JPS60116787A - Method and device for plating - Google Patents

Method and device for plating

Info

Publication number
JPS60116787A
JPS60116787A JP22427783A JP22427783A JPS60116787A JP S60116787 A JPS60116787 A JP S60116787A JP 22427783 A JP22427783 A JP 22427783A JP 22427783 A JP22427783 A JP 22427783A JP S60116787 A JPS60116787 A JP S60116787A
Authority
JP
Japan
Prior art keywords
plating
vacuum
steel strip
plated
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22427783A
Other languages
Japanese (ja)
Inventor
Heizaburo Furukawa
古川 平三郎
Yoshio Shimozato
下里 省夫
Tetsuyoshi Wada
哲義 和田
Mitsuo Kato
光雄 加藤
Norio Tsukiji
築地 憲夫
Toshiharu Kikko
橘高 敏晴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP22427783A priority Critical patent/JPS60116787A/en
Publication of JPS60116787A publication Critical patent/JPS60116787A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • C25D5/36Pretreatment of metallic surfaces to be electroplated of iron or steel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To perform two-layered single metallic plating and two-layered alloy plating with high productivity and at a low cost by subjecting the surface of a steel strip to combined plating of a vacuum deposition plating method and an electroplating method. CONSTITUTION:A steel strip 18 is heated in an oxygen free furnace 1 to remove the rolling mill lubricant sticking to the surface thereof in the stage of cold rolling by evaporation and is defatted. The strip is then heated and soaked and at the same time the surface is activated in the 1st and 2nd heating zones 2, 3. Such strip is passed through a quick cooling zone 4 and a controlled cooling zone 5 and is annealed in an overaging zone 6, by which the tensile strength, yield point, elongation, Lankford value and crystal grain size of the steel strip as a blank plate for plating are adjusted. The steel plate is introduced, in succession thereto, into a vacuum sealing device 8 via a nitrogen replacing chamber 7 and seal rolls 7. Vapor 9 of molten Zn 11 is then plated by vapor deposition on one surface of the strip 18 in a vacuum deposition device 10. Zn is likewise plated by vapor deposition on the other surface in a vacuum deposition device 10'. The steel strip is passed through a vacuum sealing device 8' and a nitrogen replacing chamber 7' and is electroplated thereon with Zn in an electrogalvanizing cell 15. The above-mentioned method is also utilizable for an alloy in place of single metal such as Zn.

Description

【発明の詳細な説明】 本発明は、真空蒸着メッキ法と電気メツキ法を組合せた
メッキ法ならびにその装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plating method that combines a vacuum evaporation plating method and an electroplating method, and an apparatus therefor.

メッキ法としては、溶融メッキ法、電気メツキ法、真空
蒸着メッキ法等が知られている。以下に、これらのメッ
キ法を鋼板に適用する場合につき説明する。
As the plating method, hot-dip plating method, electroplating method, vacuum evaporation plating method, etc. are known. Below, the case where these plating methods are applied to a steel plate will be explained.

溶融メッキ法は、溶融メッキ槽に帯鋼を浸漬したあと、
該メッキ槽の直上で気体ノズルより気体を吹付けること
でメッキ膜厚の制御を行っているが、通板速度が速くな
ると帯鋼に付着して、該メッキ槽から多量の溶融亜鉛が
汲み上げられ、気体ノズルで目的の膜厚に吹拭すること
が困難になってくる。特に、片面当り509/!!12
の如き薄膜厚を目標に通板速度を上げようとしても、約
100m/min以下の速度しか得られないため、生産
性が悪ろく、メッキ鋼板のトン当シ単価が高いものとな
る。
In the hot-dip plating method, after immersing the steel strip in a hot-dip plating tank,
The thickness of the plating film is controlled by spraying gas from a gas nozzle directly above the plating tank, but as the threading speed increases, it adheres to the steel strip and a large amount of molten zinc is pumped up from the plating tank. , it becomes difficult to wipe the film to the desired thickness using a gas nozzle. Especially, 509/ per side! ! 12
Even if an attempt is made to increase the sheet threading speed with the goal of achieving such a thin film thickness, the speed is only about 100 m/min or less, resulting in poor productivity and a high price per ton of plated steel sheets.

