JPH0568546B2 - - Google Patents
Info
- Publication number
- JPH0568546B2 JPH0568546B2 JP60151223A JP15122385A JPH0568546B2 JP H0568546 B2 JPH0568546 B2 JP H0568546B2 JP 60151223 A JP60151223 A JP 60151223A JP 15122385 A JP15122385 A JP 15122385A JP H0568546 B2 JPH0568546 B2 JP H0568546B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- deposition chamber
- metal band
- evaporation
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002184 metal Substances 0.000 claims description 82
- 229910052751 metal Inorganic materials 0.000 claims description 82
- 238000000151 deposition Methods 0.000 claims description 24
- 230000008021 deposition Effects 0.000 claims description 21
- 238000001704 evaporation Methods 0.000 claims description 21
- 230000008020 evaporation Effects 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 15
- 238000004804 winding Methods 0.000 claims description 15
- 238000001771 vacuum deposition Methods 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 9
- 238000007738 vacuum evaporation Methods 0.000 description 13
- 238000007740 vapor deposition Methods 0.000 description 9
- 229910000831 Steel Inorganic materials 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
本発明は主として連続的に鋼帯などの金属帯の
片面に亜鉛などの真空蒸着用金属を真空蒸着させ
る際に、真空蒸着用金属が金属帯の裏面に蒸着さ
れる現象が発生することを防止することのできる
片面連続真空蒸着方法に関するものである。
The present invention mainly aims to prevent the phenomenon that the metal for vacuum deposition is deposited on the back side of the metal strip when continuously vacuum depositing the metal for vacuum deposition such as zinc on one side of the metal strip such as a steel strip. This invention relates to a single-sided continuous vacuum evaporation method that allows for continuous vacuum deposition on one side.
従来より真空蒸着は被蒸着用の基材の片面に簡
単且つ均一に所望の厚さに真空蒸着用金属を蒸着
できるため、小さな物品には広く応用されてい
た。しかしながら、鋼帯に亜鉛を連続的に真空蒸
着させて大量の亜鉛蒸着鋼帯を製造するというよ
うな大掛りな連続真空蒸着装置は技術的に種々の
問題があつて殆んど開発されていない。
Conventionally, vacuum evaporation has been widely applied to small articles because a metal for vacuum evaporation can be easily and uniformly deposited to a desired thickness on one side of a substrate to be evaporated. However, large-scale continuous vacuum evaporation equipment that can continuously vacuum evaporate zinc onto steel strips to produce large quantities of zinc-coated steel strips has been difficult to develop due to various technical problems. .
このような現状において、本出願人等は工業的
に大量の真空蒸着亜鉛鋼帯を製造すべく大規模な
テストプラントを製作して連続真空蒸着を行つて
きた。
この連続真空蒸着装置は、前処理炉により表面
を清浄化された金属帯を大気圧から蒸着室までの
圧力勾配を作る真空シール装置を経て蒸着室内へ
導き、該蒸着室内に設置されている巻付けロール
に金属帯を巻き付けてその移動方向を変向せしめ
る過程で該蒸着室内に設置されている蒸発槽から
蒸発した蒸発金属を金属帯の表面にのみ蒸着せし
める片面連続真空蒸着装置であるが、このような
片面連続真空蒸着装置においては真空蒸着される
金属帯は予め前処理炉により表面を清浄化させる
必要があり、この前処理炉としては還元性ガス雰
囲気中で加熱処理する方法を採用するため金属帯
に大きな張力を付与せしめておくと破断してしま
うためその張力は小さな状態で前処理を行う必要
があり、また大きな張力を付与する必要もなかつ
たのである。
しかしながら、このような前処理炉により表面
を清浄化された金属帯を大気圧から蒸着室までの
圧力勾配を作る真空シール装置を経て蒸着室内へ
導き、該蒸着室内に設置されている巻付けロール
に金属帯を巻き付けてその移動方向を変向せしめ
る過程で該蒸着室内に設置されている蒸発槽から
蒸発した蒸発金属を金属帯の片面すなわち表面の
みに蒸着せしめるに際し、蒸着室内に設置されて
いる巻付けロールに金属帯を巻き付けてその移動
方向を変向せしめる過程で該蒸着室内に設置され
ている蒸発槽から蒸発した蒸発金属を金属帯の表
面に蒸着せしめると、金属帯の両端部が巻付けロ
ールに密着した状態に巻き付かない現象が生じて
金属帯と巻付けロールとの間に蒸発金属が侵入し
て金属帯の裏面にまで蒸着が行われてしまい、片
面連続真空蒸着を行う目的が達成できないという
問題点が生じた。
