JPH02118072A - Vacuum deposition device - Google Patents
Vacuum deposition deviceInfo
- Publication number
- JPH02118072A JPH02118072A JP27094288A JP27094288A JPH02118072A JP H02118072 A JPH02118072 A JP H02118072A JP 27094288 A JP27094288 A JP 27094288A JP 27094288 A JP27094288 A JP 27094288A JP H02118072 A JPH02118072 A JP H02118072A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- vapor deposition
- cooling roll
- base plate
- depositing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 238000007740 vapor deposition Methods 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims abstract description 47
- 238000001816 cooling Methods 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 18
- 238000001704 evaporation Methods 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 9
- 238000007738 vacuum evaporation Methods 0.000 claims description 9
- 238000000151 deposition Methods 0.000 abstract description 22
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 238000007789 sealing Methods 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract description 6
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 3
- 239000011147 inorganic material Substances 0.000 abstract description 3
- 239000002985 plastic film Substances 0.000 abstract description 2
- 229920006255 plastic film Polymers 0.000 abstract description 2
- 229910020781 SixOy Inorganic materials 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
- 230000008021 deposition Effects 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、プラスチックフィルム、紙、銅帯等のよ5な
可撓性の基板に無機物、高融点金属等の昇華性物質を蒸
着する真空蒸着装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vacuum method for depositing sublimable substances such as inorganic substances and high melting point metals onto flexible substrates such as plastic films, paper, and copper strips. Related to vapor deposition equipment.
第2図は従来の真空蒸着装置の一例を示す縦断側面図で
ある。第2図において、コイル状に巻かれた基板1は蒸
着室2内にデフレクタロール3および冷却ロール4を介
して巻取りリール5および繰出しリール6に連絡して装
填されている。基板1は蒸着室2内が排気ポンプユニッ
ト11により所定の真空度に達した後1巻取りリール5
により走行し、冷却ロール4上で蒸着時の加熱による温
度上昇を減するよう冷却されながら、蒸着装置7により
蒸着され巻取られる。蒸着装置7は、基板10幅方向に
一定間隔を置いて複数個配設され蒸着材8を収納する容
器9と、同容器9の加熱装置1oとから構成され、蒸着
材8を走行基板lに向は蒸発させる。FIG. 2 is a longitudinal side view showing an example of a conventional vacuum evaporation apparatus. In FIG. 2, a coiled substrate 1 is loaded into a deposition chamber 2 in communication with a take-up reel 5 and a feed-out reel 6 via a deflector roll 3 and a cooling roll 4. The substrate 1 is transferred to the take-up reel 5 after the inside of the deposition chamber 2 reaches a predetermined degree of vacuum by the exhaust pump unit 11.
While being cooled on a cooling roll 4 to reduce the temperature rise due to heating during vapor deposition, the film is vapor deposited and wound up by a vapor deposition device 7. The vapor deposition device 7 is composed of a plurality of containers 9 which are arranged at regular intervals in the width direction of the substrate 10 and store the vapor deposition material 8, and a heating device 1o for the container 9, and is configured to heat the vapor deposition material 8 onto the traveling substrate l. The direction is evaporated.
ここで蒸着材8の収納容器9は冷却ロール4の下方に配
設されている。これは、蒸着材8が亜鉛。Here, a storage container 9 for the vapor deposition material 8 is arranged below the cooling roll 4 . In this case, the vapor deposition material 8 is zinc.
アルミニウム等の溶融金属である場合は、自白液面が水
平になるので、そこから蒸発する蒸気を効率良く基板1
に向は蒸着させるためには、収納容器9を冷却ロール4
の直下に配設する必要があるからである。蒸着材8が5
1801等の無機物あるいはT1等の高融点金属の場合
は、蒸着材8が溶融しない状態で、すなわち昇華させて
蒸着を行う。In the case of molten metal such as aluminum, the surface of the liquid is horizontal, so the vapor that evaporates from there is efficiently transferred to the substrate 1.
In order to perform vapor deposition, the storage container 9 is placed on a cooling roll 4.
This is because it needs to be placed directly under the . Vapor deposition material 8 is 5
In the case of an inorganic material such as 1801 or a high melting point metal such as T1, the vapor deposition is performed in a state where the vapor deposition material 8 is not melted, that is, by sublimation.
