JPS5938382A - Vacuum deposition device - Google Patents

Vacuum deposition device

Info

Publication number
JPS5938382A
JPS5938382A JP14690982A JP14690982A JPS5938382A JP S5938382 A JPS5938382 A JP S5938382A JP 14690982 A JP14690982 A JP 14690982A JP 14690982 A JP14690982 A JP 14690982A JP S5938382 A JPS5938382 A JP S5938382A
Authority
JP
Japan
Prior art keywords
vapor
hood
vacuum
steel strip
cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14690982A
Other languages
Japanese (ja)
Other versions
JPS6160912B2 (en
Inventor
Kenichi Yanagi
謙一 柳
Toshio Taguchi
田口 俊夫
Tetsuyoshi Wada
哲義 和田
Heizaburo Furukawa
古川 平三郎
Kanji Wake
和気 完治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP14690982A priority Critical patent/JPS5938382A/en
Publication of JPS5938382A publication Critical patent/JPS5938382A/en
Publication of JPS6160912B2 publication Critical patent/JPS6160912B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Abstract

PURPOSE:To provide a titled device which prevents the deposition and solidification of the metal in a vacuum deposition chamber and improves the working efficiency of the device, by the constitution wherein a slight space is formed between a rotary cell and a cover connecting to a hood to prevent the leakage of the vapor of vapor deposition metal. CONSTITUTION:A slight clearance 13 in which a steel strip is passed is formed between a cover 12 connecting to a hood 20 and a rotary cell 9 under rotation in an arrow 28 direction in a vacuum chamber 7 to prevent the leakage of metallic vapor 23 to the inside 8 of the chamber 7 in a vacuum deposition device which depposits the vapor 23 evaporating from the molten metal 16 in a crucible 15 by evaporation on the strip 1 wrapped on the cell 9 and passed in said chamber by guiding the vapor with a hood 20 through a vapor deposition port 22. Heaters 10, 11, 19 are provided respectively to the cell 9, the cover 12 and the hood 20 to heat the vapor 23 to the reevaporation temp. or above, whereby the vapor deposition of the vapor 23 is prevented, the need for cleaning and maintaining the entire part of the chamber 7 is eliminated and the working efficiency of the device is improved.

Description

【発明の詳細な説明】 本発明は、帯鋼へ全縮蒸気を蒸着させる真空蒸着装置に
関し、特に帯鋼へ蒸着されない余剰の金属蒸気を発生さ
せないようにした上記装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum evaporation apparatus for depositing fully condensed steam onto a steel strip, and more particularly to the above-mentioned apparatus in which surplus metal vapor that is not deposited onto the steel strip is not generated.

従来、帯鋼へ金属蒸気を蒸着させる真空蒸着装置として
第1図に示すようなものが知られていた0 第1図中、1は帯鋼、2は真空容器、5は溶融金h5を
溶解するためのルツボ、4Fi該ルツボ5を加熱するヒ
ータ、7は蒸発した金属蒸気を蒸着口6へ案内するフー
ド、8はフード7を加熱するヒータである。
Conventionally, a vacuum evaporation apparatus as shown in Fig. 1 has been known as a vacuum evaporation apparatus for vapor depositing metal vapor onto a steel strip. A heater for heating the crucible 5, 7 is a hood for guiding the evaporated metal vapor to the vapor deposition port 6, and 8 is a heater for heating the hood 7.

しかし、このような装置の場合、蒸着口6から金属蒸気
が余剰に噴出し、帯鋼1の蒸着を施すナイ面側に金属蒸
気が付着したり、あるいは真空容器2の内壁に付着する
等の欠点があった。
However, in the case of such a device, excessive metal vapor may be ejected from the vapor deposition port 6, and the metal vapor may adhere to the side of the steel strip 1 on which vapor deposition is performed, or may adhere to the inner wall of the vacuum vessel 2. There were drawbacks.

一方、紙やプラスチック類の基体に金属蒸気を蒸着させ
る技術として、基体の移動速度に一致した周速で回転す
るロールに基体を巻付け、基体の片側に金属蒸気を蒸着
させる手法が提案されている。
On the other hand, as a technique for depositing metal vapor onto paper or plastic substrates, a method has been proposed in which the substrate is wound around a roll that rotates at a circumferential speed that matches the moving speed of the substrate, and metal vapor is deposited on one side of the substrate. There is.