Under these circumstances, the present applicant and others have constructed a large-scale test plant and performed continuous vacuum deposition in order to industrially manufacture large quantities of vacuum deposited zinc steel strips. This continuous vacuum evaporation system introduces a metal strip whose surface has been cleaned in a pretreatment furnace into a evaporation chamber through a vacuum sealing device that creates a pressure gradient from atmospheric pressure to the evaporation chamber. This is a single-sided continuous vacuum evaporation device that evaporates the evaporated metal from the evaporation tank installed in the evaporation chamber only onto the surface of the metal band during the process of wrapping the metal band around the attaching roll and changing the direction of movement of the metal band. In such a single-sided continuous vacuum deposition apparatus, the surface of the metal strip to be vacuum-deposited must be cleaned in advance in a pretreatment furnace, and this pretreatment furnace employs a method of heat treatment in a reducing gas atmosphere. Therefore, if a large tension is applied to the metal strip, it will break, so it is necessary to carry out pretreatment with a small tension, and there is no need to apply a large tension. However, the metal strip whose surface has been cleaned by such a pre-treatment furnace is guided into the deposition chamber through a vacuum sealing device that creates a pressure gradient from atmospheric pressure to the deposition chamber, and then the winding roll installed in the deposition chamber is passed through a vacuum sealing device that creates a pressure gradient from atmospheric pressure to the deposition chamber. In the process of wrapping the metal strip around the metal strip and changing its direction of movement, the evaporated metal evaporated from the evaporation tank installed in the vapor deposition chamber is deposited on only one side, that is, the surface of the metal strip. In the process of winding a metal band around a winding roll and changing its moving direction, when the evaporated metal evaporated from the evaporation tank installed in the deposition chamber is deposited on the surface of the metal band, both ends of the metal band are rolled. The purpose of single-sided continuous vacuum evaporation is to avoid a phenomenon in which the metal band is not tightly wrapped around the wrapping roll, and the evaporated metal enters between the metal band and the wrapping roll, causing evaporation to occur on the back side of the metal band. The problem arose that it was not possible to achieve this goal.
本発明者等は上記したような問題点を除去すべ
く鋭意研究の結果、金属帯の裏面に蒸発金属が蒸
着されるのは蒸着室内を移動する金属帯の張力が
小さいために金属帯が巻付けロールに密接した状
態で移動しないからであつて、前処理炉の出側に
ブライドルロールを設置して蒸着室内を移動する
金属帯が巻付けロールに密接させた状態に巻き付
いて移動するように前処理炉中を移動する金属帯
の張力よりも蒸着室内を移動する金属帯の張力を
大きくしてやればよいことを究明して本発明を完
成したのである。
すなわち、本発明は前処理炉により表面を清浄
化された金属帯を大気圧から蒸着室までの圧力勾
配を作る真空シール装置を経て蒸着室内へ導き、
該蒸着室内に設置されている巻付けロールに金属
帯を巻き付けてその移動方向を変向せしめる過程
で該蒸着室内に設置されている蒸発槽から蒸発し
た蒸発金属を金属帯の表面に蒸着せしめるに際
し、前記前処理炉の出側にブライドルロールを設
置して該蒸着室内を移動する金属帯の張力を前記
前処理炉中を移動する金属帯の張力より高めて金
属帯の両縁部を前記巻付けロールに密接させた状
態に巻き付けて移動させることを特徴とする片面
連続真空蒸着方法に関するものである。
As a result of intensive research to eliminate the above-mentioned problems, the inventors of the present invention found that the reason why the evaporated metal is deposited on the back side of the metal strip is that the metal strip is rolled up because the tension of the metal strip moving in the deposition chamber is small. This is because the metal strip does not move in close contact with the wrapping roll, and a bridle roll is installed on the outlet side of the pretreatment furnace so that the metal band moving in the deposition chamber wraps tightly around the wrapping roll and moves. They completed the present invention by discovering that the tension of the metal band moving in the deposition chamber can be made greater than the tension of the metal band moving in the pretreatment furnace. That is, in the present invention, a metal strip whose surface has been cleaned in a pretreatment furnace is guided into a deposition chamber through a vacuum sealing device that creates a pressure gradient from atmospheric pressure to the deposition chamber.