電気メツキ法は、最近の高電流密度、例えば100アン
ペア/ 6m2以上を採用したとしても、片面当J20
J/m2の膜厚を目標に2001117winの通板速
度で通板する場合、メッキ槽の数が非常に多くなシ、消
費電力も美大なものとなる。さらに、片面@ j) 3
097 m 〜4011/rn2の膜厚を目標にすると
、通板速度を落すことになシ、生産性が悪ろく、消費電
力も多大となシ、メッキ鋼板のトン当り単価が高いもの
になる。
Even if the electroplating method uses recent high current densities such as 100 amperes/6 m2 or more, the current density per side is J20.
When passing a plate at a threading speed of 2001117win with the goal of a film thickness of J/m2, the number of plating baths is extremely large and the power consumption is also enormous. In addition, one side @ j) 3
If a film thickness of 097 m to 4011/rn2 is targeted, the sheet passing speed will be reduced, productivity will be poor, power consumption will be large, and the unit price per ton of plated steel sheet will be high.

真空蒸着メッキ法は、10 l / ra’〜120I
/m’、(片面で)の膜厚な2.00 m / min
〜300m / winの速い通板速度で通板ができ、
かつメッキ膜厚の範囲が広いという有利性があり、また
生産性が高く、メッキ鋼板のトン当り単価が安くなると
いう利点があるが、合金メッキ、あるいは二層メッキが
現時点での技術ではむつかしいという不利がある。−力
、最近の自動車用表面処理鋼板の品質は、合金メッキ、
あるいは二層メッキへと高められて行きつつある。
Vacuum evaporation plating method is 10l/ra'~120I
/m', film thickness (on one side) of 2.00 m/min
It is possible to thread the material at a fast threading speed of ~300m/win.
It also has the advantage of having a wide range of plating film thicknesses, high productivity, and low unit price per ton of plated steel sheets, but alloy plating or double-layer plating is difficult with current technology. There is a disadvantage. -The quality of recent surface-treated steel sheets for automobiles includes alloy plating,
Or, it is becoming more advanced to double-layer plating.

以上のように、従来の溶融メッキ法及び電気メツキ法は
、それぞれ一長一短がある。そこで着目さfL#めた真
空蒸着メッキが工業化され始め、亜鉛の真空蒸着メッキ
は、その成品品質において、純亜鉛の電気メツキ成品の
品質と同等以上の品質が得られるに至ったが、塗装下地
処理の化成処理性及びスポット溶接性において、純亜鉛
メッキは合金メッキ、特に亜鉛/鉄(Zn−Fe)合金
メッキに比べ若干劣るという評価が定着しつつある状況
になりつつある。
As described above, the conventional hot-dip plating method and the conventional electroplating method each have advantages and disadvantages. Vacuum evaporation plating began to be industrialized, and the quality of vacuum evaporation plating of zinc was equal to or higher than that of pure zinc electroplated products. In terms of chemical conversion properties and spot weldability, pure zinc plating is becoming increasingly regarded as being slightly inferior to alloy plating, especially zinc/iron (Zn-Fe) alloy plating.

以下に、帯鋼への亜鉛の真空蒸着メッキ法についてさら
に説明を加える。
Below, further explanation will be added about the vacuum evaporation plating method of zinc on a steel strip.

冷延後の圧延油の付着した帯鋼を直火形無酸化炉に導き
、帯鋼を約600Cに昇温させて付着した圧延油を気化
蒸発させることにより除去すると同時に該帯鋼を予熱し
、次いで加熱帯と称する炉に導き、冷延により加工硬化
した帯鋼を約600〜850Cに加熱し、さらに急冷帯
、′調整冷却帯、過時効帯に順次導いて焼鈍することに
より、メッキ原板として要求される引張強さ、降伏点、
伸び、ランクフォード値(r)、結晶粒径に調整したあ
と、真空蒸着セクションへ導き、真空度約1トール〜1
0−4)−ルの真空室で、亜鉛の真空蒸着を帯鋼の片面
あるいは両面へ行っていた。しかしながら、このような
亜鉛の真空蒸着メッキは、純亜鉛のメッキであり、例え
ば自動車用耐食材料を考えた場合、塗装前のメッキ面へ
の化成処理性、あるいは亜鉛面へのスポット溶接性等に
おいて、最近開発されている合金電気メツキ鋼板に比較
して多少劣る。
The steel strip with rolling oil adhered to it after cold rolling is led to a direct-fired non-oxidizing furnace, and the steel strip is heated to about 600C to vaporize and remove the attached rolling oil, and at the same time, the steel strip is preheated. Next, the steel strip that has been work-hardened by cold rolling is introduced into a furnace called a heating zone, heated to approximately 600 to 850C, and then sequentially introduced into a quenching zone, a conditioning cooling zone, and an overaging zone for annealing, thereby producing a plated original plate. Tensile strength, yield point, required as
After adjusting the elongation, Lankford value (r), and crystal grain size, it is led to the vacuum deposition section where the degree of vacuum is approximately 1 Torr to 1 Torr.
0-4) - Vacuum deposition of zinc was performed on one or both sides of the steel strip in a vacuum chamber. However, such vacuum evaporation zinc plating is pure zinc plating, and when considering corrosion-resistant materials for automobiles, for example, it is difficult to chemically treat the plated surface before painting or spot weld to the zinc surface. , which is somewhat inferior to the recently developed alloy electroplated steel sheets.

