JPS5822378A - 自動蒸着制御方法 - Google Patents

自動蒸着制御方法

Info

Publication number
JPS5822378A
JPS5822378A JP12076181A JP12076181A JPS5822378A JP S5822378 A JPS5822378 A JP S5822378A JP 12076181 A JP12076181 A JP 12076181A JP 12076181 A JP12076181 A JP 12076181A JP S5822378 A JPS5822378 A JP S5822378A
Authority
JP
Japan
Prior art keywords
vapor deposition
rate
monitor
shutter
stabilized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12076181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH021910B2 (enrdf_load_stackoverflow
Inventor
Masashi Sato
政志 佐藤
Akira Fujita
藤田　昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12076181A priority Critical patent/JPS5822378A/ja
Publication of JPS5822378A publication Critical patent/JPS5822378A/ja
Publication of JPH021910B2 publication Critical patent/JPH021910B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
JP12076181A 1981-08-03 1981-08-03 自動蒸着制御方法 Granted JPS5822378A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12076181A JPS5822378A (ja) 1981-08-03 1981-08-03 自動蒸着制御方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12076181A JPS5822378A (ja) 1981-08-03 1981-08-03 自動蒸着制御方法

Publications (2)

Publication Number Publication Date
JPS5822378A true JPS5822378A (ja) 1983-02-09
JPH021910B2 JPH021910B2 (enrdf_load_stackoverflow) 1990-01-16

Family

ID=14794331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12076181A Granted JPS5822378A (ja) 1981-08-03 1981-08-03 自動蒸着制御方法

Country Status (1)

Country Link
JP (1) JPS5822378A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH021910B2 (enrdf_load_stackoverflow) 1990-01-16

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