この手法は、第2図に示すように、ロール10表面に、
蒸着口6をはさんで基体1の進入及び退出側に、ロール
10及び基体1に接触しないような僅かの隙間を作るよ
うに弓状のカバー11..11.  を設け、該カバー
111.11゜全ロール10を中心に真空室e21 と
2! との2室に分割するように真空室側壁に固定し、
一方の真空室(低真空室) 21  から基体1¥:供
給し、ロール10に巻付けて移動させながら他の真空室
すなわち蒸着室(高真空室)22  へ導き、蒸着後に
再度上記の低真空室21  へ戻す手法である。この手
法によれば、上記のロール10とカバー111.11.
  間の隙間を気体が移動する際に抵抗が大きくなるた
め、高真空の蒸着室22内の蒸気が低真空室21  内
へ移動するのが防止されるし、また基体1の蒸着を施さ
ない面側に金属が付着するのを防止できるという効果は
あるものの、上記のカバー111.11.  は金属蒸
気より低温であるため、カバー11.、112  のロ
ール10に面した側すなわち隙間側に金属蒸気が付着堆
積し、長時間の運転に適さないという欠点があった。
In this method, as shown in FIG. 2, on the surface of the roll 10,
An arcuate cover 11 is placed on the entry and exit sides of the substrate 1 across the vapor deposition port 6 so as to create a slight gap so as not to contact the roll 10 and the substrate 1. .. 11. The cover 111.11° is centered around all the rolls 10 and vacuum chambers e21 and 2! Fix it to the side wall of the vacuum chamber so that it is divided into two chambers,
Substrate 1: is supplied from one vacuum chamber (low vacuum chamber) 21 and guided to the other vacuum chamber, that is, the vapor deposition chamber (high vacuum chamber) 22 while being moved around the roll 10, and after vapor deposition, the above low vacuum is again applied. This is a method of returning it to room 21. According to this method, the roll 10 and the cover 111.11.
Since the resistance increases when gas moves through the gap between the two, vapor in the high vacuum vapor deposition chamber 22 is prevented from moving into the low vacuum chamber 21, and the surface of the substrate 1 that is not subjected to vapor deposition is prevented from moving into the low vacuum chamber 21. Although it has the effect of preventing metal from adhering to the sides, the above-mentioned covers 111.11. Since the temperature is lower than that of metal vapor, cover 11. , 112 had the disadvantage that metal vapor was deposited on the side facing the roll 10, that is, on the gap side, making it unsuitable for long-term operation.

本発明者等は、この蒸着技術をこのような欠点を排除し
て前記第1図に示す帯鋼の蒸着装置に適用させ、第1図
の装置における欠点を解消させるべく研究を重ねた結果
、ロールに巻付けられて送行する帯鋼は、この走行中に
ロールの胴長方向の駆動側又はその反対側へ移動するこ
とから、弓状のカバーは蒸着口を帯鋼の幅より若干広く
なるように設けなければならないことが明らかとなった
。しかし、このようにすると余剰の蒸気が帯鋼が巻付け
られていないロール表面部に付着してしまうという新た
な問題に遭遇した。
The present inventors have applied this vapor deposition technique to the strip steel vapor deposition apparatus shown in FIG. 1, eliminating such drawbacks, and have conducted repeated research to eliminate the drawbacks of the apparatus shown in FIG. Since the steel strip wound around a roll and transported moves to the driving side or the opposite side in the longitudinal direction of the roll during this traveling, the arcuate cover makes the deposition port slightly wider than the width of the steel strip. It became clear that it had to be set up as such. However, when doing this, a new problem was encountered in that excess steam adhered to the surface of the roll where the steel strip was not wound.

本発明は、以上の欠点、問題点を悉く解消し、効率良く
帯鋼への真空蒸着を行うことのできる真空蒸着装置を提
供するものである。
The present invention solves all of the above drawbacks and problems and provides a vacuum evaporation apparatus that can efficiently perform vacuum evaporation onto a steel strip.