そこで1本発明者等は、化成処理性及びスポット溶接性
改善のために、真空蒸着メツ中層の上に片面当り5〜I
OA’/llI2程度の薄い合金メッキを電気メツキ法
によりメッキすることで真空蒸着メッキの欠点を補うこ
とにした。片面当り5〜10Jl/+a2程度の薄い膜
厚メッキは、電気メツキ法の最も善意とするものであり
、生産性をそこなうものではなく、また真空蒸着メッキ
&は、片71 当す’ 、0 &/ +2〜1201 
/ ya2と薄い膜厚から厚い膜厚までメッキでき、耐
食性は亜鉛の犠牲防食性が膜厚に5依存することから、
真空蒸着メッキで十分確保できる。本発明は、上記両メ
ッキ法の特!を十分主力化、これら真空蒸着メッキ法と
電気メツキ法を組み合せることにより二層単一金属メッ
キ、、4層合金メッキ等の成品を、メッキ鋼板トン当り
低単価で提゛供し得るメッキ方法と、該方法に適した装
置を提案するものである。
Therefore, in order to improve chemical conversion treatment and spot weldability, the present inventors applied 5 to
We decided to compensate for the drawbacks of vacuum evaporation plating by electroplating a thin alloy plating with a thickness of approximately OA'/llI2. Plating with a thin film thickness of about 5 to 10 Jl/+a2 per side is the best of the electroplating method and does not impair productivity. / +2~1201
/ ya2 and can be plated from a thin film thickness to a thick film thickness, and the corrosion resistance is 5% dependent on the film thickness due to the sacrificial corrosion resistance of zinc.
Vacuum evaporation plating is sufficient. The present invention has the advantages of both of the above plating methods! By combining these vacuum evaporation plating methods and electroplating methods, we have developed a plating method that can provide products such as two-layer single metal plating, four-layer alloy plating, etc. at a low unit price per ton of plated steel plate. , proposes an apparatus suitable for this method.

すなわち本発明は、 (1) 真空蒸着メッキ法により単一金属を片面もしく
は両面にメッキした後、電気メツキ法により片面もしく
は両面に単一金属もしくは合金なメ、ツキすることを特
徴とするメッキ方法。
That is, the present invention provides: (1) A plating method characterized by plating a single metal on one or both sides by a vacuum evaporation plating method, and then plating a single metal or an alloy on one or both sides by an electroplating method. .

(2) 被メッキ体の表面活性化のための無酸化炉、被
メッキ体のシ熱設備と焼鈍設備、窒素置換室、真空度を
得るた、めの真空シール装置、真空蒸着設備、大気圧へ
戻すための真空シール装置、窒素置、換室、電気メツキ
装置を、この順序で被メッキ体の走行方向に設けてなる
メッキ装置、 に関するものである。
(2) Non-oxidizing furnace for surface activation of the object to be plated, heating equipment and annealing equipment for the object to be plated, nitrogen substitution chamber, vacuum sealing device to obtain a degree of vacuum, vacuum evaporation equipment, atmospheric pressure The present invention relates to a plating apparatus which includes a vacuum sealing device for returning the object to a plating object, a nitrogen exchange chamber, an electroplating device, and an electroplating device in this order in the traveling direction of the object to be plated.

