JPH021910B2 - - Google Patents
Info
- Publication number
- JPH021910B2 JPH021910B2 JP12076181A JP12076181A JPH021910B2 JP H021910 B2 JPH021910 B2 JP H021910B2 JP 12076181 A JP12076181 A JP 12076181A JP 12076181 A JP12076181 A JP 12076181A JP H021910 B2 JPH021910 B2 JP H021910B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- monitor
- rate
- control
- central monitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007740 vapor deposition Methods 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12076181A JPS5822378A (ja) | 1981-08-03 | 1981-08-03 | 自動蒸着制御方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12076181A JPS5822378A (ja) | 1981-08-03 | 1981-08-03 | 自動蒸着制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5822378A JPS5822378A (ja) | 1983-02-09 |
| JPH021910B2 true JPH021910B2 (enrdf_load_stackoverflow) | 1990-01-16 |
Family
ID=14794331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12076181A Granted JPS5822378A (ja) | 1981-08-03 | 1981-08-03 | 自動蒸着制御方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5822378A (enrdf_load_stackoverflow) |
-
1981
- 1981-08-03 JP JP12076181A patent/JPS5822378A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5822378A (ja) | 1983-02-09 |
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