JPS57101663A - Apparatus for forming thin film - Google Patents

Apparatus for forming thin film

Info

Publication number
JPS57101663A
JPS57101663A JP17657880A JP17657880A JPS57101663A JP S57101663 A JPS57101663 A JP S57101663A JP 17657880 A JP17657880 A JP 17657880A JP 17657880 A JP17657880 A JP 17657880A JP S57101663 A JPS57101663 A JP S57101663A
Authority
JP
Japan
Prior art keywords
film
rotor
cooling
concaved
contacted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17657880A
Other languages
Japanese (ja)
Inventor
Hisahiro Hanaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp, Olympus Optical Co Ltd filed Critical Olympus Corp
Priority to JP17657880A priority Critical patent/JPS57101663A/en
Publication of JPS57101663A publication Critical patent/JPS57101663A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To provide a thin film forming apparatus capable of preventing heat damage and wrinkle generation by closely contacting a film constituted in such a manner that a base film is contacted with a cooling can formed into a convexed rotor with a curved surface of the cooling can at all times. CONSTITUTION:A base film 18 is curved into a concaved shape along a rotary surface of a guide roll 20, having a concaved rotor form and thereafter, moved on a cooling can 22 of a convexed rotor almost over a half periphery thereof to be sent to a side of a guide roller 202 of a concaved rotor. During this time, an vapor deposition source material 26 such as Co, Fe or the like set in an evaporation source 24 arranged directly beneath the can 22 is heated by a resistance heating method or the like to be evaporated. Then, the evaporated vapor deposition atom or molecule 261 is adhered onto the film 18 on a part of the can not masked by a screen to form a thin film. In this case, if appropriate tension force is added to the film 18 contacted with the can 22, internal stress is generated from a central part of the film to a direction of both side ends thereof. Thereby, the film 18 can be closely contacted with a curved surface of the can 22 at all times.
JP17657880A 1980-12-16 1980-12-16 Apparatus for forming thin film Pending JPS57101663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17657880A JPS57101663A (en) 1980-12-16 1980-12-16 Apparatus for forming thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17657880A JPS57101663A (en) 1980-12-16 1980-12-16 Apparatus for forming thin film

Publications (1)

Publication Number Publication Date
JPS57101663A true JPS57101663A (en) 1982-06-24

Family

ID=16016006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17657880A Pending JPS57101663A (en) 1980-12-16 1980-12-16 Apparatus for forming thin film

Country Status (1)

Country Link
JP (1) JPS57101663A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5880134A (en) * 1981-11-06 1983-05-14 Matsushita Electric Ind Co Ltd Manufacture of magnetic recording medium
JPS5950176A (en) * 1982-09-17 1984-03-23 Matsushita Electric Ind Co Ltd Sputtering device
JPS59107429A (en) * 1982-12-09 1984-06-21 Sony Corp Producing device of magnetic recording medium
WO2013120809A1 (en) * 2012-02-13 2013-08-22 Fhr Anlagenbau Gmbh Process roller for receiving and guiding substrates in strip form in vacuum coating installations

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5880134A (en) * 1981-11-06 1983-05-14 Matsushita Electric Ind Co Ltd Manufacture of magnetic recording medium
JPH0319619B2 (en) * 1981-11-06 1991-03-15 Matsushita Electric Ind Co Ltd
JPS5950176A (en) * 1982-09-17 1984-03-23 Matsushita Electric Ind Co Ltd Sputtering device
JPH0258351B2 (en) * 1982-09-17 1990-12-07 Matsushita Electric Ind Co Ltd
JPS59107429A (en) * 1982-12-09 1984-06-21 Sony Corp Producing device of magnetic recording medium
JPH0416854B2 (en) * 1982-12-09 1992-03-25 Sony Corp
WO2013120809A1 (en) * 2012-02-13 2013-08-22 Fhr Anlagenbau Gmbh Process roller for receiving and guiding substrates in strip form in vacuum coating installations
TWI500798B (en) * 2012-02-13 2015-09-21 Fhr Anlagenbau Gmbh Process roller for receiving and guiding substrates in strip form in vacuum coating installations
US9637817B2 (en) 2012-02-13 2017-05-02 Fhr Anlagenbau Gmbh Process roller for receiving and guiding substrates in strip form in vacuum coating installations

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