本発明における亜鉛の真空蒸着メッキは、メッキ前処理
炉、すなわち無酸化炉型焼鈍還元炉で、10〜75%の
N2 で帯鋼表面の金属酸化物を除去し、真空蒸着メッ
キのできる活性な表面に調整すると共に、メッキ厚板に
要求される引張強さ等の諸物件なw4整する。次いで、
N2雰囲気で順次真空度を高めた後、N2 雰囲気の真
空室へ導き、例えば亜鉛を真空蒸着メッキさせ、しかる
後、同様にN2 雰囲気で大気圧へ戻す。N2 雰囲気
は、パイロットプラントの操業試験の結果では露点約−
20tZ’〜−70C1酸素量50 ppm〜0.5 
ppm水素0.1〜1.5%がメッキ良好な値である。
In the vacuum evaporation plating of zinc in the present invention, metal oxides on the surface of the steel strip are removed using 10 to 75% N2 in a plating pretreatment furnace, that is, a non-oxidation annealing reduction furnace, and an active material that can be used for vacuum evaporation plating is removed. In addition to adjusting the surface, various properties such as tensile strength required for plated thick plates are also adjusted. Then,
After successively increasing the degree of vacuum in a N2 atmosphere, the tube is guided into a vacuum chamber with a N2 atmosphere, and, for example, zinc is plated by vacuum evaporation, and then the pressure is returned to atmospheric pressure in a N2 atmosphere. According to the results of the pilot plant operation test, the N2 atmosphere has a dew point of approximately -
20tZ'~-70C1 oxygen amount 50 ppm~0.5
A value of 0.1 to 1.5% ppm hydrogen is good for plating.

N2 雰囲気中にある亜鉛メッキ面あるいは片面の場合
の亜鉛メッキされない鉄面は、活性な表面を保ったまま
である◎そして本発明においては、上記のN2 雰囲気
中の亜鉛の真空蒸着メッキ帯鋼(片面、両面とも)を空
気中に晒すことなく活性な表面を保持したまま電気メツ
キ槽に導入し、例えば自動車用耐食材料として考えられ
ているZn−Fe(亜鉛−鉄)イオンを電気メッキする
。Zn−Fe等の二元金属の電気メッキは、化成処理性
あるいはスポット溶接性のみを満足するメッキ膜厚片面
当り5〜2097m2で十分であり、通常の電気メツキ
設備のように多段のメッキ槽を準備する必要は全くなく
、安−に合金2層メッキを施すことができる。耐食性は
、下層の亜鉛の真空蒸着メッキの膜厚片面当り10〜+
 209/m で目的に応じて自由に選択することがで
きる。
The galvanized surface in the N2 atmosphere or the non-galvanized iron surface in the case of one side remains an active surface ◎And in the present invention, the zinc vacuum-deposited steel strip (single-sided steel) in the N2 atmosphere described above remains active. , both sides) are introduced into an electroplating tank with their active surfaces maintained without being exposed to the air, and electroplated with Zn-Fe (zinc-iron) ions, which are considered as corrosion-resistant materials for automobiles, for example. For electroplating of binary metals such as Zn-Fe, a plating film thickness of 5 to 2097 m2 per side is sufficient to satisfy only chemical conversion treatment or spot weldability, and multi-stage plating baths are required as in normal electroplating equipment. There is no need for preparation at all, and two-layer alloy plating can be performed safely. Corrosion resistance is 10~+ per side of the film thickness of the lower layer zinc vacuum evaporation plating.
209/m 2 and can be freely selected depending on the purpose.

電気メッキは、Zn−Fe系、Zn−Ni系の合金メッ
キ、あるいはZn、Fe、 Ni 、 (Er等の単−
又は二種以上のメッキいずれでもよい。
Electroplating is Zn-Fe alloy plating, Zn-Ni alloy plating, or single-layer plating such as Zn, Fe, Ni, (Er, etc.).
Alternatively, two or more types of plating may be used.

上述のように、真空蒸着メッキと電気メッキを組合せる
本発明によれば、次のような効果を奏することができる
As described above, according to the present invention, which combines vacuum deposition plating and electroplating, the following effects can be achieved.

(1) N2 雰囲気中で活性な表面状態を維持したま
ま一電気メツキ槽へ導くため、従来必要とされていた電
気メッキのための脱脂、酸洗といった工程は不要となる
(1) Since the active surface state is maintained in the N2 atmosphere and the material is led to the electroplating tank, the steps such as degreasing and pickling for electroplating, which were required in the past, are no longer necessary.

