JPH0688208A - Highly corrosion resistant surface treated metallic material and its production - Google Patents

Highly corrosion resistant surface treated metallic material and its production

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Publication number
JPH0688208A
JPH0688208A JP23604392A JP23604392A JPH0688208A JP H0688208 A JPH0688208 A JP H0688208A JP 23604392 A JP23604392 A JP 23604392A JP 23604392 A JP23604392 A JP 23604392A JP H0688208 A JPH0688208 A JP H0688208A
Authority
JP
Japan
Prior art keywords
layer
plating
alloy
vapor
plating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP23604392A
Other languages
Japanese (ja)
Inventor
Masatoshi Iwai
正敏 岩井
Jiyunji Kawafuku
純司 川福
Koji Irie
広司 入江
Haruta Ayabe
東太 綾部
Atsushi Kato
淳 加藤
Shoji Miyake
昭二 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP23604392A priority Critical patent/JPH0688208A/en
Publication of JPH0688208A publication Critical patent/JPH0688208A/en
Withdrawn legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To produce the surface treated metallic sheet, such as steel sheet, having excellent corrosion resistance and formability by laminating vapor deposited plating layers of an Al-Ti alloy and pure Al having specific quality on both surfaces of the metallic sheet. CONSTITUTION:The metallic sheet 1, such as steel sheet, is introduced through an inlet side vacuum sealing device 2a into a vacuum vapor deposition chamber 4a and is passed above a vapor deposition chamber 6a contg. the Al-Ti alloy 6 consisting of 1 to 30% Ti and the balance Al and a vapor deposition chamber 5b contg. the pure Al 6b. The Al-Ti alloy 6a is evaporated by using a high-energy beam, such as electron beam to form the vapor deposited plating layer of the Al-Ti alloy on one surface of the steel sheet; in succession, the pure Al 6b is evaporated by the electron beam thereon to form the vapor deposited Al layer. These vapor deposited layers are so formed that the ratio of [Al]/[Al-Ti] attains 1/5<=R<=1 when the deposition of the vapor deposited Al layer is expressed as [Al]g/m<2> and the deposition of the vapor deposited Al-Ti alloy layer as [Al-Ti]g/m<2>. The Al-Ti alloy layer and the vapor deposited pure Al layer having the similar compsns. are similarly formed on the opposite surface of the steel sheet in a vacuum vapor deposition chamber 4b.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、建材、家電製品、容
器、自動車等に用いられる耐食性の優れた蒸着めっき表
面処理金属材およびその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor-deposited surface-treated metal material having excellent corrosion resistance, which is used for building materials, home electric appliances, containers, automobiles and the like, and a method for producing the same.

【0002】[0002]

【従来の技術】AlおよびAl合金(以下Al合金で代
表することがある)は鋼に比べて耐食性に優れ、また清
潔感があるため、建材や容器等に汎用されており、また
Al合金を鋼板上にめっきした製品も実用化されてい
る。
2. Description of the Related Art Al and Al alloys (sometimes referred to as "Al alloys" below) are more commonly used in building materials and containers because of their superior corrosion resistance compared to steel and their cleanliness. Products plated on steel sheets have also been put to practical use.

【0003】中でもAlめっき鋼板は生産コストが比較
的安価であるので、Alのもつ優れた耐酸化性、耐食
性、耐熱性を利用して自動車のマフラー、家庭電化製
品、建築材料、ゴミ焼却炉等の過酷な条件下で使用され
る部材として多用されている。
[0003] Above all, since the production cost of Al plated steel sheet is relatively low, the excellent oxidation resistance, corrosion resistance and heat resistance of Al are utilized to make automobile mufflers, household appliances, building materials, garbage incinerators, etc. It is widely used as a member used under severe conditions.

【0004】ところがAlめっき鋼材はCl- のような
陰イオンの存在する環境下においては該イオンによりA
lめっき表面の不働態酸化皮膜が破壊され、Alめっき
表面にAl(OH)3 を主成分とする白錆が発生した
り、孔食(pitting corrosion)が発
生したり、特にAlめっき鋼材の場合更に孔食が進み素
地鋼板の腐食にまで至り赤錆が発生することもある。
[0004] However Al plating steel Cl - A by the ion in the presence environment in which the anions such as
l The passive oxide film on the plating surface is destroyed, white rust mainly composed of Al (OH) 3 is generated on the Al plating surface, and pitting corrosion is generated, especially in the case of Al-plated steel material. Further, pitting corrosion may progress and even the base steel sheet may be corroded, resulting in red rust.

【0005】ところで前記Alめっき金属材は従来主に
溶融めっき方法で製造されているので、Alめっき金属
材の上記欠点を改善して耐食性を良好にするために、A
l浴にZn等の合金化元素を添加することが検討されて
いる。しかし現在の溶融めっき法ではAl溶融浴中に溶
解し得る元素とその量に制限があり、そのため十分な耐
食性を有するものは得られていない。
By the way, since the Al-plated metal material has been conventionally manufactured mainly by a hot dip plating method, in order to improve the above-mentioned defects of the Al-plated metal material and to improve the corrosion resistance, A
The addition of an alloying element such as Zn to the 1-bath has been studied. However, in the current hot dip plating method, the elements that can be dissolved in the Al bath and the amount thereof are limited, and therefore, those having sufficient corrosion resistance have not been obtained.

【0006】また溶融めっき法では金属材を溶融Al中
へ供給通過させるプロセスが不可欠であるので金属材表
面温度が約700℃まで上昇し、例えばAlめっき鋼板
であれば鋼板とAlめっきとの界面にFe2 Al5 など
のFe−Al金属間化合物が生成する。該金属間化合物
は脆い上に成形加工時のめっき剥離等の原因となり加工
性に劣るものとなる。
Further, in the hot dipping method, the process of supplying and passing the metal material into the molten Al is indispensable, so the surface temperature of the metal material rises up to about 700 ° C. For example, in the case of an Al plated steel sheet, the interface between the steel sheet and the Al plating. An Fe-Al intermetallic compound such as Fe 2 Al 5 is generated at. The intermetallic compound is brittle and causes peeling of the plating during molding, resulting in poor workability.

【0007】そこでめっきと素地金属との界面に生ずる
Fe−Al金属間化合物等の生成を抑制するために、溶
融Al浴中にSiを10%程度添加してめっき時のFe
−Al金属間化合物の生成の抑制を図るとともに高温
下、特に400℃以上での使用におけるFe−Al金属
間化合物の生成の抑制(耐熱性)をも図っているが、必
ずしも十分とは言えない。またSiを添加するとAlめ
っき自身の耐食性がかえって低下する。そのためSiを
合金化元素として添加したAlめっき鋼板では、Alめ
っきの耐食性を補う目的でめっき表面にクロメート処理
等の化成処理を行なって薄い保護皮膜を形成させること
が多い。しかしこの保護皮膜がいったん腐食等を受けて
破壊または消失すれば耐食性の不十分なSi添加Alめ
っき層の腐食が発生するので十分な耐食性改善効果を有
しているとは言えない。
Therefore, in order to suppress the formation of Fe-Al intermetallic compounds and the like that occur at the interface between the plating and the base metal, Si is added to the molten Al bath in an amount of about 10%, and Fe during plating is added.
-Al intermetallic compound production is suppressed and the Fe-Al intermetallic compound formation (heat resistance) is also suppressed at high temperatures, especially when used at 400 ° C or higher, but this is not always sufficient. . Moreover, when Si is added, the corrosion resistance of the Al plating itself is rather lowered. Therefore, in an Al-plated steel sheet to which Si is added as an alloying element, a thin protective coating is often formed on the plated surface by chemical conversion treatment such as chromate treatment in order to supplement the corrosion resistance of Al plating. However, once this protective film is destroyed or disappears due to corrosion or the like, corrosion of the Si-added Al plating layer having insufficient corrosion resistance occurs, so it cannot be said to have a sufficient effect of improving corrosion resistance.

【0008】上記の如くAl系溶融めっき金属材には要
求特性の全てを満足するものが見当らず、又溶融めっき
法では製法上薄目付のめっき鋼板を製造することができ
ないという欠点も存在する。
As described above, none of the Al-based hot-dip galvanized metal materials satisfy all of the required characteristics, and the hot-dip galvanizing method has a drawback that it is not possible to manufacture a galvanized steel sheet by the manufacturing method.

【0009】また他のめっき方法として電気めっき法が
あるが、これはZnめっきに多用されているものであ
り、また該めっき法では水溶液中からのAlまたはAl
合金の金属材への電析は不可能であり、非水溶液中から
の電気めっきは原理的には可能であるが電析時の電流密
度が非常に小さいためめっき効率が低く、且つめっき液
の電気的不安定さ等から考えても工業的生産に電気めっ
き法を適用することは難しい。
Another plating method is an electroplating method, which is often used for Zn plating. In the plating method, Al or Al from an aqueous solution is used.
Electrodeposition of metal alloys is not possible, and electroplating from a non-aqueous solution is possible in principle, but the current density at the time of electrodeposition is very small, so plating efficiency is low, and the plating solution Even considering the electrical instability, it is difficult to apply the electroplating method to industrial production.