ところが従来は、このような昇華性物質を蒸着材8とし
て使用する場合も、溶融金属の場合と同じように、収納
容器9を冷却ロール4の直下に配設していた。Conventionally, however, when such a sublimable substance is used as the vapor deposition material 8, the storage container 9 is disposed directly below the cooling roll 4, as in the case of molten metal.
#記第2図図示の従来の装置による蒸着運転では、1コ
イル毎に真空引き、加熱、走行、蒸着。In the vapor deposition operation using the conventional apparatus shown in FIG. 2, each coil is vacuumed, heated, run, and vapor deposited.
大気開放を繰り返すバッチ運転であるため、蒸着時間が
1時間程度と短かった。したがって蒸着作業は非能率的
であるが、蒸着材8は大気開放時に補給すればよく、蒸
着運転中は供給せずに済んでいた。Since it was a batch operation in which exposure to the atmosphere was repeated, the deposition time was short, about 1 hour. Therefore, the vapor deposition operation is inefficient, but the vapor deposition material 8 can be replenished when the atmosphere is opened to the atmosphere, and there is no need to supply it during the vapor deposition operation.
ところで本発明の発明者らは、さきに連続真空蒸着装置
を発明し、特願昭63−99038号として特許出願し
た。これは基板の接着、切断手段を付帯し基板をシール
装置へ搬入するアンコイラと。By the way, the inventors of the present invention previously invented a continuous vacuum evaporation apparatus and filed a patent application for the same in Japanese Patent Application No. 1983-99038. This is an uncoiler that has a means for bonding and cutting the substrate and transports the substrate to the sealing device.
基板の接着、切断手段を付帯し基板をシール装置から搬
出するコイラと、3本1組のシールロールによって仕切
られる複数の圧力室よりなり、各圧力室内には基板をシ
ールロールに巻付けるデフレクタロールを有するシール
装置と、上方に位置する冷却ロールとの間にチャンネル
およびエツジマスクを有し、一端に外部蒸着金属供給装
置からの蒸着金属投入口を有する長尺状蒸着材収納容器
を内装する蒸着室とを具備してなることを特徴とする連
続真空蒸着装置である。これによれば、長時間連続運転
が可能であり、これに対応して蒸着材8を収納容器9内
に連続供給する必要が生じている。ところが従来の装置
構成では、蒸着材8の収納容器9が冷却ロール4の直下
にあるために1次の2点の理由により蒸着材8の連続供
給が困難である。It consists of a coiler equipped with a means for adhering and cutting the substrate and transporting the substrate from the sealing device, and a plurality of pressure chambers partitioned by a set of three sealing rolls, each pressure chamber having a deflector roll for wrapping the substrate around the sealing roll. a vapor deposition chamber having a channel and an edge mask between a sealing device having a sealing device having a cooling roll located above and an elongated vapor deposition material storage container having a vapor deposition metal input port from an external vapor deposition metal supply device at one end; 1. A continuous vacuum evaporation apparatus characterized by comprising: According to this, continuous operation for a long time is possible, and correspondingly, it is necessary to continuously supply the vapor deposition material 8 into the storage container 9. However, in the conventional apparatus configuration, since the storage container 9 for the vapor deposition material 8 is located directly below the cooling roll 4, continuous supply of the vapor deposition material 8 is difficult for the following two reasons.
(1)蒸着材8を収納容器9の上方から連続供給すると
、蒸発面が低温の蒸着材8で覆われるため。(1) If the vapor deposition material 8 is continuously supplied from above the storage container 9, the evaporation surface is covered with the low temperature vapor deposition material 8.
蒸着膜形成速度が遅くなる。また、温度が不安定になり
、蒸着膜形成速度が一定しない。The deposition film formation rate becomes slow. Furthermore, the temperature becomes unstable and the rate of deposition film formation is not constant.
(2)蒸着材8の供給装置が、蒸着材8からの蒸発蒸気
にさらされてしまい、供給装置に蒸着材が凝固して作動
不良になる。(2) The supply device for the vapor deposition material 8 is exposed to the evaporated vapor from the vapor deposition material 8, and the vapor deposition material solidifies in the supply device, resulting in malfunction.