(2) 真空蒸着メッキで施した例えば亜鉛メッキも、
・、酸素と反応して亜鉛酸化物となるといった不都合も
なく、純亜鉛状態を維持したまま電気メツキ槽へ導くこ
とができる。
(2) For example, zinc plating applied by vacuum evaporation plating,
・There is no inconvenience of reacting with oxygen to form zinc oxide, and the zinc can be introduced into the electroplating tank while maintaining its pure zinc state.

(3) 電気メッキ槽な複数設置することもでき、これ
により多層メッキを施すこともできる。
(3) A plurality of electroplating tanks can be installed, thereby allowing multilayer plating.

(4) 真空蒸着メッキで例えばZnあるいはZn以外
の金属をメッキしておき、この上に電気メッキで単一金
属あるいは二種以上の金属を合金状態にして、あるいは
合金を、メッキし、二層又は多層メッキを施すことがで
きる。
(4) For example, Zn or a metal other than Zn is plated by vacuum evaporation plating, and then a single metal, an alloy of two or more metals, or an alloy is plated on top of this by electroplating to form a double layer. Alternatively, multilayer plating can be applied.

(5) 真空蒸着メッキを片面のみとし、他面に電気メ
ッキにより蒸着メッキ面とは異なる金属、合金のメッキ
を施すこともできるし、勿論同一金属をメッキすること
もできる。
(5) It is possible to apply vacuum evaporation plating to only one side and electroplating the other side with a metal or alloy different from that of the evaporation plating side, or of course to plate the same metal.

(6) 耐食性は、真空蒸着メッキ法により亜鉛を任意
の膜厚にメッキすることで確保でき、化成処理性あるい
はスポット溶接性等耐食性以外の目的で二層もしくは多
層メッキするための電気メッキで施す膜厚は通常の電気
メツキ装置で施す膜厚より薄くて済むことから、電気メ
ッキする際の電力が少く、かつメッキ槽の数も%〜ハ程
度で十分である。
(6) Corrosion resistance can be ensured by plating zinc to a desired thickness using the vacuum evaporation plating method, or by electroplating for double or multilayer plating for purposes other than corrosion resistance, such as chemical conversion treatment or spot weldability. Since the film thickness is thinner than the film thickness applied by a normal electroplating device, the electric power required for electroplating is small, and the number of plating baths is sufficient.

次に、本発明の装置の一実施態様例を第1図に示す。Next, an example of an embodiment of the apparatus of the present invention is shown in FIG.

帯鋼+8は、無酸化炉1に導かれ、冷延時に付着した圧
延油が直接燃焼バーナで加熱されることにより、約60
0Cで気化蒸発し、脱脂が行われると同時に予熱される
。次に、第1加勢帯2及び第2加熱帯3に導かれ、約6
00〜850Cに加熱ならびに均熱される。第1及び第
2加熱帯は、間接加熱方式であり、炉の雰囲気は水素H
25%〜75%の還元性雰囲気であり、帯鋼18表面の
酸化物が水素H2で還元され、真空蒸着装置で、ある金
属、例えば亜鉛をメッキすることが可能な活性な表面性
状に調整される。
The +8 steel strip is led to the non-oxidation furnace 1, where the rolling oil adhering to it during cold rolling is heated by a direct combustion burner, resulting in approximately 60%
It is vaporized at 0C, degreased, and preheated at the same time. Next, it is guided to the first assisting zone 2 and the second heating zone 3, and is
It is heated and soaked at 00 to 850C. The first and second heating zones are of indirect heating type, and the atmosphere of the furnace is hydrogen H.
It is a reducing atmosphere of 25% to 75%, and oxides on the surface of the steel strip 18 are reduced with hydrogen H2, and a vacuum evaporation device is used to adjust the surface to an active surface that can be plated with a certain metal, such as zinc. Ru.

次(、急冷帯4、調整冷却帯5、過時効処理帯6(いず
れも水素H25〜75%の還元性雰囲気)で焼鈍処理し
、メッキ原板に要求される引張強さ、降伏点、伸び、ラ
ン、クツオード値に)、結晶粒径に調整したあと、窒素
置換室7へ導く。
Next, annealing treatment is performed in quenching zone 4, adjustment cooling zone 5, and overaging treatment zone 6 (all reducing atmospheres containing 25% to 75% hydrogen H) to obtain the tensile strength, yield point, and elongation required for the plated original plate. After adjusting the crystal grain size (to the run and couture values) and the crystal grain size, it is led to the nitrogen substitution chamber 7.