【0010】[0010]

【発明が解決しようとする課題】こうした事態に対処す
べく、最近、真空蒸着法による乾式Alめっき技術の開
発が進められている。そこで本発明者等は、Al系めっ
き金属材の中で代表的なAl系めっき鋼板における課
題、即ち耐熱性、耐食性および成形加工性を同時に満足
する様な表面処理鋼板の製法を確立すべく真空蒸着めっ
き法について検討し、まず鋼板表面に真空蒸着法によっ
て純Alめっきを施したところ、次の問題点を確認する
に至った。即ちAl蒸着めっき鋼板といえども耐食性は
溶融Alめっき鋼板と同等であり、ハロゲンイオン等の
攻撃に対しては何ら耐食性改善効果を示さない。
In order to deal with such a situation, recently, development of dry Al plating technology by a vacuum vapor deposition method has been advanced. Therefore, the present inventors intend to establish a vacuum method to establish a method of producing a surface-treated steel sheet that simultaneously satisfies the problems of a typical Al-plated steel sheet among Al-plated metal materials, that is, heat resistance, corrosion resistance, and formability. When the vapor deposition plating method was examined, and the surface of the steel sheet was first subjected to pure Al plating by the vacuum vapor deposition method, the following problems were confirmed. That is, even the Al vapor-deposited steel sheet has the same corrosion resistance as the hot-dip Al-plated steel sheet, and does not show any effect of improving the corrosion resistance against the attack of halogen ions or the like.

【0011】本発明はこうした事情に着目してなされた
ものであって、基本的には経済性が高く諸特性に優れる
というAlめっき金属材の特徴を生かしつつ、耐食性、
成形加工性等のより優れた表面処理金属材およびその製
造方法を提供することを目的とするものである。
The present invention has been made in view of these circumstances, and basically, while utilizing the characteristics of the Al-plated metal material that is economical and excellent in various characteristics, corrosion resistance,
An object of the present invention is to provide a surface-treated metal material which is more excellent in moldability and the like, and a method for producing the same.

【0012】[0012]

【課題を解決するための手段】上記課題を解決すること
のできた本発明の高耐食性表面処理金属材は、金属基材
表面に、Tiを1〜30%含有するAl−Ti合金蒸着
めっき層が形成され、更にその上へ純Al蒸着めっき層
が形成されたものであることに要旨を有する。また前記
Al蒸着めっき層の付着量を[Al](g/m2 )、A
l−Ti合金蒸着めっき層の付着量を[Al−Ti]
(g/m2 )としたとき、[Al]/[Al−Ti]で
表わされる付着比率Rが1/5≦R≦1の範囲であるこ
とが好ましい。
The highly-corrosion-resistant surface-treated metal material of the present invention which has been able to solve the above-mentioned problems has an Al-Ti alloy vapor deposition plating layer containing 1 to 30% of Ti on the surface of a metal base material. The gist is that it is formed and a pure Al vapor deposition plating layer is further formed thereon. Further, the adhesion amount of the Al vapor deposition plating layer is [Al] (g / m 2 ), A
1-Ti alloy vapor deposition plating layer adhesion amount [Al-Ti]
When it is (g / m 2 ), the adhesion ratio R represented by [Al] / [Al-Ti] is preferably in the range of 1/5 ≦ R ≦ 1.

【0013】また、本発明の製造方法は、金属基材に連
続的に蒸着めっきを施すにあたり、真空蒸着室内に、該
基材金属の走行方向に対して上流側にAl−Ti合金蒸
発槽、下流側にAl蒸発槽を並設し、各蒸発槽を高エネ
ルギービームで加熱することによりAl−Ti混合蒸気
とAl蒸気を発生させると共に、表面の清浄化された該
金属基材を該真空蒸着室内を通して連続的に走行せし
め、金属表面に蒸着Al/Al−Ti合金系2層めっき
を施すことに要旨を有する。
Further, according to the manufacturing method of the present invention, when the metal base material is continuously vapor-deposited and plated, an Al--Ti alloy evaporation tank is provided in the vacuum vapor deposition chamber on the upstream side with respect to the traveling direction of the base metal, Al evaporation tanks are installed in parallel on the downstream side, and each evaporation tank is heated by a high-energy beam to generate Al-Ti mixed vapor and Al vapor, and the surface-cleaned metal substrate is vacuum-deposited. It has the gist of allowing it to run continuously through a room and performing vapor deposition Al / Al-Ti alloy-based two-layer plating on the metal surface.

【0014】[0014]

【作用】本発明で基材として用いる金属材の種類は特に
限定されず、一般の普通鋼材を初めとして各種ステンレ
ス鋼材、合金鋼材、更にはAlおよびAl合金材、Cu
およびCu合金材、TiおよびTi合金材等が例示され
る。またその形状も板状、波板状、棒状、線状等蒸着め
っきが可能な形状であればいずれにも適用される。以
下、本発明の経緯に沿って説明するが、基材である金属
材としては最も一般的な冷延鋼板を代表的に挙げて説明
を行なう。
The kind of the metal material used as the base material in the present invention is not particularly limited, and general stainless steel materials, various stainless steel materials, alloy steel materials, and also Al and Al alloy materials, Cu
And Cu alloy materials, Ti and Ti alloy materials, and the like. Further, the shape thereof may be any shape such as plate shape, corrugated plate shape, rod shape, and linear shape as long as vapor deposition plating is possible. The following will describe the process of the present invention, but a cold rolled steel sheet, which is the most common metal material as a base material, will be described as a typical example.

【0015】本発明者等は、真空蒸着めっき法を用いて
各種合金化金属を添加したAl合金めっき鋼板を作製
し、耐食性を評価した結果、Al−Ti合金蒸着めっき
鋼板が耐食性に優れていることを見出し、先に出願した
(例えば特開昭64-28359、特開平1-96369 、特開平1-18
4268、特開平1-259159号公報等)。
The inventors of the present invention produced Al alloy-plated steel sheets to which various alloying metals were added by using the vacuum vapor deposition method and evaluated their corrosion resistance. As a result, the Al-Ti alloy vapor-deposited steel sheets are excellent in corrosion resistance. And filed a prior application (for example, Japanese Patent Laid-Open Nos. 64-28359, 1-96369, 1-18
4268, JP-A 1-259159, etc.).

【0016】そこで本発明者等は、蒸着Al−Ti合金
めっき鋼板の耐食性が優れる理由について検討したとこ
ろ、該めっき層中のTiの効果は、塩化物アニオン等が
存在する腐食環境下においてめっき層自身の腐食速度を
低下させるものであり、Tiの添加によってAl−T
i合金の腐食電流密度が低下し、Al−Ti合金自体の
耐孔食性を向上させること、およびTiの添加により
めっき層と基材鋼板との間の電気化学的電位差が小さく
なり、犠牲防食能電流密度が低下するということの複合
効果であることが判明した。
Then, the present inventors examined the reason why the corrosion resistance of the vapor-deposited Al-Ti alloy plated steel sheet is excellent. The effect of Ti in the plated layer is that the plated layer is exposed in a corrosive environment in which chloride anions exist. It reduces the corrosion rate of itself, and the addition of Ti causes Al-T
The corrosion current density of the i alloy decreases, the pitting corrosion resistance of the Al-Ti alloy itself is improved, and the addition of Ti reduces the electrochemical potential difference between the plating layer and the base steel sheet, resulting in sacrificial corrosion resistance. It was found to be a combined effect of a decrease in current density.

【0017】Al−Ti合金めっき層が耐孔食性に優れ
るという点では孔食によるめっき層の厚さ方向の腐食の
進行が抑制され、結果として鋼板の腐食による赤錆発生
時期が大幅に延長されることにつながるが、犠牲防食電
流密度が小さいという点では、加工部や端面での犠牲防
食能が不十分になる恐れがある。
In view of the excellent pitting corrosion resistance of the Al-Ti alloy plated layer, the progress of corrosion in the thickness direction of the plated layer due to pitting corrosion is suppressed, and as a result, the time of occurrence of red rust due to corrosion of the steel sheet is significantly extended. However, since the sacrificial anticorrosion current density is small, the sacrificial anticorrosion ability of the processed portion or the end face may be insufficient.

【0018】そこで本発明者等は、上記腐食機構に対す
る知見に基づいて、上層に純Alめっき層を有し、下層
にAl−Ti合金めっき層を有する蒸着Al/Al−T
i2層めっき鋼板を開発し、本発明に至ったものであ
る。
Therefore, the inventors of the present invention, on the basis of the knowledge on the above corrosion mechanism, vapor-deposited Al / Al-T having a pure Al plating layer as an upper layer and an Al-Ti alloy plating layer as a lower layer.
The present invention has been achieved by developing an i2-layer plated steel sheet.