すなわち本発明は、高真空度の真空蒸着室に、帯鋼を巻
付けながら通板させる回転セルと、金F4t−溶解する
ルツボと、該ルツボに接続され金属蒸気を案内し蒸着口
が前記回転セルと対向するフードと、該蒸着口の帯鋼進
入側と退出側に前記フードには接続するが前記回転セル
に巻付けられた帯鋼には接触しないように僅かの隙間を
持たせた弓状のカバーとを設けてなシ、かつ前記回転セ
ルに該回転セルの帯鋼が巻付けられていない両端部に金
属蒸気が蒸着しないように回転セル表面を回転セル付近
の金属蒸気の蒸気圧下における金属蒸気の再蒸発温度以
上の温度に加熱する手段を設けると共に、前記フードと
カバーに金属蒸気が蒸着しないようにフードとカバーの
表面をフードとカバーの付近の金属蒸気の蒸気圧下にお
ける再蒸発温度以上に加熱する手段を設けたことを特徴
とする真空蒸着装置に関するものである。
That is, the present invention includes a rotating cell in which a steel strip is wound and passed through a high-vacuum vapor deposition chamber, a crucible for melting gold F4T, and a vapor deposition port connected to the crucible for guiding metal vapor into the rotating cell. A hood facing the cell, and bows connected to the hood but having a slight gap on the steel strip entrance and exit sides of the vapor deposition port so as not to contact the steel strip wound around the rotating cell. In order to prevent metal vapor from being deposited on both ends of the rotating cell where the steel strip is not wrapped around the rotating cell, the surface of the rotating cell is placed under the vapor pressure of the metal vapor near the rotating cell. In addition, the surface of the hood and cover is heated to a temperature higher than the re-evaporation temperature of metal vapor in the vicinity of the hood and cover to prevent metal vapor from being deposited on the hood and cover. The present invention relates to a vacuum evaporation apparatus characterized by being provided with means for heating above a temperature.

以下、添付図面を参照して本発明装置を詳細に説明する
Hereinafter, the apparatus of the present invention will be described in detail with reference to the accompanying drawings.

第5図は本発明装置の一実施態様例を示す図でちろ。FIG. 5 is a diagram showing an embodiment of the apparatus of the present invention.

第5図において、1は帯鋼、2は真空蒸着室7と接続さ
れた該蒸着室7より圧力の高い真空シール室、5は真空
シール装置、4および5は帯鋼1を真空蒸着室7へ進入
および退出させるための案内ロール、イSはロール室2
1と真空蒸着室7ン二接続する伸縮自在のジーVバラ、
9は帯鋼1全巻付けて金属蒸気を蒸着させる回転セル、
10は回転セルを加熱するヒータ、12は回転セル9に
近接され僅かな隙間15を持たせるように取付らり、た
帯鋼1の進入側および退出側のカバー、11は該カバー
12を加熱するヒータ、15け溶融全屈16を溶解する
ためのルツボ、14Vi該)Lツボ15を加熱するヒー
タ、2oは蒸発した金属蒸気25を蒸着口22へ案内す
るフード、18け隙間15を帯鋼1の板厚に応じて自在
に調節するためにカバー12とフード200間に設けら
れた伸縮自在のジャバラ、19けフード20を加熱する
ヒータ、17は真空蒸着室7を真空にするための真空ポ
ンプ、25はカバー12を開閉させ隙間15管調節する
開閉装置、矢印26および27け帯鋼1の人出方向、矢
印28は回転セル9の回転方向を示す0 以上のように構成される本発明装置は、次のような作用
効果を有する。
In FIG. 5, 1 is a steel strip, 2 is a vacuum sealing chamber connected to a vacuum evaporation chamber 7 and has a higher pressure than the evaporation chamber 7, 5 is a vacuum sealing device, 4 and 5 are a strip steel strip 1 A guide roll for entering and exiting the roll chamber 2.
A telescopic G-V rose that connects 1 and 7 vacuum deposition chambers,
9 is a rotating cell in which the entire steel strip 1 is wound and metal vapor is deposited;
10 is a heater that heats the rotation cell; 12 is installed close to the rotation cell 9 with a slight gap 15; covers on the entrance and exit sides of the steel strip 1; 11 is a heater that heats the cover 12; 2o is a hood for guiding the evaporated metal vapor 25 to the evaporation port 22; A telescopic bellows is provided between the cover 12 and the hood 200 to freely adjust the thickness of the plate 1, a heater 19 heats the hood 20, and a vacuum 17 makes the vacuum deposition chamber 7 evacuated. A pump, 25 is an opening/closing device for opening and closing the cover 12 and adjusting the gap 15, arrows 26 and 27 indicate the direction in which the steel strip 1 comes out, and arrow 28 indicates the rotation direction of the rotation cell 9. The invention device has the following effects.