窒素置換M7の雰囲気は、窒素N2 の露点−20C〜
−70TC酸素50 ppm 〜0.5 ppm 、水
素0.1〜Ij%の還元性雰囲気であり、真空蒸着メッ
キを施す原板の表面性状は、過時効帯6で得られた活性
な表面性状をそのまま維持している。また、窒素置換室
7の雰囲気圧力は、760トールの大気圧であり、その
圧力はシールロール17を前後に設けることで維持して
いる。次に、シールロール17で真空シールl、 tt
 カラJE空排気してゆき、真空度を760トールから
逐次高め、1トール〜10”−’ )−ルの真空度を得
る真空シール装置8へ導き、次に真空蒸着装置10で溶
融亜鉛11を加熱し、蒸発させ、蒸発した亜鉛蒸気9を
帯鋼18の片面へ蒸着メッキし、次に帯鋼18の両面ヘ
メツキする場合、もう一つの真空蒸着装置i+σへ導き
、溶融亜鉛11’を加熱し、蒸発させ、蒸発した亜鉛蒸
気ダをもう一方の帯鋼18の面へ真9蒸着メッキを施し
、真空度1トール〜10−’ )−ルを760トールへ
戻す出側真空シール装置ぎへ導き、次に出側窒素置換室
1を経て、入側窒素置換室7と同じ雰囲気を維持したま
ま、電気メツキ槽15へ導く。この場合、出側窒素置換
室7′と電気メツキ槽15を継ぎ、帯鋼+8を大気に晒
すことなく出側窒素置換室1と同一雰囲気を作るフード
12をつける。この場合、メッキ液+6を、窒素置換室
1へ逆流させないため、7−ド12の圧力は、出al!
!素置換室1より若干高い圧力に調整する。13は通電
ロール(通称、コンダクタμm段)であり、14はメッ
キ液鵞6の中に含まれる金属イオンを電気メッキする電
極である。また、1/はシールロールテアル。
The atmosphere of nitrogen substitution M7 has a dew point of nitrogen N2 of -20C~
-70TC is a reducing atmosphere of 50 ppm to 0.5 ppm of oxygen and 0.1 to Ij% of hydrogen, and the surface texture of the original plate to which vacuum evaporation plating is applied is the same as the active surface texture obtained in overaging zone 6. Maintained. Further, the atmospheric pressure in the nitrogen substitution chamber 7 is an atmospheric pressure of 760 torr, and this pressure is maintained by providing seal rolls 17 at the front and rear. Next, vacuum seal l, tt with seal roll 17
The empty JE is evacuated, and the degree of vacuum is gradually increased from 760 torr, leading to a vacuum sealing device 8 to obtain a degree of vacuum of 1 torr to 10''-'), and then molten zinc 11 is deposited in a vacuum evaporation device 10. When heating, evaporating, and vaporizing the evaporated zinc vapor 9 onto one side of the steel strip 18, and then plating both sides of the steel strip 18, the zinc vapor 9 is guided to another vacuum evaporator i+σ to heat the molten zinc 11'. Then, the evaporated zinc vapor is applied to the surface of the other steel strip 18 by vacuum deposition plating, and the vacuum level is returned to 760 Torr (from 1 Torr to 10 Torr). Next, the nitrogen exchange chamber 1 on the outlet side is led to the electroplating tank 15 while maintaining the same atmosphere as the nitrogen exchange chamber 7 on the inlet side.In this case, the nitrogen exchange chamber 7' on the outlet side and the electroplating bath 15 are connected. Attach a hood 12 that creates the same atmosphere as the outlet nitrogen exchange chamber 1 without exposing the steel strip +8 to the atmosphere.In this case, in order to prevent the plating solution +6 from flowing back into the nitrogen exchange chamber 1, the pressure in the 7-door 12 is , out!
! Adjust the pressure to be slightly higher than that in the elementary substitution chamber 1. Reference numeral 13 represents a current-carrying roll (commonly known as a conductor μm stage), and reference numeral 14 represents an electrode for electroplating metal ions contained in the plating solution 6. Also, 1/ is seal roll teal.