【0019】まず下層のAl−Ti合金の役割は、前述
の如く塩化物イオンの存在する腐食環境下で優れた孔耐
食性を担うものである。下層めっき層中のTi含有量は
1〜30%である必要がある。Ti含有量が1%未満で
はめっき層中へのTi添加効果が充分に現れず、耐孔食
性が発揮されない。また1%未満では後述する様に上層
の純Alめっき層との間に電気化学的電位差が殆ど生じ
ないために、上層の純Alめっき層の有する犠牲防食能
が充分に発揮されず、めっき深さ方向の孔食の進行を抑
制することが困難となる。一方Ti含有量が30%を超
えると耐孔食性が飽和するばかりでなくめっき製造時の
コストアップにもつながるので好ましくない。以上の理
由から下層Al−Tiめっき層中のTi含有量を1〜3
0%に規程した。次に、上層を純Alめっき層、下層を
Al−Ti合金めっき層とした理由を、本発明のめっき
層の腐食過程の観点から述べる。
First, the role of the Al-Ti alloy of the lower layer plays a role of excellent pore corrosion resistance in a corrosive environment in which chloride ions are present as described above. The Ti content in the lower plating layer needs to be 1 to 30%. If the Ti content is less than 1%, the effect of adding Ti to the plating layer will not be sufficiently exhibited, and pitting corrosion resistance will not be exhibited. If it is less than 1%, as described below, there is almost no electrochemical potential difference between the upper pure Al plating layer and the upper pure Al plating layer. It becomes difficult to suppress the progress of pitting corrosion in the depth direction. On the other hand, when the Ti content exceeds 30%, not only the pitting corrosion resistance is saturated, but also the cost at the time of plating production is increased, which is not preferable. For the above reasons, the Ti content in the lower Al-Ti plated layer is set to 1 to 3
The limit is set to 0%. Next, the reason why the upper layer is a pure Al plating layer and the lower layer is an Al-Ti alloy plating layer will be described from the viewpoint of the corrosion process of the plating layer of the present invention.

【0020】まず、本発明のAl/Al−Ti合金2層
めっき層を基板表面に施すと、孔食は初期に上層の純A
lめっき層の表面から始まる(初期孔食発生過程)。そ
して、孔食は上層の純Alめっき層のめっき厚み方向に
沿って進行し、いずれは下層のAl/Al−Ti合金め
っき層との界面まで到達することになる(上層めっきの
孔食進行過程)。
First, when the Al / Al-Ti alloy two-layer plating layer of the present invention is applied to the surface of the substrate, pitting corrosion is initially caused by pure A of the upper layer.
1. Starting from the surface of the plated layer (initial pitting corrosion process). Then, the pitting corrosion progresses along the plating thickness direction of the upper pure Al plating layer, and eventually reaches the interface with the lower Al / Al-Ti alloy plating layer (the pitting corrosion progress process of the upper layer plating. ).

【0021】ところで、上層の純Alめっき層と下層の
Al−Ti合金めっき層との間には、わずかな電気化学
的電位差があり、純Alめっき層に比べてAl−Ti合
金のめっき層は、やや貴な電位を有している。そのため
に、孔食が上層純Alめっきと下層Al−Tiめっきの
界面まで到達した際に、両者の電位差によってめっき層
間でのガルバニック腐食現象が生じる。即ち、ガルバニ
ック現象によって上層の純Alめっき層が選択的に腐食
され、このことは上層純Alめっき層が下層Al−Ti
めっき層に対して、一種の犠牲防食能を有することを意
味している。上層純Alめっき層は、初期孔食発生時期
および孔食進行時期においては、めっき厚み方向に腐食
されるが、孔食が上層めっき/下層めっきの界面に達し
た後は、孔食が下層Al−Tiめっき層の厚み方向に進
展せずに、代わりに上層Alめっき層の全面腐食が始ま
る(上層めっきの全面腐食進行過程)。全面腐食は、め
っき層の表面から順次めっき肉厚が減少していく様な腐
食形態を示すものであるために、本全面腐食は上層の純
Alめっき層のめっき肉厚が非常に薄くなって、ほぼ皆
無になるまで継続される(上層めっきの全面腐食進行過
程)。つまり、この上層めっきが残存している期間は、
下層Al−Tiめっき層が上層めっきによって効果的に
保護されていることを意味し、下層の腐食開始時期が、
上層めっき層の存在によって大幅に遅らされることにな
る。
By the way, there is a slight electrochemical potential difference between the upper pure Al plating layer and the lower Al-Ti alloy plating layer, and the Al-Ti alloy plating layer is smaller than the pure Al plating layer. , Has a slightly noble potential. Therefore, when the pitting corrosion reaches the interface between the upper pure Al plating and the lower Al-Ti plating, a galvanic corrosion phenomenon occurs between the plated layers due to the potential difference between the two. That is, the upper pure Al plating layer is selectively corroded by the galvanic phenomenon, which means that the upper pure Al plating layer is lower Al-Ti.
It means that the plating layer has a kind of sacrificial anticorrosion ability. The upper pure Al plating layer is corroded in the plating thickness direction at the initial pitting corrosion generation time and the pitting corrosion progressing time, but after the pitting corrosion reaches the interface of the upper layer plating / lower layer plating, the pitting corrosion is lower layer Al. -Instead of proceeding in the thickness direction of the Ti plating layer, the general corrosion of the upper Al plating layer starts instead (the general corrosion progress process of the upper plating). Since the general corrosion indicates a corrosion mode in which the plating thickness gradually decreases from the surface of the plating layer, this general corrosion causes the plating thickness of the upper pure Al plating layer to be extremely thin. , It continues until there is almost nothing (overall corrosion progress process of upper layer plating). In other words, the period during which this upper layer plating remains
It means that the lower layer Al-Ti plating layer is effectively protected by the upper layer plating, and the corrosion start time of the lower layer is
The presence of the upper plating layer will be significantly delayed.

【0022】その後、上層めっき層が全面腐食によって
ほぼ完全に溶出されてしまうと、次には下層Al−Ti
めっき層の塩化物イオンによる腐食(孔食)が開始され
るが(下層めっきの孔食開始過程)、前述の如くAl−
Ti合金めっき層自身は、基本的に耐孔食性に優れため
っき層であるため、めっき深さ(厚み)方向への孔食の
進行が非常に遅く(下層めっき孔食進行過程)、被めっ
き材である鋼板表面との界面まで孔食が到達して赤錆が
発生するに至るまでの時間が長くなる。
After that, when the upper plating layer is almost completely eluted due to the general corrosion, the lower Al--Ti layer is then removed.
Corrosion (pitting corrosion) of the plating layer due to chloride ions is started (pitting corrosion starting process of the lower layer plating).
Since the Ti alloy plating layer itself is basically a plating layer having excellent pitting corrosion resistance, the pitting corrosion progresses very slowly in the plating depth (thickness) direction (lower layer plating pitting corrosion progressing process) The time required for pitting to reach the interface with the steel plate surface, which is the material, until red rust occurs becomes longer.

【0023】この様に上層純Alめっき層と下層Al−
Tiめっき層は、各々が意味を持った役割を有し、即ち
上層純Alめっき層は、それ自身耐孔食性に優れるもの
ではないが、下層Al−Tiめっき層を保護する犠牲防
食能を有するめっき層として重要な役割を担い、下層A
l−Tiめっき層は、上層めっきの消失後、被めっき材
の腐食時期を遅らせる耐孔食性に優れためっき層として
の役割を担っている。よって、上層、下層の両めっき層
の各々の担う役割の相乗効果により、結果として被めっ
き材である鋼板の腐食時期が大幅に延長されるものであ
る。
In this way, the upper pure Al plating layer and the lower Al-
Each of the Ti plating layers has a meaningful role, that is, the upper pure Al plating layer itself does not have excellent pitting corrosion resistance, but has a sacrificial anticorrosive ability of protecting the lower Al-Ti plating layer. Plays an important role as a plating layer, lower layer A
The 1-Ti plating layer plays a role as a plating layer having excellent pitting corrosion resistance that delays the corrosion period of the material to be plated after the upper layer plating disappears. Therefore, as a result of the synergistic effect of the roles of the upper and lower plating layers, the corrosion time of the steel sheet to be plated is significantly extended.

【0024】なお、本発明は必ず上層が純Alめっき層
で、下層がAl−Tiめっき層である必要がある。なぜ
なら、上層がAl−Tiめっき層で、下層が純Alめっ
き層である構造を有する場合(本発明のめっき層構造と
逆の構造)には、特に端面、加工部、あるいは鋼板表面
にまで達する様なめっき層の傷発生部等の箇所において
は、上層のAl−Tiめっき層よりも先に下層の純Al
めっき層が優先的に腐食が進行してしまい、結果として
上層めっき層の膨れ現象や剥離現象が生じて、高耐食性
を有しなくなるからである。
In the present invention, the upper layer must be a pure Al plating layer and the lower layer must be an Al-Ti plating layer. This is because when the upper layer is an Al-Ti plated layer and the lower layer is a pure Al plated layer (a structure opposite to the plated layer structure of the present invention), it particularly reaches the end face, the processed portion, or the steel plate surface. In places such as scratches in the plating layer, the pure Al of the lower layer is formed before the Al-Ti plating layer of the upper layer.
This is because the plating layer is preferentially corroded, and as a result, the blistering phenomenon and the peeling phenomenon of the upper plating layer occur and the high corrosion resistance is lost.