ルツボ15の中でヒータ14により溶融金属16を所定
の温度範囲、例えば該金属16がZnの場合は約450
〜550℃に加熱溶解する。
In the crucible 15, the molten metal 16 is heated to a predetermined temperature range by the heater 14, for example, when the metal 16 is Zn, the temperature is about 450℃.
Heat and dissolve at ~550°C.

真空ポンプ17で真空蒸着室7の中の気体を排気し、該
室7の内部8を真空度1〜10−’ トールにする。こ
の時、回転セル9とカバー12との間の僅かの隙間15
を介してフード20の内部24も真空蒸着室7の内部8
と同一の真空度1〜10−’  トールになる。
The gas in the vacuum deposition chamber 7 is evacuated by the vacuum pump 17, and the interior 8 of the chamber 7 is brought to a degree of vacuum of 1 to 10-' Torr. At this time, a slight gap 15 between the rotation cell 9 and the cover 12
The inside 24 of the hood 20 is also connected to the inside 8 of the vacuum deposition chamber 7 through
The degree of vacuum is the same as that of 1 to 10-' Torr.

隙間15け、帯鋼1の板厚より大きく、帯鋼1が回転セ
ル?に巻付けられて移動する際にカバー12に接触しな
い最小の大きさに調節される。また、帯鋼1け連続して
通板されるため、帯鋼1同志の接続部分がカバー12位
置を通過する際にも、該接続部分がカバー12に接触し
ないように隙間15を調節する。
The gap is 15, larger than the plate thickness of steel strip 1, and steel strip 1 is a rotating cell? The cover is adjusted to the minimum size so that it does not come into contact with the cover 12 when it is wrapped around the cover 12 and moved. Furthermore, since one steel strip is passed through continuously, the gap 15 is adjusted so that the connecting portions of the steel strips 1 do not come into contact with the cover 12 even when the connecting portions pass through the cover 12 position.

更に、隙間15は、フード20内の金属蒸気25が真空
蒸着室7内に移動するのを妨げる作用金もなすもので、
隙間15が小さいと1〜10”” トール稈度の真空度
では、気体の流れは大気中の一般ガスの流れ、すなわち
粘性流の流れから分子流の流れになり、この分子流の流
れを流れ部りするには、隙間15を小さくすると共に、
隙間15の長さを長く(すなわちカバー12を長く)す
るのが効果があり、特に長さに比例して流れ難くなるた
め、隙間15の長さくすなわちカバー12の長さ)は予
め長く投信1しておき、そして上記の帯鋼1との接触に
ついても考慮しつつ隙間15を調節する。
Furthermore, the gap 15 also acts as a barrier to prevent the metal vapor 25 in the hood 20 from moving into the vacuum deposition chamber 7.
When the gap 15 is small, the vacuum level is 1 to 10", and the gas flow changes from a general gas flow in the atmosphere, that is, a viscous flow, to a molecular flow. In order to reduce the gap, reduce the gap 15 and
It is effective to increase the length of the gap 15 (that is, the length of the cover 12), and in particular, it becomes difficult to flow in proportion to the length. Then, the gap 15 is adjusted while also considering the contact with the steel strip 1 mentioned above.

この隙間15の調節は、次のようにして行われる。油圧
又は電動で作動するカバー12の開閉装置畷5で隙間1
5を予め大きくしておき、フード20の内部24が所定
の真空度に到達したなら、所定の僅かな隙間となるよう
に開閉装置25を作動させる。この時、内部24が所定
の真空度に到達すると、溶融金属16が蒸発を開始し、
内部24内に充満するが、この直前に所定の隙間15と
なるようにする。
Adjustment of this gap 15 is performed as follows. Gap 1 at opening/closing device furrow 5 of cover 12 operated hydraulically or electrically
5 is made large in advance, and when the inside 24 of the hood 20 reaches a predetermined degree of vacuum, the opening/closing device 25 is operated to create a predetermined small gap. At this time, when the interior 24 reaches a predetermined degree of vacuum, the molten metal 16 starts to evaporate,
The inside 24 is filled, but a predetermined gap 15 is created just before this.