かくして、真空蒸着メッキ層の上に、電気メツキ槽でメ
ッキを施し、その後通常の電気メッキと同様、図示しな
い化成処理槽で化成処理を施し、テンションレペラで形
状矯正され℃メッキ帯鋼18は巻取られる。
In this way, plating is applied on the vacuum evaporated plating layer in an electroplating tank, and then chemical conversion treatment is performed in a chemical conversion treatment tank (not shown) in the same way as normal electroplating, and the shape is corrected with a tension repeller to obtain the °C plated steel strip 18. It is wound up.

以下に、実施例を示す。Examples are shown below.

実施例1 第1図に示したフローシートに従い、下記の条件で帯鋼
にメッキを施した。尚、帯鋼の熱処理サイクルは第2図
に示すサイクルとした。
Example 1 According to the flow sheet shown in FIG. 1, a steel strip was plated under the following conditions. The heat treatment cycle for the steel strip was as shown in FIG. 2.

w1素置換室雰囲気ガス: N2の露点 ニー+5sc 02a度 :1〜10ppm N2a度 =1.0% 蒸着金属二亜鉛片面当り709/vn2真空度: 10
−2 )−ル 通板速度:20sa/win 帯鋼寸法:板厚0.6■×板幅500■の冷延後の未焼
鈍コイル 電気メツキ金属:亜鉛片面当り59/■211流密1t
 : 4s y ンヘ7/ am2メッキ液: H21
304# 2 実施例2 下記の条件を変えた以外は実施例1と同様な操作で、帯
鋼にメッキを施した。
w1 Elementary substitution chamber atmospheric gas: N2 dew point knee +5sc 02a degree: 1 to 10 ppm N2a degree = 1.0% 709/vn2 vacuum degree per one side of evaporated metal dizinc: 10
-2) - Threading speed: 20sa/win Steel strip dimensions: Unannealed coil after cold rolling of plate thickness 0.6cm x width 500cm Electroplated metal: Zinc 59/cm per side 211 flow density 1t
: 4s y nhen 7/am2 plating solution: H21
304#2 Example 2 A steel strip was plated in the same manner as in Example 1 except that the following conditions were changed.

電気メッキ金属二亜鉛片面当り10.9/II2電流密
度:907ンベ7 / 6m2 メツキ液: H2So4d 2 実施例1及び2の結果、真空蒸着亜鉛メッキの上に電気
メッキされた亜鉛の加工密着性は、180″での密着曲
げで、曲げ部にクラック及びパウダリングの発生が全く
ないことを確認した。
Electroplated metal dizinc 10.9/II2 per side Current density: 907 mbe 7/6m2 Plating solution: H2So4d2 As a result of Examples 1 and 2, the processing adhesion of zinc electroplated on vacuum evaporated galvanizing is as follows: , 180'', it was confirmed that no cracks or powdering occurred at the bent portion.

実施例3 下記の条件を変え、真空蒸着メッキを片面とした以外は
実施例1と同様な操作で、帯鋼にメッキを施した。
Example 3 A steel strip was plated in the same manner as in Example 1, except that the following conditions were changed and vacuum evaporation plating was applied to one side.

電気メッキ金属二亜鉛/鉄合金メッキ(Fe/Znの比
率は7/3)片面当り+0,9  m2 電流密度ニア07ンベ7/d1112 メツキ液: N2804pJ(2 通板速度:15m/win 上記の真空蒸着で片面亜鉛をメッキし、その上にZn−
Feを電気メッキした二層合金メッキの180°での密
着曲げ試験の結果、曲げ部にクシツク及びパウダリング
の発生が全くないことを確認した。
Electroplated metal dizinc/iron alloy plating (Fe/Zn ratio is 7/3) +0.9 m2 per side Current density near 07mm 7/d1112 Plating liquid: N2804pJ (2 Threading speed: 15m/win Vacuum above) One side is plated with zinc by vapor deposition, and then Zn-
As a result of a close contact bending test at 180° of a two-layer alloy plated with Fe electroplating, it was confirmed that there was no occurrence of clumping or powdering at the bent portion.