【0025】次に、下層Al−Ti合金めっき層の相構
造について述べる。下層Al−Ti合金めっき層は、必
須成分としてAl−Ti金属間化合物相を含有している
ことは言うまでもない。Al−Ti金属間化合物相は、
塩化物イオンに対して優れた耐孔食性を有するものであ
り、上述の如く下層としての役割を果すためには該金属
間化合物相がAl−Tiめっき層中に必ず存在しなけれ
ばならない。なお、Al−Tiめっき層中に形成される
該金属間化合物は1種類に限定されるわけではなく、製
造条件やめっき層中のTi含有量によって、例えばAl
3 Ti、AlTi、Al3 Ti等のAl−Ti金属間化
合物が1種または2種以上存在する。これらのAl−T
i金属間化合物相は、全て耐孔食性に優れるものであ
り、本発明では、該金属間化合物相が必ず下層めっき層
中に含有されることが規定されるが、該金属間化合物の
中でも特にAl3 Ti相は、他の金属間化合物相と比べ
て、耐孔食性が良好であると共に、電気化学的電位が鋼
板の電位に対してより卑な電位を示す(但し、上層純A
lめっきの電位よりは必ず貴である)ために、鋼板に対
する犠牲防食効果が優れる。よって、下層Al−Tiめ
っき層中に存在するAl−Ti金属間化合物相として
は、Al3 Ti相であることがより好ましい。
Next, the phase structure of the lower Al-Ti alloy plating layer will be described. It goes without saying that the lower Al-Ti alloy plating layer contains an Al-Ti intermetallic compound phase as an essential component. The Al-Ti intermetallic compound phase is
It has excellent pitting corrosion resistance to chloride ions, and the intermetallic compound phase must exist in the Al-Ti plating layer in order to serve as the lower layer as described above. The intermetallic compound formed in the Al-Ti plating layer is not limited to one kind, and may be, for example, Al depending on the manufacturing conditions and the Ti content in the plating layer.
One or more Al-Ti intermetallic compounds such as 3 Ti, AlTi, and Al 3 Ti are present. These Al-T
The i intermetallic compound phases are all excellent in pitting corrosion resistance, and in the present invention, it is specified that the intermetallic compound phase is necessarily contained in the lower plating layer. The Al 3 Ti phase has better pitting corrosion resistance than other intermetallic compound phases, and at the same time, the electrochemical potential shows a more base potential than the potential of the steel sheet (however, the upper layer pure A
Since it is always nobler than the potential of 1-plating), the sacrificial anticorrosion effect on the steel sheet is excellent. Thus, as the Al-Ti intermetallic phase present in the lower Al-Ti-plated layer, and more preferably Al 3 Ti phase.

【0026】また、下層Al−Tiめっき層中には上述
の各種Al−Ti金属間化合物相が存在する以外に、他
の成分としてAl相または/およびTi相を含有する構
造であることが望ましい。下層Al−Tiめっき層中に
含有されるAlは、下層めっき層の塑性変形能の向上効
果と上層の純Alめっき層とのめっき密着性を確保する
効果の2つの働きを有しており、加工時に被めっき材表
面からあるいは上層/下層めっき層の界面からめっき層
の剥離が生じることを効果的に抑制することができる。
Further, in addition to the above-mentioned various Al-Ti intermetallic compound phases being present in the lower Al-Ti plating layer, it is desirable that the lower Al-Ti plating layer contains an Al phase and / or a Ti phase as another component. . Al contained in the lower Al-Ti plating layer has two functions of an effect of improving plastic deformability of the lower plating layer and an effect of ensuring plating adhesion with the upper pure Al plating layer, It is possible to effectively suppress the peeling of the plating layer from the surface of the material to be plated or the interface between the upper / lower plating layers during processing.

【0027】下層Al−Tiめっき層中に含有されるT
iは、それらの全てがAlと反応してAl−Ti金属間
化合物相を形成する訳ではなく、特に本発明で規定した
Ti含有量の範囲の中でTi含有量が高い領域において
は、下層めっき層中にTiが存在する可能性が高くな
る。下層めっき層中のTiは、基本的に塩化物イオンに
対して腐食を受けない金属であり、下層めっき層中に微
量に存在することによって、めっき層に耐孔食性の向上
に寄与するものである。また、蒸着Al/Al−Ti合
金2層めっき鋼板を高温環境下(一般には500℃以
上)で使用した場合、下層めっき中の微量Tiは、下層
Al−Ti合金めっき層と鋼板との界面でAl−Fe系
金属間化合物層が形成されることを効果的に抑制する働
きを有しており、めっき層の耐熱性の向上に寄与するも
のである。
T contained in the lower Al-Ti plating layer
i does not mean that all of them react with Al to form an Al-Ti intermetallic compound phase, and especially in the region where the Ti content is high within the range of the Ti content specified in the present invention, the lower layer It is highly possible that Ti is present in the plating layer. Ti in the lower plating layer is basically a metal that is not corroded by chloride ions, and when present in a trace amount in the lower plating layer, it contributes to improving the pitting corrosion resistance of the plating layer. is there. When the vapor-deposited Al / Al-Ti alloy double-layer plated steel sheet is used in a high-temperature environment (generally 500 ° C or higher), a small amount of Ti in the lower-layer plating is present at the interface between the lower-layer Al-Ti alloy plated layer and the steel sheet. It has a function of effectively suppressing the formation of the Al-Fe based intermetallic compound layer, and contributes to the improvement of the heat resistance of the plating layer.

【0028】次に上層めっき膜厚と下層めっき膜厚の比
率を規定した理由について述べる。上層の純Alめっき
層付着量(g/m2 )を下層のAl−Ti合金めっき付
着量(g/m2 )で除した値、即ちめっき付着量比率を
Rとするとき、1/5≦R≦1を満足することが望まし
い。該比率の下限を1/5と規定したのは、以下の2つ
の理由による。
Next, the reason for defining the ratio of the upper layer plating film thickness and the lower layer plating film thickness will be described. Pure Al coating layer coating weight of the upper layer (g / m 2) the underlying Al-Ti alloy coating weight (g / m 2) divided by the, i.e. a coating weight ratio when the R, 1/5 ≦ It is desirable to satisfy R ≦ 1. The lower limit of the ratio is defined as 1/5 for the following two reasons.

【0029】(1)まずRが1/5未満ということは、
めっき層全体で考えた場合に、上層純Alめっき付着量
が下層Al−Tiめっき付着量よりも大幅に小さくなる
場合を意味する。上層の純Alめっき層の主な役割は上
述した如く、下層Al−Ti合金めっき層に対する犠牲
防食能である。純Alめっき層自身は、下層Al−Ti
合金めっき層に比べて耐孔食性に劣るものであるため、
めっき厚み方向への孔食進展を抑制する能力はないが、
全面腐食による犠牲防食作用で、下層Al−Ti合金め
っき層の腐食を効果的に防止することが出来る。この様
な上層めっきとしての効果を発揮させるためには、下層
のめっき付着量に対して1/5未満では、犠牲防食作用
を発揮する期間が短くなり、少なくとも1/5以上の付
着量を有することが望ましい。
(1) First, the fact that R is less than 1/5 means that
This means a case in which the amount of pure Al plating deposited on the upper layer is significantly smaller than the amount of Al-Ti plating deposited on the lower layer when considering the entire plated layer. The main role of the upper pure Al plating layer is the sacrificial anticorrosion ability for the lower Al-Ti alloy plating layer, as described above. The pure Al plating layer itself is the lower Al-Ti layer.
Since it is inferior in pitting corrosion resistance to the alloy plating layer,
Although it has no ability to suppress pitting corrosion in the plating thickness direction,
The sacrificial anticorrosive action due to the general corrosion can effectively prevent the corrosion of the lower Al-Ti alloy plating layer. In order to exert such an effect as the upper layer plating, if the amount of the lower layer plated is less than 1/5, the period for exhibiting the sacrificial anticorrosion action is shortened, and the amount of the deposited layer is at least 1/5. Is desirable.