隙間15は上記のように気体の流れ抵抗が大きくなるよ
うに作られているため、金属蒸気25はフード20の内
部24から真空蒸着室7の内部空間8へ洩れ出すことが
なく、真空蒸着室7は余剰の金属蒸気で汚染されず、従
来装置のように真空蒸着室を大気に開放し、定期的に全
屈固体と化した金属蒸気を除去するという操作は全く不
要であシ、蒸着メッキ作業の稼動率が著しく向上する。
Since the gap 15 is made to have a large gas flow resistance as described above, the metal vapor 25 does not leak from the inside 24 of the hood 20 into the internal space 8 of the vacuum deposition chamber 7, and the metal vapor 25 does not leak into the interior space 8 of the vacuum deposition chamber 7. 7 is not contaminated with excess metal vapor, and there is no need to open the vacuum evaporation chamber to the atmosphere and periodically remove metal vapor that has turned into a solid solid, as in conventional equipment, and it is possible to perform evaporation plating. Work efficiency is significantly improved.

まfc % この場合、フード20vil−ヒ−l 1
9で、カバー12をヒータ11で、それぞれ金属蒸気2
5が咬着しない温度、すなわちフード20およびカバー
12の近辺の金属蒸気25の蒸気圧下における金属蒸気
25の再蒸発温度以上の温度、例えば該蒸気25がZn
  の場合は前記した真空度1〜10−4 トールで2
50〜580℃に加熱する。これにより、フード20お
よびカバー12には金属蒸気25が蒸着せず、7−ド2
0およびカバー12Fi汚染されることがなく、フード
20の内部24と隙間15をクリーンな状態に長期間に
亘って維持することができる。
Ma fc % In this case, food 20 vil-hi-l 1
9, cover 12 is heated with metal vapor 2 by heater 11, respectively.
5 does not bite, that is, the temperature is higher than the re-evaporation temperature of the metal vapor 25 under the vapor pressure of the metal vapor 25 near the hood 20 and the cover 12, for example, the vapor 25 is Zn.
In the case of vacuum degree 1 to 10-4 Torr as mentioned above, 2
Heat to 50-580°C. As a result, the metal vapor 25 is not deposited on the hood 20 and the cover 12, and the 7-door 2
0 and the cover 12Fi are not contaminated, and the interior 24 of the hood 20 and the gap 15 can be maintained in a clean state for a long period of time.

更に、回転セル9もヒータ10で金属蒸気25が蒸着し
ない温度、すなわち回転セル?近辺の金属蒸気25の蒸
気圧下における金属蒸気25の再蒸発温度以上の温度、
例えばZn 蒸気の場合は1〜l 11−’  トール
テ250〜580℃に加熱し、回転セル9表面への蒸気
25の蒸着を防止し、該表面を長期連続期間に亘ってク
リーンな状態に維持する。
Furthermore, the rotation cell 9 is also kept at a temperature at which the metal vapor 25 is not deposited by the heater 10, that is, the rotation cell? A temperature equal to or higher than the re-evaporation temperature of the metal vapor 25 under the vapor pressure of the nearby metal vapor 25,
For example, in the case of Zn vapor, it is heated to 250 to 580°C to prevent the vapor 25 from being deposited on the surface of the rotating cell 9, and to maintain the surface in a clean state for a long period of time. .

この場合、真空蒸着室7内の真空度を上記の1〜10=
 トールの雰囲気に管理することが前提となる0すなわ
ち、この真空度の範囲であれば、帯鋼1Fi、上記温度
に加熱された回転セル9から熱をもらうことがなく、従
って帯鋼1に一旦蒸着された金属蒸気は再蒸発すること
はない。
In this case, the degree of vacuum in the vacuum deposition chamber 7 is set to 1 to 10 =
In other words, within this vacuum range, the steel strip 1Fi will not receive any heat from the rotating cell 9 heated to the above temperature, and therefore the steel strip 1 will not be heated once. Deposited metal vapors do not evaporate again.

例えば、zn 蒸気の場合、真空度が10−”ト−ルの
雰囲気下で帯鋼1の温度が約゛540℃以上になると再
蒸発が顕著にみられるが、真空度が上記の1トール以下
の高真空度の雰囲気下では帯鋼1と回転セル9との間の
熱伝達率が極めて小さく、帯鋼1が加熱された回転セル
9に巻付きながら通板する際に上記の温度以上に加熱さ
れるということはない。
For example, in the case of ZN vapor, re-evaporation is noticeable when the temperature of the steel strip 1 rises to about 540°C or higher in an atmosphere with a vacuum level of 10-'' Torr, but when the vacuum level is below 1 Torr, The heat transfer coefficient between the steel strip 1 and the rotating cell 9 is extremely low in the high vacuum atmosphere of It doesn't get heated.