また、真空蒸着で亜鉛をメッキしなかった鋼面へのZn
−Feの合金電気メツキ層の180’での密着曲げ試験
の結果も、曲げ部にクラック及びパウダリングの発生が
全くないことが確認された。
In addition, Zn can be applied to steel surfaces that have not been plated with zinc by vacuum evaporation.
The results of the 180' contact bending test of the -Fe alloy electroplated layer also confirmed that there were no cracks or powdering at the bent portion.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明による帯鋼への金属メッキを施すフロ
ーシートを示すものであり、第2図は、本発明の実施例
における帯鋼の熱処理サイクルを示す。 復代理人 内 1) 明 復代理人 萩 原 亮 −
FIG. 1 shows a flow sheet for applying metal plating to a steel strip according to the present invention, and FIG. 2 shows a heat treatment cycle for a steel strip in an embodiment of the present invention. Sub-agents 1) Meifuku agent Ryo Hagiwara -

Claims (1)

【特許請求の範囲】 +1) X空蒸着メッキ法により単一金属を片面もしく
は両面にメッキした後、電気メツキ法によシ単−金属も
しくは合金を片面もしくは両面にメッキすることを特徴
とするメッキ方法。 (2) 被メッキ体の表面活性化のための無酸化炉、被
メッキ体の均熱設備と焼鈍設備、窒素置換室、真空度を
得るための真空シール装置、真空蒸着設備、大気圧へ戻
すための真空シール装置、窒素置換室、電気メツキ装置
を、との順序で被メッキ体の走行方向に設けてなるメッ
キ装置。
[Claims] +1) Plating characterized by plating a single metal on one or both sides by an X-vacuum deposition plating method, and then plating a single metal or an alloy on one or both sides by an electroplating method. Method. (2) Non-oxidizing furnace for surface activation of the object to be plated, soaking equipment and annealing equipment for the object to be plated, nitrogen substitution chamber, vacuum sealing device to obtain a degree of vacuum, vacuum evaporation equipment, return to atmospheric pressure A plating device comprising a vacuum sealing device, a nitrogen purge chamber, and an electroplating device installed in this order in the traveling direction of the object to be plated.
JP22427783A 1983-11-30 1983-11-30 Method and device for plating Pending JPS60116787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22427783A JPS60116787A (en) 1983-11-30 1983-11-30 Method and device for plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22427783A JPS60116787A (en) 1983-11-30 1983-11-30 Method and device for plating

Publications (1)

Publication Number Publication Date
JPS60116787A true JPS60116787A (en) 1985-06-24

Family

ID=16811248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22427783A Pending JPS60116787A (en) 1983-11-30 1983-11-30 Method and device for plating

Country Status (1)

Country Link
JP (1) JPS60116787A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6213571A (en) * 1985-07-11 1987-01-22 Nisshin Steel Co Ltd Method and apparatus for continuous vapor deposition on one side
JPS62240772A (en) * 1986-04-11 1987-10-21 Sumitomo Electric Ind Ltd Production of corrosion resistant member
JPH0324282A (en) * 1989-06-22 1991-02-01 Katayama Tokushu Kogyo Kk Production of steel sheet plated with chromium
CN101948998A (en) * 2010-10-25 2011-01-19 上海应用技术学院 Pre-treatment process of welding tool before physical vapour deposition coating
CN114369796A (en) * 2021-12-31 2022-04-19 重庆金美新材料科技有限公司 Evaporation plating and water plating integrated equipment
CN114481080A (en) * 2021-12-24 2022-05-13 重庆金美新材料科技有限公司 Vacuum plating and water plating integrated equipment and production method of ultrathin copper foil

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641397A (en) * 1979-09-12 1981-04-18 Furukawa Electric Co Ltd:The Copper-group material excellent in resistance to corrosion

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5641397A (en) * 1979-09-12 1981-04-18 Furukawa Electric Co Ltd:The Copper-group material excellent in resistance to corrosion

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6213571A (en) * 1985-07-11 1987-01-22 Nisshin Steel Co Ltd Method and apparatus for continuous vapor deposition on one side
JPH0568546B2 (en) * 1985-07-11 1993-09-29 Nisshin Steel Co Ltd
JPS62240772A (en) * 1986-04-11 1987-10-21 Sumitomo Electric Ind Ltd Production of corrosion resistant member
JPH0324282A (en) * 1989-06-22 1991-02-01 Katayama Tokushu Kogyo Kk Production of steel sheet plated with chromium
CN101948998A (en) * 2010-10-25 2011-01-19 上海应用技术学院 Pre-treatment process of welding tool before physical vapour deposition coating
CN114481080A (en) * 2021-12-24 2022-05-13 重庆金美新材料科技有限公司 Vacuum plating and water plating integrated equipment and production method of ultrathin copper foil
CN114369796A (en) * 2021-12-31 2022-04-19 重庆金美新材料科技有限公司 Evaporation plating and water plating integrated equipment

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