In the process of winding the metal band around a winding roll installed in the vapor deposition chamber and changing its moving direction, the evaporated metal evaporated from the evaporation tank installed in the vapor deposition chamber is deposited on the surface of the metal band. , a bridle roll is installed on the exit side of the pretreatment furnace, and the tension of the metal band moving in the deposition chamber is made higher than the tension of the metal band moving in the pretreatment furnace, so that both edges of the metal band are rolled. The present invention relates to a single-sided continuous vacuum deposition method characterized in that the film is wound closely around a deposition roll and moved.
以下、図面により本発明に係る片面連続真空蒸
着方法について詳細に説明する。
図は本発明方法を実施するための本装置により
真空蒸着を行つている状態を示す概略説明図であ
る。
図中、１は真空蒸着される金属帯２の表面を清
浄化させるために、燃料空気比率を不完全燃焼域
にて燃焼させた高温燃焼ガスによつて金属帯２の
表面に付着している圧延油や防錆油を蒸発又は化
学反応により除去した後に弱酸化した金属帯２を
水素等の還元性ガス雰囲気中で還元させると同時
に金属帯２の軟化を行う焼鈍を目的とした前処理
炉である。３は前処理炉１により表面を清浄化さ
れた金属帯２を大気圧から次に説明する蒸着室ま
での圧力勾配を作る真空シール装置、４は真空シ
ール装置３を経て移動せしめられてきた金属帯２
の片面である表面にのみ蒸発金属を真空蒸着せし
めるための蒸着室であり通常真空蒸着用金属の飽
和蒸気圧力より低い圧力（例えば10Torr程度）
の不活性ガス雰囲気下にある。５は蒸着室４内に
設置されている蒸発槽であり、大気圧下にある真
空蒸着用金属の溶解炉７によつて溶解された真空
蒸着用溶融金属８が吸上管９を介して蒸着室４の
圧力と大気圧との差によつてこの蒸発槽５内へ供
給されるようになつている。６は蒸着室４内に設
置されている巻付けロールであり、金属帯２がそ
の周囲に巻き付けられてその移動方向を変向せし
められる過程で蒸着室４内に設置されている蒸発
槽５から蒸発した蒸発金属が金属帯２の表面に蒸
着せしめられるのである。１０は金属帯２の両縁
部が巻付けロール６の周囲に密接した状態に巻き
付いてその移動方向を変向せしめられるように蒸
着室４内を移動する金属帯２の張力を前処理炉１
中を移動する金属帯２の張力より高めるために処
理炉１の出側に設置されているブライドルロール
である。
Hereinafter, the single-sided continuous vacuum deposition method according to the present invention will be explained in detail with reference to the drawings. The figure is a schematic explanatory diagram showing a state in which vacuum evaporation is performed by the present apparatus for carrying out the method of the present invention. In the figure, in order to clean the surface of the metal strip 2 to be vacuum-deposited, 1 is attached to the surface of the metal strip 2 by high-temperature combustion gas that is burned in an incomplete combustion region with a fuel-air ratio. A pretreatment furnace for the purpose of annealing, which reduces the slightly oxidized metal strip 2 in an atmosphere of a reducing gas such as hydrogen after removing rolling oil or rust preventive oil by evaporation or chemical reaction, and at the same time softens the metal strip 2. It is. 3 is a vacuum sealing device that creates a pressure gradient from atmospheric pressure to the vapor deposition chamber, which will be described next, for the metal strip 2 whose surface has been cleaned in the pretreatment furnace 1; 4 is the metal that has been moved through the vacuum sealing device 3; Obi 2
This is a vapor deposition chamber for vacuum-depositing evaporated metal only on one surface of
under an inert gas atmosphere. Reference numeral 5 denotes an evaporation tank installed in the evaporation chamber 4, in which molten metal 8 for vacuum evaporation melted by the melting furnace 7 for metal for vacuum evaporation under atmospheric pressure is vapor-deposited via a suction pipe 9. The water is supplied into the evaporation tank 5 based on the difference between the pressure in the chamber 4 and the atmospheric pressure. Reference numeral 6 denotes a winding roll installed in the vapor deposition chamber 4, and in the process of wrapping the metal band 2 around it and changing its direction of movement, the metal band 2 is wound from the evaporation tank 5 installed in the vapor deposition chamber 4. The evaporated metal is deposited on the surface of the metal band 2. Reference numeral 10 denotes a pretreatment furnace 1 which controls the tension of the metal band 2 moving in the vapor deposition chamber 4 so that both edges of the metal band 2 are closely wrapped around the winding roll 6 and the direction of movement of the metal band 2 is changed.