以上は帯鋼1の片面にのみ金属蒸気25を蒸着させる際
の構成および作用についての説明であるが、第5図中符
号10〜20および22〜25で示す部品を更にもう1
組み組合せることにより、帯鋼10両面へ金属蒸気を蒸
着させることができる。この場合、帯鋼1の両面共同−
蒸着量とすることもできるし、ルツボ15の加熱ヒータ
14のヒータパワーt−調節することにより、帯鋼1の
片面と他面の蒸着量を変えた所謂差厚メッキも容易に行
うことができる。
The above is an explanation of the structure and operation when the metal vapor 25 is deposited only on one side of the steel strip 1. However, the parts indicated by reference numerals 10 to 20 and 22 to 25 in FIG.
By combining them, metal vapor can be deposited on both sides of the steel strip 10. In this case, both sides of the steel strip 1 -
By adjusting the heater power t of the heater 14 of the crucible 15, so-called differential thickness plating can be easily performed by changing the amount of vapor deposition on one side and the other side of the steel strip 1. .

以上詳述したように本発明装置によれば、余剰の金属蒸
気を真空蒸着室7内に洩らすことなく、またフード20
、カバー12に付着させることなく、帯鋼1への蒸着メ
ッキ全良好に行うことができ、従来のように真空蒸着槽
の全域に亘って金属蒸気が固化堆積したものを槽を開放
して除去しなければならないといった煩雑な保守管理が
不要であり、装置の稼動率を著しく向上させることがで
きる。
As described in detail above, according to the apparatus of the present invention, surplus metal vapor can be prevented from leaking into the vacuum deposition chamber 7, and the hood 20 can be
, the vapor deposition plating on the steel strip 1 can be perfectly performed without adhesion to the cover 12, and unlike conventional methods, metal vapor solidified and deposited over the entire area of the vacuum evaporation tank can be removed by opening the tank. There is no need for complicated maintenance management, and the operating rate of the device can be significantly improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は帯鋼へ金属蒸気を蒸着させる従来の真空蒸着装
置を示す図、第2図は紙やプラスチッククヘ金属蒸気を
蒸着させる従来の真空蒸着手法を示す図、第5図は本発
明装置の一実施態様例を示す図である0 復代理人  内 1)  明 復代理人  萩 原 亮 − 広島市西区観音新町四丁目6番 22号三菱重工業株式会社広島造 船所内 ■出 願 人 日新製鋼株式会社 東京都千代田区丸の内3丁目4 番1号
Figure 1 is a diagram showing a conventional vacuum evaporation apparatus for depositing metal vapor onto a steel strip, Figure 2 is a diagram showing a conventional vacuum evaporation method for depositing metal vapor onto paper or plastic strips, and Figure 5 is an apparatus according to the present invention. 0 Sub-Agent 1) Meifu Agent Ryo Hagiwara - Mitsubishi Heavy Industries, Ltd. Hiroshima Shipyard, 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima ■Applicant: Nisshin Steel Co., Ltd. 3-4-1 Marunouchi, Chiyoda-ku, Tokyo

Claims (1)