【0030】(2)更に、上層の純Alめっき層の重要
な役割として、めっき層全体としての被めっき材に対す
る犠牲防食能がある。前述した様に、めっき層の被めっ
き材に対する犠牲防食能は、一般的には被めっき材の電
気化学的電位に対してより大きな卑な電位を有するめっ
き層である程優れている。ところで、下層Al−Ti合
金めっき層は、上層純Alめっき層に比べて、電気化学
的電位がやや貴であることは既に述べたが、そのために
鋼板との電位差が上層の純Alめっきと鋼板間の電位差
に比べてやや小さくなってしまう。よって、電位差が小
さくなれば、その分だけ犠牲防食電流は低下するために
めっき層自身の腐食速度(溶出速度)が小さくなってめ
っき層の寿命が長くなるが、一方で端面(切断面)、加
工部、あるいは鋼板表面まで達するようなめっき層表面
からの傷発生部においては、鋼板に対する犠牲防食能は
純Alめっき層の方が優れていることになる。よって、
上層の純Alめっき層は、被めっき材である鋼板に対し
て端面等の露出する環境下で犠牲防食作用を発揮させる
必要があり、そのためには、上述で規定しためっき付着
量比率Rが1/5以上となるような上層純Alめっき付
着量を有することが望ましい。
(2) Further, as an important role of the upper pure Al plating layer, there is a sacrificial anticorrosion ability for the plated material as a whole of the plating layer. As described above, the sacrificial anticorrosive ability of the plated layer with respect to the material to be plated is generally superior as the plated layer has a larger base potential with respect to the electrochemical potential of the material to be plated. By the way, it has already been described that the lower Al-Ti alloy plating layer has a slightly noble electrochemical potential as compared with the upper pure Al plating layer. Therefore, the potential difference between the lower Al-Ti alloy plating layer and the steel sheet is higher than that of the pure Al plating and the steel sheet. It becomes a little smaller than the potential difference between them. Therefore, if the potential difference becomes smaller, the sacrificial anticorrosion current decreases accordingly, and the corrosion rate (elution rate) of the plating layer itself becomes smaller and the life of the plating layer becomes longer, while the end surface (cut surface), The pure Al plating layer is superior in the sacrificial anticorrosive ability to the steel sheet at the processed portion or the scratched portion from the surface of the plating layer that reaches the surface of the steel sheet. Therefore,
The upper pure Al plating layer is required to exert a sacrificial anticorrosion effect on the steel plate as the material to be plated under an exposed environment such as an end surface. For that purpose, the plating adhesion ratio R defined above is 1 It is desirable to have an upper layer pure Al plating adhesion amount of / 5 or more.

【0031】また、めっき付着量比率Rを1以下に規定
したのは、以下の理由による。Rが1を超えるというこ
とは、めっき層全体で考えた場合に、上層純Alめっき
付着量が下層Al−Tiめっき付着量よりも大きくなる
場合を意味する。この様な比率を有する2層めっきは、
下層の耐孔食性に優れるAl−Ti合金めっき層の付着
量比率が小さくなるために、本来の目的である高耐食性
めっき材としての性能が劣化する。従って 、下層Al
−Ti合金めっき付着量の割合を低下させない様に、め
っき付着量比率Rの上限を1と規定した。
The reason why the plating adhesion amount ratio R is specified to be 1 or less is as follows. When R exceeds 1, it means that the amount of deposited pure Al plating on the upper layer is larger than the amount of deposited Al-Ti plating on the lower layer when considering the entire plated layer. Two-layer plating with such a ratio is
Since the deposition amount ratio of the Al-Ti alloy plating layer having excellent pitting corrosion resistance of the lower layer is small, the performance as the original purpose of the high corrosion resistance plated material is deteriorated. Therefore, the lower layer Al
The upper limit of the coating weight ratio R was defined as 1 so as not to reduce the ratio of the Ti alloy coating weight.

【0032】なお、本発明で得られる蒸着Al/Al−
Ti合金2層めっきの全めっき付着量については、本発
明で何等制限されるものではなく、本発明の表面処理材
を適用する部材、使用する環境条件、要求される耐用年
数等によって適宜定めることが望ましい。一般的には耐
食性および経済性の両面を考慮して、10〜100g/
2 、好ましくは20〜60g/m2 の範囲のめっき付
着量が推奨される。
The vapor-deposited Al / Al- obtained by the present invention.
The total coating amount of the Ti alloy two-layer plating is not limited in any way in the present invention, and should be appropriately determined depending on the member to which the surface treatment material of the present invention is applied, the environmental conditions to be used, the required service life, etc. Is desirable. Generally, considering both corrosion resistance and economy, 10-100 g /
A coating weight of m 2 , preferably in the range of 20-60 g / m 2 is recommended.

【0033】次に本発明の高耐食性の製造方法につい
て、図1を例にとって述べる。予め種々の方法により表
面を清浄化された被めっき金属材1は、入側真空シール
装置2aを経由してNo.1蒸着室4aに導入される。蒸
着室4aおよび4bは、所望の真空または希薄ガス雰囲
気中に保持されている。蒸着室4aおよび4bには、被
めっき金属材の下方に2つの蒸発槽5a、5bを並行に
配置し、金属材の走行する方向に対して上流側の蒸発槽
5aにAl−Ti合金浴6aを用意し、下流側の蒸発槽
5bにはAl浴6bを用意する。2つの溶融浴6a、6
bは、電子銃(図示されていない)から発生せしめた電
子ビーム(図示されていない)の照射によって加熱さ
れ、両蒸発槽からAl−Ti混合蒸気とAl蒸気を発生
せしめ、走行する被めっき金属材1の表面に、蒸着Al
/Al−Ti合金系2層めっきを施す。No.1蒸着室で
片面のみを蒸着めっきされた被めっき金属材1は、デフ
レクターロール3を経由して、No.2蒸着室に導入さ
れ、No.1蒸着室と同様の処理によって、もう一方の片
面に蒸着めっき処理が行われる。この様にして両面めっ
きされた被めっき金属材1は、出側真空シール装置2b
を経由して、その後所定の後処理が行われる。
Next, the method for producing high corrosion resistance according to the present invention will be described with reference to FIG. The to-be-plated metal material 1 whose surface has been cleaned in advance by various methods is introduced into the No. 1 vapor deposition chamber 4a via the inlet vacuum seal device 2a. The vapor deposition chambers 4a and 4b are maintained in a desired vacuum or a dilute gas atmosphere. In the vapor deposition chambers 4a and 4b, two evaporation tanks 5a and 5b are arranged in parallel below the metal material to be plated, and the Al-Ti alloy bath 6a is provided in the evaporation tank 5a on the upstream side with respect to the traveling direction of the metal material. And an Al bath 6b is prepared in the evaporation tank 5b on the downstream side. Two melting baths 6a, 6
b is a metal to be plated which is heated by irradiation of an electron beam (not shown) generated from an electron gun (not shown) to generate Al-Ti mixed vapor and Al vapor from both evaporation tanks and which runs. Evaporated Al on the surface of material 1
/ Al-Ti alloy-based two-layer plating is applied. The metal material 1 to be plated, which has been vapor-deposited on only one surface in the No. 1 vapor deposition chamber, is introduced into the No. 2 vapor deposition chamber via the deflector roll 3, and the other process is performed in the same manner as the No. 1 vapor deposition chamber. The vapor deposition plating process is performed on one surface of the. The metal material 1 to be plated, which has been plated on both sides in this manner, is used as the output side vacuum seal device 2b.
After that, predetermined post-processing is performed.

【0034】本発明の製造方法を、更に蒸着室のみを記
した図2を用いて補足説明を行う。蒸着室4内に2つの
蒸発槽5a、5bを配し、被めっき金属材1の走行方向
に対して、上流側の蒸発槽5aにはAl−Ti合金浴6
aを、下流側の蒸発槽5bには純Al浴6bが用意され
ている。蒸着室4の側壁に設けられた電子銃10から発
生した電子ビーム11は、偏向コイル(図示されていな
い)によって蒸発槽近傍の空間に形成された磁場によっ
て下方側に偏向されて、蒸発槽5a、5bに用意された
蒸発浴6a、6bの表面を被めっき金属材1の板幅方向
に操作されながら照射する。
The manufacturing method of the present invention will be additionally described with reference to FIG. 2 in which only the vapor deposition chamber is shown. Two evaporation tanks 5a and 5b are arranged in the vapor deposition chamber 4, and the Al-Ti alloy bath 6 is provided in the evaporation tank 5a on the upstream side with respect to the traveling direction of the metal material 1 to be plated.
a, and a pure Al bath 6b is prepared in the evaporation tank 5b on the downstream side. An electron beam 11 generated from an electron gun 10 provided on the side wall of the vapor deposition chamber 4 is deflected downward by a magnetic field formed in a space near the evaporation tank by a deflection coil (not shown), and the evaporation tank 5a The surfaces of the evaporation baths 6a and 6b prepared in 5b are irradiated while being operated in the plate width direction of the metal material 1 to be plated.

【0035】電子ビーム11によって加熱された蒸発浴
6a、6bの浴表面からは、各々Al−Ti混合蒸気と
純Al蒸気が発生し、走行する被めっき金属材1の下面
に蒸着される。この時に、Al−Ti混合蒸気の方が先
に被めっき金属材表面に蒸着されて、Al−Ti合金め
っき層を形成する。引き続き、純Al蒸気がその上に蒸
着されて、純Alめっき層を形成する。この様な製造方
法によって、本発明の蒸着Al/Al−Ti合金2層め
っき層を、所望の金属基板上に施すことが可能となる。
Al-Ti mixed vapor and pure Al vapor are generated from the bath surfaces of the evaporation baths 6a and 6b heated by the electron beam 11, respectively, and are vapor-deposited on the lower surface of the running metal material 1 to be plated. At this time, the Al-Ti mixed vapor is vapor-deposited first on the surface of the metal material to be plated to form an Al-Ti alloy plating layer. Subsequently, pure Al vapor is vapor-deposited thereon to form a pure Al plating layer. By such a manufacturing method, the vapor-deposited Al / Al-Ti alloy two-layer plating layer of the present invention can be applied on a desired metal substrate.