本発明は、前記従来の課題を解決するために。 The present invention aims to solve the above-mentioned conventional problems.
真空の蒸着室内で冷却ロールの側面に巻き掛けられた可
撓性の基板に昇華性の蒸着材を蒸着するものにおいて、
上記冷却ロールの側方に配置されて上記蒸着材を収納す
る網状の容器と、同容器に上方から上記蒸着材を供給す
る手段と、同容器の近傍に設けられた加熱手段とを備え
たことを特徴とする真空蒸着装置を提案するものである
。In a method that evaporates a sublimable evaporation material onto a flexible substrate wrapped around the side of a cooling roll in a vacuum evaporation chamber,
A net-shaped container disposed on the side of the cooling roll to house the vapor deposition material, a means for supplying the vapor deposition material from above to the container, and a heating means provided near the container. This paper proposes a vacuum evaporation apparatus featuring the following features.
蒸着材は収納容器の上方から供給され、その蒸着材から
蒸発した蒸気は収納容器のメツシュを通って、側方の冷
却ロール側へ飛んでゆき、基板上に蒸着される。The evaporation material is supplied from above the storage container, and the vapor evaporated from the evaporation material passes through the mesh of the storage container, flies to the side of the cooling roll, and is deposited on the substrate.
第1図は本発明の一実施例を示す縦断側面図である。こ
の図において、可撓性の基板1は、大気中から真空シー
ル室13を仔て蒸着室2内に進入し。FIG. 1 is a longitudinal sectional side view showing one embodiment of the present invention. In this figure, a flexible substrate 1 enters a deposition chamber 2 from the atmosphere through a vacuum seal chamber 13.
蒸着室2内をデフレクタロール3を介して走行し。It travels inside the deposition chamber 2 via a deflector roll 3.
冷却ロール4上に巻掛けられて、蒸着時の加熱による温
度上昇を減するように冷却されながら、蒸着装置7によ
り蒸着される。真空シール室13および蒸着室2は排気
ポンプユニスト11により真空排気されている。The film is wrapped around a cooling roll 4 and is vapor-deposited by a vapor-deposition device 7 while being cooled to reduce a temperature rise due to heating during vapor-deposition. The vacuum seal chamber 13 and the deposition chamber 2 are evacuated by an exhaust pump unit 11.
蒸着装置7は、冷却ロール4の側方に配設されて昇華性
の蒸着材8を収納する1個あるいは複数個の網状収納容
器9と、同容器9の加熱装置1oと。The vapor deposition device 7 includes one or more net-like storage containers 9 disposed on the side of the cooling roll 4 and containing a sublimable vapor deposition material 8, and a heating device 1o for the containers 9.
蒸着材8の供給装置12とから構成され、蒸着材8を走
行基板1に向は蒸発(昇華)させる。収納容器9内の蒸
着材8は蒸着運転中に蒸発して消耗するので、はレット
状の蒸着材8を供給装置12から収納容器9の上方から
連続的に供給する。収納容器9のメツシュは蒸着材8の
イレットよりも小さく、蒸着材8は昇華性物質であるた
め蒸着運転中も固体形状を保つので、蒸着材8が収納容
器9がらこぼれることなく、運転できる。It is composed of a supply device 12 for vapor deposition material 8, and evaporates (sublimates) the vapor deposition material 8 onto the running substrate 1. Since the vapor deposition material 8 in the storage container 9 evaporates and is consumed during the vapor deposition operation, the vapor deposition material 8 in the form of a pellet is continuously supplied from above the storage container 9 from the supply device 12 . The mesh of the storage container 9 is smaller than the islet of the vapor deposition material 8, and since the vapor deposition material 8 is a sublimable substance, it maintains a solid shape during the vapor deposition operation, so that the vapor deposition material 8 can be operated without spilling out of the storage container 9.
ここで、真空中での蒸発は平均的には蒸発面から垂直に
蒸気がとび出すので、第1図に示した構成ではメツシュ
状収納容器9の側面から垂直横向きに蒸着材8の蒸気が
とびだし、該収納容器9の側方に配設された冷却ロール
4に巻掛けられてぃる基板10表面に蒸着する。Here, in the case of evaporation in a vacuum, on average the vapor shoots out vertically from the evaporation surface, so in the configuration shown in FIG. , and is deposited on the surface of the substrate 10 which is wrapped around a cooling roll 4 disposed on the side of the storage container 9.
