JPS58224165A - Vacuum deposition device - Google Patents

Abstract

PURPOSE:To make the temp. distribution in the transverse direction of a band steel uniform, by providing plural pieces of electron beam heaters in one of differential pressure chambers on an inlet side of a band steel or in a vacuum deposition chamber in the transverse direction of the band steel. CONSTITUTION:A band steel 1 is let off from an un-coiler 1' and is introduced through a pretreatment installation 2 and differential pressure chambers 3, 4, 5,- into a vapor deposition chamber 6. Plating metal is vapor deposited on the bottom surface of the steel 1 in the chamber 6, and the band steel is coiled on a recoiler 11 after it is passed through differential pressure chambers 8, 9,- and a post treatment installation 10. An electron beam heater 13 disposed with plural electron beam guns in the transverse direction of the steel 1 is equipped in a differential pressure chamber 12 on the inlet side of the steel 1 in this stage, and the outputs of the individual electron beams are controlled discretely while the steel 1 passes through the chamber 12 so that the temp. in the transverse direction of the steel 1 is made uniform. The uneven plating in the stage of vapor deposition is thus prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum evaporation apparatus for performing copper strips, and more particularly to the above-mentioned apparatus which can make the temperature distribution of the copper strip uniform in the width direction.

In recent years, as a method for continuously forming a galvanized film on a steel strip, in addition to the conventional molten zinc bath method and electroplating method, research has been conducted on a vacuum evaporation plating method due to its advantage over plating only on one side.

Figure 1 is an explanatory diagram of an industrial-scale vacuum evaporation plating line. 1 is a copper strip, 1' is an uncoiler for the raw material coil, and 2 is pretreatment equipment necessary for continuous sheet threading.
It is composed of a looper, pretreatment furnace, etc. 5,4.5
. . . is a differential pressure chamber composed of a partition wall W and a seal roll R, and the pressure is lowered in the order of differential pressure chambers 3, 4.5, . . . by suction by a vacuum pump (not shown), respectively. There is. Reference numeral 6 denotes a deposition chamber, which is suctioned by a vacuum pump (not shown) and set to a medium-high vacuum atmosphere of usually 1 Torr or less. Reference numeral 7 denotes an evaporation crucible containing plated metal, which is provided in the vapor deposition chamber 6 below the position where the copper strip 1 passes.
While the lower surface of the crucible 7 passes over the crucible 7, plating metal is deposited.

8, 9... are the differential pressure chambers 4, 5, 6...
In the differential pressure chamber with the same configuration as , the pressure increases in the order of 8, 9, and so on. 10 is post-processing equipment, including rehera, roopa,
It is composed of Sha, etc. 11 is plated steel strip 1
The arrow in the figure indicates the direction of movement of the steel strip 1.

By the way, in the plating line as shown in Fig. 1, since there is a pressure difference between the differential pressure chambers, atmospheric gas flows from the high pressure chamber to the low pressure chamber through the gap in the round roll R section, and In the sole roll R section, since the steel strip 1 is sandwiched between a pair of upper and lower seal rolls 8, atmospheric gas flows through the gap between both ends of the copper strip 1.

Therefore, both ends of the steel strip 1 are cooled by the gas flow, and a temperature distribution occurs in the width direction of the copper strip 10. A temperature distribution in the width direction causes uneven plating during vapor deposition.

The present invention has been made in order to eliminate the temperature distribution in the width direction that causes this uneven plating. Alternatively, the present invention relates to a vacuum evaporation apparatus that can make the temperature distribution in the width direction of the copper strip uniform by providing a plurality of electron beam heating devices in the width direction of the copper strip in the vacuum evaporation chamber.

) Hereinafter, the apparatus of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 2 is a diagram showing an embodiment of the apparatus of the present invention.

In FIG. 2, the same reference numerals as in FIG. 1 indicate the same functional parts as in FIG. Those with a torque of about 1 to 1 or less are selected.

The differential pressure chamber 12 is equipped with an electron beam heating device 13 in which a plurality of electron beam cans are arranged in the width direction of the steel strip 1, and while the steel strip 1 passes through the differential pressure chamber 12, each individual The outputs of the electronic heat guns are individually controlled, thereby making the temperature of the steel strip 1 uniform in the width direction.

Note that the electron beam heating device 16 may be installed in front of the evaporation crucible 7 in the deposition chamber 6.

In the apparatus of the present invention, the reason why a pressure differential chamber in which the electron beam heating device is installed is selected to be one with a pressure of about 1 torr or less, or the reason why the pressure is about 1 torr or less is selected as the differential pressure chamber in which the electron beam heating device is installed, or the electron beam heating The reason for providing this is as follows.

In other words, the temperature drop at the end of the steel strip due to the gas flow in the R section of the roll roll decreases rapidly when the atmospheric pressure becomes 1 torr or less, so in a differential pressure chamber where the pressure is about 1 torr or less, If the temperature distribution in the width direction of the steel strip 1 is made uniform, the subsequent temperature drop at the end of the steel strip 1 in the differential pressure chamber can be ignored. It can be supplied to From this, it goes without saying that it is highly preferable to provide an electronic heat heating device in front of the evaporation crucible in the evaporation chamber.

[Brief explanation of drawings]

Figure 1 is a diagram for explaining a normal vacuum evaporation device, Figure 2
The figure is a diagram for explaining one embodiment of the apparatus of the present invention. Sub-agents 1) Meifuku agent Ryo Hagiwara -

Claims (1)

[Claims] In a continuous vacuum evaporation apparatus in which a plurality of differential pressure chambers are arranged before and after a vacuum evaporation chamber, an electronic beam heating device is provided in at least one of the differential pressure chambers on the entrance side of the copper strip or in the evaporation chamber. A vacuum evaporation device characterized in that a plurality of are provided in the width direction of a copper strip.