【0036】Alは、蒸気圧が高い金属であり、電子ビ
ーム加熱方式によって容易にAl蒸気を発生せしめるこ
とが可能である。Tiは、Alと比べて蒸気圧が低い金
属であるが、高エネルギー密度を有する電子ビーム加熱
方式によって、十分な蒸気量(蒸発速度)を得ることが
可能である。本発明の製造方法では、下層のAl−Ti
めっき層を形成させるための蒸発原料として、AlとT
iの合金浴を形成せしめることに着目し、該溶融浴から
AlとTiを同時蒸発させることを特徴としている。
Al is a metal having a high vapor pressure, and it is possible to easily generate Al vapor by an electron beam heating method. Ti is a metal whose vapor pressure is lower than that of Al, but it is possible to obtain a sufficient vapor amount (vaporization rate) by an electron beam heating method having a high energy density. In the manufacturing method of the present invention, the lower layer Al-Ti
Al and T are used as evaporation raw materials for forming the plating layer.
Focusing on the formation of the alloy bath of i, the feature is that Al and Ti are simultaneously evaporated from the molten bath.

【0037】AlおよびTiは、各々単独で上述の如く
真空中で加熱すると蒸発槽内で溶融浴を形成し、該溶融
浴表面から安定した蒸発速度を得ることが可能である
が、更にAlとTiとを合金化させることによっても、
Al−Ti合金溶融浴を形成することを確認し、該合金
浴表面から、AlとTiの混合蒸気を安定して蒸発せし
めることを見出した。
Al and Ti each independently form a molten bath in the evaporation tank when heated in a vacuum as described above, and a stable evaporation rate can be obtained from the surface of the molten bath. By alloying with Ti,
It was confirmed that an Al-Ti alloy molten bath was formed, and it was found that the mixed vapor of Al and Ti can be stably evaporated from the surface of the alloy bath.

【0038】よって、本発明のAl/Al−Ti合金蒸
着2層めっきを得るためには、蒸気Al浴蒸発槽5bと
Al−Ti合金浴蒸発槽5aを、被めっき金属材1の走
行方向に対して並行に配置し、該両蒸発槽から各々Al
蒸気とAl−Ti混合蒸気を発生せしめることによっ
て、走行する金属基板の表面に蒸着させ、所望の2層め
っき膜を付与することが出来る。
Therefore, in order to obtain the Al / Al-Ti alloy vapor deposition two-layer plating of the present invention, the vapor Al bath evaporation tank 5b and the Al-Ti alloy bath evaporation tank 5a are placed in the running direction of the metal material 1 to be plated. Are placed in parallel with each other, and the Al
By generating the vapor and the Al-Ti mixed vapor, the vapor can be vapor-deposited on the surface of the traveling metal substrate to provide a desired two-layer plating film.

【0039】なお、本発明で規定した下層めっき層を得
るためには、Al−Ti混合蒸気の組成とその蒸発量
(蒸発速度)をコントロールする必要がある。特に本発
明の製造方法の特徴の1つであるAl−Ti合金浴から
の蒸発方法においては、該合金浴中のAlおよびTi比
率、即ち合金浴組成を適宜調整することによって達成す
ることが可能である。該合金浴組成と該合金浴表面から
蒸発するAlとTiの混合蒸気の組成は、両者の蒸気圧
の差から決して一致するわけではなく、浴中のTi含有
量に比べて、混合蒸気中のTi含有量は必ず小さくな
る。しかし、ある任意の合金浴組成に対して、得られる
混合蒸気組成は浴表面温度が一定であれば、一義的に決
まるものであるため、本発明で規定した下層めっき層中
のTi含有量を得るための該合金浴の浴組成範囲は一義
的に決めることが出来る。また、混合蒸気組成、蒸発量
に相当するAlおよびTiを同時に該合金溶融浴へ連続
供給してやれば、合金浴組成を常に一定に保持すること
が可能となるため、結果として蒸発する混合蒸気組成、
蒸発量も安定して維持することが出来る。
In order to obtain the lower plating layer defined in the present invention, it is necessary to control the composition of the Al-Ti mixed vapor and its evaporation amount (evaporation rate). In particular, the evaporation method from an Al-Ti alloy bath, which is one of the features of the production method of the present invention, can be achieved by appropriately adjusting the Al and Ti ratios in the alloy bath, that is, the composition of the alloy bath. Is. The composition of the alloy bath and the composition of the vapor mixture of Al and Ti vaporized from the surface of the alloy bath do not coincide with each other due to the difference in vapor pressure between the two, and compared with the Ti content in the bath, The Ti content is always small. However, for a given arbitrary alloy bath composition, the obtained mixed vapor composition is uniquely determined if the bath surface temperature is constant. Therefore, the Ti content in the lower plating layer specified in the present invention is The bath composition range of the alloy bath for obtaining can be uniquely determined. Further, if the mixed vapor composition and Al and Ti corresponding to the evaporation amount are continuously supplied to the alloy melting bath at the same time, the alloy bath composition can always be kept constant, and as a result, the evaporated vapor composition,
The amount of evaporation can also be maintained stably.

【0040】本発明の製造方法の骨子は以上の通りであ
るが、蒸着Al/Al−Ti合金2層めっきを得るため
には、図2中に示した蒸発浴表面−被めっき金属材垂直
間距離Hvと両蒸発浴間距離Dを適宜調整することが必
要である。Dの長さに対してHvが十分大きい場合に
は、蒸発槽5aから発生したAl−Ti混合蒸気と蒸発
槽5bから発生した純Al蒸気が、被めっき帯表面に到
達するまでの間に、両層の拡散反応層である中間層が形
成される。該中間層は、下層Al−Ti合金めっき層よ
りもTi含有量の小さいAl−Ti合金めっき層とな
り、この様な中間層が形成されたとしても基本的には得
られた表面処理材の性能面、特に耐食性を何等損なうこ
とにはならず、基本的にはAl−Ti合金めっき層とし
て下層めっき層と同等の役割を担うものとなり得る。従
って該中間層が存在する様なめっき層構造を有する場合
も、本発明の範疇を逸脱するものではなく、高耐食性表
面処理金属材として本発明に規定されるものである。
The essence of the manufacturing method of the present invention is as described above. In order to obtain the vapor-deposited Al / Al-Ti alloy two-layer plating, the evaporation bath surface shown in FIG. It is necessary to appropriately adjust the distance Hv and the distance D between both evaporation baths. When Hv is sufficiently large with respect to the length of D, the Al-Ti mixed vapor generated from the evaporation tank 5a and the pure Al vapor generated from the evaporation tank 5b reach the surface of the plated zone. An intermediate layer, which is a diffusion reaction layer of both layers, is formed. The intermediate layer is an Al-Ti alloy plating layer having a Ti content smaller than that of the lower Al-Ti alloy plating layer, and basically even if such an intermediate layer is formed, the performance of the obtained surface treatment material is improved. The surface, in particular, the corrosion resistance is not impaired at all, and basically the Al-Ti alloy plating layer can play the same role as the lower plating layer. Therefore, even when it has a plated layer structure in which the intermediate layer is present, it does not depart from the scope of the present invention, and is defined in the present invention as a highly corrosion-resistant surface-treated metal material.

【0041】しかしながら、製品仕様として上層の純め
っき付着量を少なく、下層のAl−Ti合金めっき付着
量を多くなる様な目標値で製造した場合には、該中間層
の生成によって上層純Alめっき層の付着量が目標値よ
り減少し、一方該中間層をAl−Ti合金めっき層の範
疇として下層めっき層に合わせて含めると、結果として
下層めっき付着量が増大することになり、前述で定義さ
れためっき付着量比率Rの下限値である1/5の比率よ
り上層純Alめっきの付着量が下回ってしまう可能性も
ある。従って本発明では蒸着室内の構造まで規定される
ものではないため、HvおよびDの値については特に限
定されるものではないが、本発明の蒸着めっき表面処理
材を製造するために用いる蒸着室の構造、蒸発層配置方
法に応じて、所望のめっき付着量比率Rを得るための製
造条件を適宜選定することが好ましい。
However, when the product specifications are such that the amount of pure plating on the upper layer is small and the amount of Al-Ti alloy plating on the lower layer is large, the intermediate layer is generated to produce pure Al plating on the upper layer. The deposition amount of the layer decreases from the target value, and when the intermediate layer is included in the category of the Al-Ti alloy plating layer in combination with the lower plating layer, the deposition amount of the lower layer increases as a result. There is a possibility that the upper pure aluminum plating amount will fall below the lower limit of 1/5, which is the lower limit of the applied plating amount ratio R. Therefore, in the present invention, since the structure of the vapor deposition chamber is not specified, the values of Hv and D are not particularly limited, but of the vapor deposition chamber used for producing the vapor deposition plated surface-treated material of the present invention. It is preferable to appropriately select the manufacturing conditions for obtaining the desired plating adhesion amount ratio R depending on the structure and the evaporation layer arrangement method.

