JPS58223324A - 描画装置 - Google Patents

描画装置

Info

Publication number
JPS58223324A
JPS58223324A JP10551982A JP10551982A JPS58223324A JP S58223324 A JPS58223324 A JP S58223324A JP 10551982 A JP10551982 A JP 10551982A JP 10551982 A JP10551982 A JP 10551982A JP S58223324 A JPS58223324 A JP S58223324A
Authority
JP
Japan
Prior art keywords
coordinate
values
value
scaling
scaling value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10551982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544171B2 (enExample
Inventor
Hideo Nakamura
英夫 中村
Shinsuke Tamura
田村　信介
Takeshi Kono
河野　毅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10551982A priority Critical patent/JPS58223324A/ja
Publication of JPS58223324A publication Critical patent/JPS58223324A/ja
Publication of JPH0544171B2 publication Critical patent/JPH0544171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10551982A 1982-06-21 1982-06-21 描画装置 Granted JPS58223324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10551982A JPS58223324A (ja) 1982-06-21 1982-06-21 描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10551982A JPS58223324A (ja) 1982-06-21 1982-06-21 描画装置

Publications (2)

Publication Number Publication Date
JPS58223324A true JPS58223324A (ja) 1983-12-24
JPH0544171B2 JPH0544171B2 (enExample) 1993-07-05

Family

ID=14409843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10551982A Granted JPS58223324A (ja) 1982-06-21 1982-06-21 描画装置

Country Status (1)

Country Link
JP (1) JPS58223324A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282513A (ja) * 1988-09-19 1990-03-23 Jeol Ltd 荷電粒子ビーム描画方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107035A (en) * 1980-12-25 1982-07-03 Toshiba Mach Co Ltd Drawing system by electron ray

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107035A (en) * 1980-12-25 1982-07-03 Toshiba Mach Co Ltd Drawing system by electron ray

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282513A (ja) * 1988-09-19 1990-03-23 Jeol Ltd 荷電粒子ビーム描画方法

Also Published As

Publication number Publication date
JPH0544171B2 (enExample) 1993-07-05

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