【特許請求の範囲】[Claims] 高真空度の真空蒸着室K、帯鋼を巻付けながら通板させ
る回転セルと、金属を溶解するルツボと、該ルツボに接
続され金属蒸気を案内し蒸着口が前記回転セルと対向す
るフードと、該蒸着口の帯鋼進入側と退出側に前記フー
ドには接続するが前記回転セルに巻付けられた帯鋼には
接触しないように僅かの隙間を持たせた弓状のカバーと
を設けてなシ、かつ前記回転セルに該回転セルの帯鋼が
巻付けられていない両端部に金属蒸気が蒸着しないよう
に回転セル表面を回転セル付近の金属蒸気の蒸気圧下に
おける金属蒸気の再蒸発温度以上の温度に加熱する手段
を設けると共に、前記フードとカバーに金属蒸気が蒸着
しないようにフードとカバーの表面をフードとカバーの
付近の金属蒸気の蒸気圧下における再蒸発温度以上に加
熱する手段を設けたことt%徴とする真空蒸着装置。
A vacuum evaporation chamber K with a high degree of vacuum, a rotating cell through which the steel strip is passed while being wound, a crucible for melting metal, and a hood connected to the crucible for guiding metal vapor and having a evaporation port facing the rotating cell. , arcuate covers connected to the hood but having a slight gap so as not to contact the steel strip wound around the rotation cell are provided on the steel strip entrance and exit sides of the vapor deposition port. reevaporation of the metal vapor under the vapor pressure of the metal vapor in the vicinity of the rotation cell so that the metal vapor is not deposited on both ends of the rotation cell where the steel strip is not wrapped around the rotation cell. and means for heating the surfaces of the hood and cover to a temperature higher than the re-evaporation temperature under the vapor pressure of the metal vapor in the vicinity of the hood and cover so as not to deposit metal vapor on the hood and cover. A vacuum evaporation apparatus having a t% characteristic of providing
JP14690982A 1982-08-26 1982-08-26 Vacuum deposition device Granted JPS5938382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14690982A JPS5938382A (en) 1982-08-26 1982-08-26 Vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14690982A JPS5938382A (en) 1982-08-26 1982-08-26 Vacuum deposition device

Publications (2)

Publication Number Publication Date
JPS5938382A true JPS5938382A (en) 1984-03-02
JPS6160912B2 JPS6160912B2 (en) 1986-12-23

Family

ID=15418306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14690982A Granted JPS5938382A (en) 1982-08-26 1982-08-26 Vacuum deposition device

Country Status (1)

Country Link
JP (1) JPS5938382A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197876A (en) * 1984-03-19 1985-10-07 Mitsubishi Heavy Ind Ltd Vacuum deposition device
JPS6213571A (en) * 1985-07-11 1987-01-22 Nisshin Steel Co Ltd Method and apparatus for continuous vapor deposition on one side
JPS62242040A (en) * 1986-04-10 1987-10-22 元旦ビユーティ工業株式会社 Transverse shingling roof panel and roof structure
JPS6347453A (en) * 1986-08-12 1988-02-29 元旦ビューティ工業株式会社 Transverse shingled roof
JPS6452949A (en) * 1987-08-25 1989-03-01 Funaki Shoji Kk Roof reroofing method of building
US5169451A (en) * 1990-09-28 1992-12-08 Mitsubishi Jukogyo Kabushiki Kaisha Vacuum vapor deposition apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51104445A (en) * 1975-03-12 1976-09-16 Pioneer Electronic Corp JOCHAKUSOCHI
JPS5233649U (en) * 1975-09-01 1977-03-09
JPS57131362A (en) * 1981-02-06 1982-08-14 Furukawa Electric Co Ltd:The Vacuum plating method and metal evaporating device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5233649B2 (en) * 1973-06-14 1977-08-30

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51104445A (en) * 1975-03-12 1976-09-16 Pioneer Electronic Corp JOCHAKUSOCHI
JPS5233649U (en) * 1975-09-01 1977-03-09
JPS57131362A (en) * 1981-02-06 1982-08-14 Furukawa Electric Co Ltd:The Vacuum plating method and metal evaporating device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197876A (en) * 1984-03-19 1985-10-07 Mitsubishi Heavy Ind Ltd Vacuum deposition device
JPS6353262B2 (en) * 1984-03-19 1988-10-21 Mitsubishi Jukogyo Kk
JPS6213571A (en) * 1985-07-11 1987-01-22 Nisshin Steel Co Ltd Method and apparatus for continuous vapor deposition on one side
JPH0568546B2 (en) * 1985-07-11 1993-09-29 Nisshin Steel Co Ltd
JPS62242040A (en) * 1986-04-10 1987-10-22 元旦ビユーティ工業株式会社 Transverse shingling roof panel and roof structure
JPS6347453A (en) * 1986-08-12 1988-02-29 元旦ビューティ工業株式会社 Transverse shingled roof
JPH0426370B2 (en) * 1986-08-12 1992-05-07 Gantan Beauty Kogyo Kk
JPS6452949A (en) * 1987-08-25 1989-03-01 Funaki Shoji Kk Roof reroofing method of building
US5169451A (en) * 1990-09-28 1992-12-08 Mitsubishi Jukogyo Kabushiki Kaisha Vacuum vapor deposition apparatus

Also Published As

Publication number Publication date
JPS6160912B2 (en) 1986-12-23

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