【0042】尚、本発明における蒸発原料の加熱蒸発源
としては、純AlおよびAl−Ti合金を蒸発せしめる
高エネルギービームであれば特に限定されず、電子ビー
ムやレーザービームが例示されるが中でも特に電子ビー
ムが好ましい例として挙げられる。即ち、電子ビームは
高エネルギーおよび高エネルギー密度の加熱源であり、
電子ビームを発生させるための電子銃は高価ではあるが
メンテナンス性に優れ、電子ビームの発生・停止を容易
に行うことが出来る点で有利である。更に電子ビーム
は、蒸発させたい金属原料の表面に直接照射することが
出来るため加熱・蒸発効率が高く、蒸発原料の蒸発速度
を大きくすることが可能である。特に本発明の蒸着めっ
き層中の必須成分であるTiは、Alに比べて蒸気圧が
小さいものであるため、工業的見地から充分なTiの蒸
発速度を得るためには電子ビーム加熱方式が適してい
る。また、電子ビーム加熱方式では、複数個の蒸発槽内
に各々分けて装入された各蒸発原料に対して、1台の電
子銃から発生される電子ビームを極めて短いサイクル時
間毎に各蒸発槽間にジャンピングさせつつ各蒸発浴表面
を走査させることによって各々の蒸発原料を一斉に加熱
蒸発させることが出来る。こうした特徴によって、複数
元素からなる各種合金めっきや多層めっきが容易に製造
できるという利点を有する。
The heating evaporation source of the evaporation raw material in the present invention is not particularly limited as long as it is a high energy beam capable of evaporating pure Al and an Al-Ti alloy, and an electron beam or a laser beam is exemplified, among others. An electron beam is mentioned as a preferable example. That is, the electron beam is a high energy and high energy density heating source,
Although an electron gun for generating an electron beam is expensive, it has excellent maintainability and is advantageous in that the electron beam can be easily generated and stopped. Further, since the electron beam can directly irradiate the surface of the metal raw material to be vaporized, the heating / evaporating efficiency is high and the vaporization rate of the vaporizing raw material can be increased. In particular, since Ti, which is an essential component in the vapor-deposited plating layer of the present invention, has a vapor pressure smaller than that of Al, the electron beam heating method is suitable for obtaining a sufficient Ti evaporation rate from an industrial viewpoint. ing. Further, in the electron beam heating method, an electron beam generated from one electron gun is supplied to each evaporation raw material separately charged in a plurality of evaporation tanks at each evaporation tank at an extremely short cycle time. By scanning the surface of each evaporation bath while jumping in between, each evaporation source can be heated and evaporated all at once. Due to such characteristics, there is an advantage that various alloy platings composed of a plurality of elements and multilayer plating can be easily manufactured.

【0043】また真空蒸着に当っては、蒸発層から発生
した各金属蒸気を高周波等を用いてイオン化し、これを
基材に蒸着させる所請イオンプレーティング法を採用す
ることも有効であり、この方法を採用すると、より緻密
でピンホール欠陥等がなく密着性の優れた被膜を得るこ
とが出来る。
Further, in vacuum vapor deposition, it is also effective to employ a contract ion plating method in which each metal vapor generated from the evaporation layer is ionized by using a high frequency wave or the like and vaporized on the substrate. When this method is adopted, it is possible to obtain a film that is more precise and has no pinhole defect or the like and excellent adhesion.

【0044】[0044]

【実施例】以下に実施例を挙げて本発明を更に詳細に説
明するが、下記実施例は本発明を制限するものではな
く、前・後記の趣旨を逸脱しない範囲で変更実施するこ
とは全て本発明の技術的範囲に包含される。
The present invention will be described in more detail with reference to the following examples, but the following examples are not intended to limit the present invention, and all modifications can be made without departing from the spirit of the preceding and the following. It is included in the technical scope of the present invention.

【0045】実施例1 図1および図2で示した連続蒸着めっき設備を用いて、
下記に示す種々の条件にて蒸着Al/Al−Ti合金2
層めっき鋼板を作製した。 <蒸着めっき条件> ・被めっき帯:冷延鋼板(低炭素Alキルド鋼) ・被めっき帯前処理:アルカリ電解脱脂−水洗−乾燥後
にH2 −N2 混合ガスによるガス還元炉に導入し、鋼板
表面の還元による清浄化前処理 ・めっき前の被めっき材温度:200〜350℃ ・蒸発原料:Al Al−Ti合金 ・蒸発槽:Al浴用蒸発槽:高純度電融アルミナ蒸発槽 Al−Ti合金浴用蒸発槽:グラファイト蒸発槽 ・蒸発原料の加熱蒸発源:Al浴 :Alワイ
ヤーによる連続供給 Al−Ti合金浴:AlワイヤーとTiワイヤーを各々
独立したワイヤー供給装置によって合金浴内へ連続供給 ・蒸発原料の加熱蒸発源:ピアス型電子銃(最大出力3
00kw) ・蒸着室真空度:1×10-2Pa以下 ・めっき付着量およびめっき組成のコントロール方法: 電子ビームのトータル出力およびトータル出力のAl
浴およびAl−Ti合金浴への配分比のコントロール 被めっき帯の走行速度の両者の組み合わせによる制御
Example 1 Using the continuous vapor deposition plating equipment shown in FIGS. 1 and 2,
Vapor-deposited Al / Al-Ti alloy 2 under various conditions shown below
A layer-plated steel sheet was produced. <Deposition Plating Conditions> be plated range: cold-rolled steel (low carbon Al-killed steel) to be plated bands Pretreatment: alkaline electrolytic degreasing - washing - introduced into the gas reduction furnace by H 2 -N 2 gas mixture after drying, Pre-cleaning treatment by reduction of steel sheet surface-Temperature of plated material before plating: 200 to 350 ° C-Evaporation raw material: Al Al-Ti alloy-Evaporation tank: Evaporation tank for Al bath: High-purity fused alumina evaporation tank Al-Ti Evaporation tank for alloy bath: Graphite evaporation tank-Heating evaporation source of evaporation raw material: Al bath: Continuous supply by Al wire Al-Ti alloy bath: Continuous supply of Al wire and Ti wire into the alloy bath by independent wire supply devices- Heating evaporation source of evaporation material: Pierce type electron gun (maximum output 3
00kw) ・ Deposition degree of vacuum in the deposition chamber: 1 × 10 -2 Pa or less ・ Control method of coating amount and plating composition: Total output of electron beam and Al of total output
Control of distribution ratio to bath and Al-Ti alloy bath Control by combination of both running speed of plated zone

【0046】<耐食性評価試験> <評価試験−1>めっき層表面からカッターナイフによ
るクロスカット傷およびエリクセンによる張り出し加工
(張り出し高さ7mm)を付与し、端面テープシールし
たものを供試材とし、塩水噴霧試験(5%NaCl水溶
液、35℃)を行って、各供試材の腐食による赤錆が発
生するまでの試験時間で評価した。 耐食性評価基準 ◎:耐食性優れる:赤錆発生5000時間超 △:耐食性やや劣る:赤錆発生100〜5000時間 ×:耐食性劣る :赤錆発生1000時間未満 得られた結果を比較材と共に表1に示す。
<Evaluation Test for Corrosion Resistance><EvaluationTest-1> Cross-cut scratches with a cutter knife and overhanging with Erichsen (overhanging height 7 mm) were applied to the surface of the plated layer, and the end face tape-sealed was used as a test material. A salt spray test (5% NaCl aqueous solution, 35 ° C.) was performed, and evaluation was made by the test time until red rust due to corrosion of each test material occurred. Corrosion Resistance Evaluation Criteria ⊚: Excellent corrosion resistance: more than 5000 hours of red rust occurrence Δ: Slightly inferior corrosion resistance: 100 to 5000 hours of red rust occurrence ×: Poor corrosion resistance: Less than 1000 hours of red rust occurrence

【0047】[0047]

【表1】 [Table 1]

【0048】<評価試験−2>切断面が露出された各供
試材を、食塩水溶液中に浸漬し、切断面の鋼板部から赤
錆が発生するまでの時間で評価した。 耐食性評価基準 ◎:耐食性優れる:赤錆発生100時間超 △:耐食性やや劣る:赤錆発生24〜100時間 ×:耐食性劣る :赤錆発生24時間未満 得られた結果を比較材と共に表2に示す。
<Evaluation Test-2> Each of the test materials having the exposed cut surface was immersed in a saline solution and evaluated by the time until red rust was generated from the steel plate portion of the cut surface. Corrosion Resistance Evaluation Criteria ⊚: Excellent corrosion resistance: Red rust generation for more than 100 hours Δ: Corrosion resistance slightly poor: Red rust generation for 24 to 100 hours ×: Corrosion resistance poor: Red rust generation for less than 24 hours The obtained results are shown in Table 2 together with the comparative material.