This is a bridle roll installed on the exit side of the processing furnace 1 to increase the tension higher than the tension of the metal band 2 moving inside.
かかる構成において、前処理炉１により表面を
清浄化された金属帯２は大気圧から蒸着室までの
圧力勾配を作る真空シール装置３を経て蒸着室４
内へ導かれ、蒸着室４内に設置されている巻付け
ロール６に巻き付いてその移動方向を変向せしめ
られる過程で蒸着室４内に設置されている蒸発槽
５から蒸発した蒸発金属をその表面に蒸着せしめ
られるのであるが、前処理炉１の出側にはブライ
ドルロール１０が設置されていて蒸着室４内を移
動する金属帯２の両縁部が巻付けロール６に密接
させた状態に巻き付いた状態で移動するように蒸
着室４内を移動する金属帯２の張力が前処理炉１
中を移動する金属帯２の張力より高められている
ため、巻付けロールに密接している側である金属
帯２の裏面には真空蒸着用金属の蒸発金属が蒸着
することがないのである。
In this configuration, the metal strip 2 whose surface has been cleaned by the pretreatment furnace 1 passes through the vacuum sealing device 3 that creates a pressure gradient from atmospheric pressure to the deposition chamber 4.
The evaporated metal evaporated from the evaporation tank 5 installed in the evaporation chamber 4 is guided into the evaporation chamber 4 and wound around the winding roll 6 installed in the evaporation chamber 4 to change its direction of movement. A bridle roll 10 is installed on the outlet side of the pretreatment furnace 1 so that both edges of the metal strip 2 moving in the deposition chamber 4 are brought into close contact with the winding roll 6. The tension of the metal band 2 moving in the deposition chamber 4 so as to wrap around the pretreatment furnace 1
Since the tension is higher than that of the metal strip 2 moving inside, the evaporated metal of the metal for vacuum deposition is not deposited on the back surface of the metal strip 2, which is the side that is in close contact with the winding roll.
以上詳述した如く本発明は、工業的規模で連続
的に金属帯の表面のみに蒸着室内に設置されてい
る蒸発槽から蒸発した蒸発金属を蒸着せしめるに
際し、蒸着室内に設置されている蒸発槽から蒸発
した蒸発金属が金属帯の表面のみならず裏面にも
蒸着される現象を、金属帯の表面を清浄化させる
ために設置してある前処理炉の出側にブライドル
ロールを設置して蒸着室内を移動する金属帯の張
力を前処理炉中を移動する金属帯の張力より高め
て金属帯の両縁部を蒸着室内に設置されている巻
付けロールに密接させた状態に巻き付けて移動さ
せるという極めて簡単な手段により防止する方法
であり、本出願人等が先に提案した連続真空蒸着
装置に新らたに設置するのは前処理炉の出側に設
置するブライドルロールのみであるで安価且つ容
易に実施できると共に前処理炉による前処理に何
ら弊害も発生せしめないのであり、真空蒸着の良
好な片面連続蒸着を可能にするという特長を有効
に発揮せしめ得るので、片面連続真空蒸着を工業
的に効率良く実施できる本発明の工業的価値は非
常に大きなものがある。
As described in detail above, the present invention provides a method for continuously depositing evaporated metal from an evaporation tank installed in a deposition chamber onto only the surface of a metal strip on an industrial scale. To prevent the phenomenon in which the evaporated metal is deposited not only on the surface of the metal strip but also on the back surface, a bridle roll is installed on the outlet side of a pretreatment furnace installed to clean the surface of the metal strip. The tension of the metal band moving in the chamber is made higher than the tension of the metal band moving in the pretreatment furnace, and both edges of the metal band are wrapped tightly around the winding roll installed in the deposition chamber and moved. This is a very simple method to prevent this, and the only new installation in the continuous vacuum evaporation equipment proposed by the applicant and others is the bridle roll installed on the outlet side of the pretreatment furnace, making it inexpensive. Moreover, it is easy to carry out, does not cause any adverse effects on pretreatment using a pretreatment furnace, and can effectively utilize the advantage of vacuum evaporation to enable good single-sided continuous vacuum evaporation, making single-sided continuous vacuum evaporation industrially possible. The industrial value of the present invention, which can be carried out with high efficiency, is extremely large.
