JPS57167137A - Formation for thin film - Google Patents

Formation for thin film

Info

Publication number
JPS57167137A
JPS57167137A JP56051548A JP5154881A JPS57167137A JP S57167137 A JPS57167137 A JP S57167137A JP 56051548 A JP56051548 A JP 56051548A JP 5154881 A JP5154881 A JP 5154881A JP S57167137 A JPS57167137 A JP S57167137A
Authority
JP
Japan
Prior art keywords
base film
thin film
constant tension
heat treatment
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56051548A
Other languages
Japanese (ja)
Inventor
Seizo Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp, Olympus Optical Co Ltd filed Critical Olympus Corp
Priority to JP56051548A priority Critical patent/JPS57167137A/en
Priority to US06/363,441 priority patent/US4489124A/en
Priority to DE3212908A priority patent/DE3212908C2/en
Publication of JPS57167137A publication Critical patent/JPS57167137A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/584—Non-reactive treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/22—Heat treatment; Thermal decomposition; Chemical vapour deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent the occurrence of the thermal distortion such as creases and curls without degrading the mechanical characteristic of a base film, by applying a constant tension to the base film to form a thin film and applying a constant tension to the base film to subject it to heat treatment. CONSTITUTION:After a constant tension is applied to a base film 10 to form a thin film on the surface, a constant tension is applied to the base film 10 to subject it to the heat treatment. For example, the base film 10 wound around a supply reel 18 is wound up around a reel 20 through a tension controller 22, a cooling can 26, etc. in a housing 16 of a take-up type vacuum vapor-depositing device. Vapor-deposition source materials 42 such as Co are vaporized by heating to be vapor-deposited, and the base film 10 where a thin film is formed is heated by heaters 36 and 38 to be subjected to the heat treatment.
JP56051548A 1981-04-06 1981-04-06 Formation for thin film Pending JPS57167137A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56051548A JPS57167137A (en) 1981-04-06 1981-04-06 Formation for thin film
US06/363,441 US4489124A (en) 1981-04-06 1982-03-30 Process for forming thin film, heat treatment process of thin film sheet, and heat treatment apparatus therefor
DE3212908A DE3212908C2 (en) 1981-04-06 1982-04-06 Method for producing a planar thin-film film and device for carrying out the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56051548A JPS57167137A (en) 1981-04-06 1981-04-06 Formation for thin film

Publications (1)

Publication Number Publication Date
JPS57167137A true JPS57167137A (en) 1982-10-14

Family

ID=12890065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56051548A Pending JPS57167137A (en) 1981-04-06 1981-04-06 Formation for thin film

Country Status (1)

Country Link
JP (1) JPS57167137A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5880135A (en) * 1981-11-06 1983-05-14 Matsushita Electric Ind Co Ltd Method and device for production of magnetic recording medium
JPS59165410A (en) * 1983-03-10 1984-09-18 Fuji Photo Film Co Ltd Ferromagnetic thin film forming apparatus
JPS6111933A (en) * 1984-06-28 1986-01-20 Konishiroku Photo Ind Co Ltd Manufacture of magnetic recording medium
JPS63149133A (en) * 1986-12-12 1988-06-21 Kanegafuchi Chem Ind Co Ltd Prevention of wrinkles due to expansion of plastic film and the like
JP2012237057A (en) * 2011-04-28 2012-12-06 Nitto Denko Corp Vacuum film deposition method and laminated body obtained by the method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5880135A (en) * 1981-11-06 1983-05-14 Matsushita Electric Ind Co Ltd Method and device for production of magnetic recording medium
JPH0319620B2 (en) * 1981-11-06 1991-03-15 Matsushita Electric Ind Co Ltd
JPS59165410A (en) * 1983-03-10 1984-09-18 Fuji Photo Film Co Ltd Ferromagnetic thin film forming apparatus
JPS6111933A (en) * 1984-06-28 1986-01-20 Konishiroku Photo Ind Co Ltd Manufacture of magnetic recording medium
JPS63149133A (en) * 1986-12-12 1988-06-21 Kanegafuchi Chem Ind Co Ltd Prevention of wrinkles due to expansion of plastic film and the like
JP2012237057A (en) * 2011-04-28 2012-12-06 Nitto Denko Corp Vacuum film deposition method and laminated body obtained by the method
US9523147B2 (en) 2011-04-28 2016-12-20 Nitto Denko Corporation Vacuum film formation method and laminate obtained by the method

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