本発明によれば、蒸着材供給手段かられずかずつ供給さ
れる低温のベレット状の蒸着材は、網状の収納容器の側
面全体から蒸発(昇華)していく。According to the present invention, the low-temperature, pellet-shaped vapor deposition material that is supplied little by little from the vapor deposition material supply means evaporates (sublimates) from the entire side surface of the net-shaped storage container.
したがって、供給される低温のはレントが高温の蒸着材
からの蒸発に大きな影響を与えることなく。Therefore, the low-temperature rent is supplied without significantly affecting the evaporation from the high-temperature deposition material.
蒸着運転を継続できる。Deposition operation can be continued.
また、蒸着材供給装置は蒸着材から冷却ロールに向って
蒸発する蒸気にさらされることがないので、長時間安定
した作動を続けることができる。Further, since the deposition material supply device is not exposed to steam evaporating from the deposition material toward the cooling roll, stable operation can be continued for a long period of time.
第1図は本発明の一実施例を示す縦断側面図。
第2図は従来の真空蒸着装置の一例を示す縦断側面図で
ある。
1・・・(走行)基板 2・・・蒸着室3・・・
デフレフクロール 4・・・冷却ロール5・・・巻取
りリール 6・・・繰出しリール7・・・蒸着装
置 8・・・蒸着材9・・・収納容器
10・・・加熱装置11・・・排気ポンプユニッ
13・・・真空シール室FIG. 1 is a longitudinal sectional side view showing one embodiment of the present invention. FIG. 2 is a longitudinal side view showing an example of a conventional vacuum evaporation apparatus. 1... (traveling) substrate 2... Vapor deposition chamber 3...
Deflation crawl 4... Cooling roll 5... Take-up reel 6... Feeding reel 7... Vapor deposition device 8... Vapor deposition material 9... Storage container
10... Heating device 11... Exhaust pump unit 13... Vacuum seal chamber
Claims (1)
撓性の基板に昇華性の蒸着材を蒸着する真空蒸着装置に
おいて、上記冷却ロールの側方に配置されて上記蒸着材
を収納する網状の容器と、同容器に上方から上記蒸着材
を供給する手段と、同容器の近傍に設けられた加熱手段
とを備えたことを特徴とする真空蒸着装置。In a vacuum evaporation apparatus that evaporates a sublimable evaporation material onto a flexible substrate wrapped around the side surface of a cooling roll in a vacuum evaporation chamber, a net-like structure is disposed on the side of the cooling roll and stores the evaporation material. 1. A vacuum evaporation apparatus comprising: a container; a means for supplying the vapor deposition material to the container from above; and a heating means provided near the container.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27094288A JPH02118072A (en) | 1988-10-28 | 1988-10-28 | Vacuum deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27094288A JPH02118072A (en) | 1988-10-28 | 1988-10-28 | Vacuum deposition device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02118072A true JPH02118072A (en) | 1990-05-02 |
Family
ID=17493155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27094288A Pending JPH02118072A (en) | 1988-10-28 | 1988-10-28 | Vacuum deposition device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02118072A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0593263A (en) * | 1991-09-30 | 1993-04-16 | Shinkuron:Kk | Hearth liner and deposition method |
EP0652302A1 (en) * | 1993-11-09 | 1995-05-10 | General Vacuum Equipment Limited | Vacuum web coating |
JP2017186603A (en) * | 2016-04-05 | 2017-10-12 | 株式会社アルバック | Evaporation source, vacuum evaporation system and vacuum evaporation method |
-
1988
- 1988-10-28 JP JP27094288A patent/JPH02118072A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0593263A (en) * | 1991-09-30 | 1993-04-16 | Shinkuron:Kk | Hearth liner and deposition method |
EP0652302A1 (en) * | 1993-11-09 | 1995-05-10 | General Vacuum Equipment Limited | Vacuum web coating |
JP2017186603A (en) * | 2016-04-05 | 2017-10-12 | 株式会社アルバック | Evaporation source, vacuum evaporation system and vacuum evaporation method |
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