図面は本発明方法を実施するための装置により
真空蒸着を行つている状態を示す概略説明図であ
る。
１……前処理炉、２……金属帯、３……真空シ
ール装置、４……蒸着室、５……蒸発槽、６……
巻付けロール、７……溶解炉、８……真空蒸着用
溶融金属、９……吸上管、１０……ブライドルロ
ール。
The drawing is a schematic explanatory diagram showing a state in which vacuum deposition is performed by an apparatus for carrying out the method of the present invention. 1... Pretreatment furnace, 2... Metal band, 3... Vacuum sealing device, 4... Vapor deposition chamber, 5... Evaporation tank, 6...
Winding roll, 7... Melting furnace, 8... Molten metal for vacuum deposition, 9... Suction tube, 10... Bridle roll.
Claims (1)
大気圧から蒸着室までの圧力勾配を作る真空シー
ル装置を経て蒸着室内に導き、該蒸着室内に設置
されている巻付けロールに金属帯を巻き付けてそ
の移動方向を変更せしめる過程で該蒸着室内に設
置されている蒸発槽から蒸発した蒸発金属を金属
帯の表面に蒸着せしめるに際し、前記前処理炉の
出側にブライドルロールを設置して該蒸着室内を
移動する金属帯の張力を前記前処理炉中を移動す
る金属帯の張力より高めて金属帯の両縁部を前記
巻付けロールに密接させた状態に巻き付けて移動
させることを特徴とする片面連続真空蒸着方法。1. The metal strip whose surface has been cleaned in the pretreatment furnace is guided into the deposition chamber through a vacuum sealing device that creates a pressure gradient from atmospheric pressure to the deposition chamber, and the metal strip is placed around a winding roll installed in the deposition chamber. In the process of winding and changing the direction of movement, a bridle roll is installed on the exit side of the pretreatment furnace to deposit the evaporated metal from the evaporation tank installed in the evaporation chamber onto the surface of the metal band. The method is characterized in that the tension of the metal band moving in the deposition chamber is made higher than the tension of the metal band moving in the pretreatment furnace, and both edges of the metal band are wound around the winding roll in close contact with each other. Single-sided continuous vacuum deposition method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15122385A JPS6213571A (en) | 1985-07-11 | 1985-07-11 | Method and apparatus for continuous vapor deposition on one side |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15122385A JPS6213571A (en) | 1985-07-11 | 1985-07-11 | Method and apparatus for continuous vapor deposition on one side |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6213571A JPS6213571A (en) | 1987-01-22 |
| JPH0568546B2 true JPH0568546B2 (en) | 1993-09-29 |
Family
ID=15513935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15122385A Granted JPS6213571A (en) | 1985-07-11 | 1985-07-11 | Method and apparatus for continuous vapor deposition on one side |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6213571A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0356054U (en) * | 1989-09-26 | 1991-05-29 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5330932A (en) * | 1976-09-03 | 1978-03-23 | Mitsubishi Heavy Ind Ltd | Continuous vacuum deposition zinc plating method |
| JPS5938382A (en) * | 1982-08-26 | 1984-03-02 | Mitsubishi Heavy Ind Ltd | Vacuum deposition device |
| JPS60116787A (en) * | 1983-11-30 | 1985-06-24 | Mitsubishi Heavy Ind Ltd | Method and device for plating |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6111225Y2 (en) * | 1981-04-01 | 1986-04-09 |
-
1985
- 1985-07-11 JP JP15122385A patent/JPS6213571A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5330932A (en) * | 1976-09-03 | 1978-03-23 | Mitsubishi Heavy Ind Ltd | Continuous vacuum deposition zinc plating method |
| JPS5938382A (en) * | 1982-08-26 | 1984-03-02 | Mitsubishi Heavy Ind Ltd | Vacuum deposition device |
| JPS60116787A (en) * | 1983-11-30 | 1985-06-24 | Mitsubishi Heavy Ind Ltd | Method and device for plating |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6213571A (en) | 1987-01-22 |
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