009434 installation Methods 0.000 abstract 2
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10621782A JPS58224165A (ja) | 1982-06-22 | 1982-06-22 | 真空蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10621782A JPS58224165A (ja) | 1982-06-22 | 1982-06-22 | 真空蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58224165A true JPS58224165A (ja) | 1983-12-26 |
| JPH027394B2 JPH027394B2 (enrdf_load_stackoverflow) | 1990-02-16 |
Family
ID=14427976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10621782A Granted JPS58224165A (ja) | 1982-06-22 | 1982-06-22 | 真空蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58224165A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6211173U (enrdf_load_stackoverflow) * | 1985-07-04 | 1987-01-23 | ||
| DE102010028777A1 (de) * | 2010-05-07 | 2011-11-10 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Entfernung einer Rückseitenbeschichtung auf einem Substrat |
-
1982
- 1982-06-22 JP JP10621782A patent/JPS58224165A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6211173U (enrdf_load_stackoverflow) * | 1985-07-04 | 1987-01-23 | ||
| DE102010028777A1 (de) * | 2010-05-07 | 2011-11-10 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Entfernung einer Rückseitenbeschichtung auf einem Substrat |
| DE102010028777B4 (de) * | 2010-05-07 | 2013-12-05 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Entfernung einer Rückseitenbeschichtung auf einem Substrat |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH027394B2 (enrdf_load_stackoverflow) | 1990-02-16 |
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