【0049】[0049]

【表2】 [Table 2]

【0050】表1および表2から明らかなように、本発
明で規定する蒸着Al/Al−Ti合金2層めっき鋼板
は優れた耐食性を有している。一方、本発明の2層めっ
き構造を有しない場合、または2層めっき構造であって
も下層めっき層中のTi含有量が本発明で規定する値よ
り少ない、あるいはめっき付着量比率が規定範囲を逸脱
する場合は、耐食性が不十分であることがわかる。
As is clear from Tables 1 and 2, the vapor-deposited Al / Al-Ti alloy double-layer plated steel sheet specified in the present invention has excellent corrosion resistance. On the other hand, in the case of not having the two-layer plating structure of the present invention, or even in the two-layer plating structure, the Ti content in the lower plating layer is less than the value specified in the present invention, or the plating adhesion ratio is within the specified range. If it deviates, it can be seen that the corrosion resistance is insufficient.

【0051】また、比較材として用いた溶融めっき鋼板
は、その種類にかかわらず、耐食性が不十分であり、本
発明のめっき鋼板に比べて耐食性が劣ることがわかる。
Further, it can be seen that the hot-dip plated steel sheet used as a comparative material has insufficient corrosion resistance regardless of its type, and is inferior in corrosion resistance to the plated steel sheet of the present invention.

【0052】[0052]

【発明の効果】本発明は以上の様に構成されており、耐
熱性、成形加工性、耐食性、特に孔耐食性に優れた表面
処理金属材を提供できるようになった。また本発明の製
造方法によって上記のような表面処理金属材を安価で効
率よく得られるようになった。
EFFECTS OF THE INVENTION The present invention is constituted as described above, and has made it possible to provide a surface-treated metal material which is excellent in heat resistance, moldability, corrosion resistance, especially pore corrosion resistance. In addition, the surface-treated metal material as described above can be obtained efficiently at low cost by the manufacturing method of the present invention.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の製造方法に用いる連続真空蒸着装置の
一例を示す該略図である。
FIG. 1 is a schematic view showing an example of a continuous vacuum vapor deposition apparatus used in the manufacturing method of the present invention.

【図2】本発明の製造方法に用いる連続真空蒸着装置の
一例の蒸着室を示す該略図である。
FIG. 2 is a schematic view showing a vapor deposition chamber of an example of a continuous vacuum vapor deposition apparatus used in the manufacturing method of the present invention.

【符号の説明】[Explanation of symbols]

1 被めっき金属材 2a 入側真空シール装置 2b 出側真空シール装置 3 デフレクターロール 4,4a,4b 真空蒸着室 5a Al−Ti合金蒸発槽 5b Al蒸発槽 6a Al−Ti合金浴 6b Al浴 7 サポートロール 8 Alワイヤー 9 Tiワイヤー 10 電子銃 11 電子ビーム 1 metal material to be plated 2a inlet side vacuum seal device 2b outlet side vacuum seal device 3 deflector roll 4, 4a, 4b vacuum deposition chamber 5a Al-Ti alloy evaporation tank 5b Al evaporation tank 6a Al-Ti alloy bath 6b Al bath 7 support Roll 8 Al wire 9 Ti wire 10 Electron gun 11 Electron beam

───────────────────────────────────────────────────── フロントページの続き (72)発明者 綾部 東太 兵庫県加古川市金沢町1番地 株式会社神 戸製鋼所加古川製鉄所内 (72)発明者 加藤 淳 兵庫県加古川市金沢町1番地 株式会社神 戸製鋼所加古川製鉄所内 (72)発明者 三宅 昭二 兵庫県加古川市金沢町1番地 株式会社神 戸製鋼所加古川製鉄所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tota Ayabe 1 Kanazawa Town, Kakogawa City, Hyogo Prefecture Kamido Steel Works, Ltd. Inside the Kakogawa Steel Works (72) Atsushi Kato 1 Kanazawa Town, Kakogawa City, Hyogo Prefecture Kamizawa Co., Ltd. Toko Works Kakogawa Works (72) Inventor Shoji Miyake 1 Kanazawa-cho, Kakogawa City, Hyogo Prefecture Kadodo Works Kakogawa Works

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 金属基材表面に、Tiを1〜30%(重
量%の意味、以下同じ)含有するAl−Ti合金蒸着め
っき層が形成され、更にその上へ純Al蒸着めっき層が
形成されたものであることを特徴とする高耐食性表面処
理金属材。
1. An Al—Ti alloy vapor deposition plating layer containing 1 to 30% of Ti (meaning weight%; the same applies hereinafter) is formed on the surface of a metal substrate, and a pure Al vapor deposition plating layer is further formed thereon. Highly corrosion-resistant surface-treated metal material characterized by being processed.
【請求項2】 請求項1に記載の表面処理金属材であっ
て、下記[1]式を満足するものである高耐食性表面処
理金属材。 1/5≦R≦1・・・[1] 但し、Rは前記純Al蒸着めっき層の付着量を[Al]
(g/m2)、前記Al−Ti合金蒸着めっき層の付着量
を[Al−Ti](g/m2)としたときの[Al]/
[Al−Ti]を表わす。
2. The surface-treated metal material according to claim 1, wherein the highly-corrosion-resistant surface-treated metal material satisfies the following formula [1]. ⅕ ≦ R ≦ 1 ... [1] where R is the amount of the pure Al vapor deposition plated layer [Al]
(G / m 2 ), [Al] / when the adhesion amount of the Al—Ti alloy vapor deposition plating layer is [Al—Ti] (g / m 2 ).
Represents [Al-Ti].
【請求項3】 金属基材に連続的に蒸着めっきを施すに
あたり、真空蒸着室内に、該基材金属の走行方向に対し
て上流側にAl−Ti合金蒸発槽、下流側にAl蒸発槽
を並設し、各蒸発槽を高エネルギービームで加熱するこ
とによりAl−Ti混合蒸気とAl蒸気を発生させると
共に、表面の清浄化された該金属基材を該真空蒸着室内
を通して連続的に走行せしめ、金属表面に蒸着Al/A
l−Ti合金系2層めっきを施すことを特徴とする高耐
食性表面処理金属材の製造方法。
3. When continuously performing vapor deposition plating on a metal base material, an Al—Ti alloy evaporation tank is provided on the upstream side and an Al evaporation tank is provided on the downstream side in the vacuum evaporation chamber with respect to the running direction of the base metal. Al-Ti mixed vapor and Al vapor are generated by arranging them in parallel and heating each evaporation tank with a high-energy beam, and the metal substrate whose surface has been cleaned is continuously run through the vacuum deposition chamber. , Evaporated Al / A on metal surface
A method for producing a highly-corrosion-resistant surface-treated metal material, which comprises performing 1-Ti alloy-based two-layer plating.
JP23604392A 1992-09-03 1992-09-03 Highly corrosion resistant surface treated metallic material and its production Withdrawn JPH0688208A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23604392A JPH0688208A (en) 1992-09-03 1992-09-03 Highly corrosion resistant surface treated metallic material and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23604392A JPH0688208A (en) 1992-09-03 1992-09-03 Highly corrosion resistant surface treated metallic material and its production

Publications (1)

Publication Number Publication Date
JPH0688208A true JPH0688208A (en) 1994-03-29

Family

ID=16994918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23604392A Withdrawn JPH0688208A (en) 1992-09-03 1992-09-03 Highly corrosion resistant surface treated metallic material and its production

Country Status (1)

Country Link
JP (1) JPH0688208A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6984457B2 (en) 2003-06-27 2006-01-10 Kobe Steel Ltd. Titanium material, production thereof, and exhaust pipe
DE112007000544T5 (en) 2006-03-30 2009-01-15 Kabushiki Kaisha Kobe Seiko Sho, Kobe Titanium material and exhaust pipe for engine
US9011976B2 (en) 2005-10-05 2015-04-21 Nippon Steel & Sumitomo Metal Corporation Titanium sheet covered with protective film superior in high temperature oxidation resistance and high temperature salt damage resistance, automobile exhaust system using same, and methods of production of same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6984457B2 (en) 2003-06-27 2006-01-10 Kobe Steel Ltd. Titanium material, production thereof, and exhaust pipe
EP2014782A1 (en) 2003-06-27 2009-01-14 Kabushiki Kaisha Kobe Seiko Sho Titanium material, production thereof, and exhaust pipe
US9011976B2 (en) 2005-10-05 2015-04-21 Nippon Steel & Sumitomo Metal Corporation Titanium sheet covered with protective film superior in high temperature oxidation resistance and high temperature salt damage resistance, automobile exhaust system using same, and methods of production of same
DE112007000544T5 (en) 2006-03-30 2009-01-15 Kabushiki Kaisha Kobe Seiko Sho, Kobe Titanium material and exhaust pipe for engine
US8431231B2 (en) 2006-03-30 2013-04-30 Kobe Steel, Ltd. Titanium Material and Exhaust Pipe for Engine
DE112007000544B4 (en) 2006-03-30 2018-04-05 Kabushiki Kaisha Kobe Seiko Sho Titanium material and exhaust pipe for engine

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