JPS58196008A - コンデンサ構造体の製造方法 - Google Patents
コンデンサ構造体の製造方法Info
- Publication number
- JPS58196008A JPS58196008A JP58016329A JP1632983A JPS58196008A JP S58196008 A JPS58196008 A JP S58196008A JP 58016329 A JP58016329 A JP 58016329A JP 1632983 A JP1632983 A JP 1632983A JP S58196008 A JPS58196008 A JP S58196008A
- Authority
- JP
- Japan
- Prior art keywords
- tabs
- plate
- capacitor
- layer
- buses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003990 capacitor Substances 0.000 claims description 82
- 239000000919 ceramic Substances 0.000 claims description 10
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 103
- 229910000679 solder Inorganic materials 0.000 description 75
- 238000000034 method Methods 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 22
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 238000001465 metallisation Methods 0.000 description 12
- 238000007796 conventional method Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 239000004642 Polyimide Substances 0.000 description 9
- 229920001721 polyimide Polymers 0.000 description 9
- 239000011810 insulating material Substances 0.000 description 8
- 239000003985 ceramic capacitor Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 241000190020 Zelkova serrata Species 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/38—Multiple capacitors, i.e. structural combinations of fixed capacitors
- H01G4/385—Single unit multiple capacitors, e.g. dual capacitor in one coil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/364,819 US4419714A (en) | 1982-04-02 | 1982-04-02 | Low inductance ceramic capacitor and method for its making |
| US364819 | 1982-04-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58196008A true JPS58196008A (ja) | 1983-11-15 |
| JPH0322684B2 JPH0322684B2 (cg-RX-API-DMAC7.html) | 1991-03-27 |
Family
ID=23436230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58016329A Granted JPS58196008A (ja) | 1982-04-02 | 1983-02-04 | コンデンサ構造体の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4419714A (cg-RX-API-DMAC7.html) |
| EP (1) | EP0090964B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JPS58196008A (cg-RX-API-DMAC7.html) |
| DE (1) | DE3377096D1 (cg-RX-API-DMAC7.html) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4831494A (en) * | 1988-06-27 | 1989-05-16 | International Business Machines Corporation | Multilayer capacitor |
| US4852227A (en) * | 1988-11-25 | 1989-08-01 | Sprague Electric Company | Method for making a multilayer ceramic capacitor with buried electrodes and terminations at a castellated edge |
| US4862318A (en) * | 1989-04-04 | 1989-08-29 | Avx Corporation | Method of forming thin film terminations of low inductance ceramic capacitors and resultant article |
| US4949217A (en) * | 1989-06-23 | 1990-08-14 | General Electric Company | Multilayer capacitor suitable for substrate integration and multimegahertz filtering |
| DE4135007C2 (de) * | 1990-10-25 | 1994-12-22 | Cts Corp | SMD-Bauelemente mit Maßnahmen gegen Lötbrückenbildung und Temperaturwechselbeanspruchung |
| US5367430A (en) * | 1992-10-21 | 1994-11-22 | Presidio Components, Inc. | Monolithic multiple capacitor |
| US6336262B1 (en) * | 1996-10-31 | 2002-01-08 | International Business Machines Corporation | Process of forming a capacitor with multi-level interconnection technology |
| US5880925A (en) * | 1997-06-27 | 1999-03-09 | Avx Corporation | Surface mount multilayer capacitor |
| JP2991175B2 (ja) | 1997-11-10 | 1999-12-20 | 株式会社村田製作所 | 積層コンデンサ |
| US6266229B1 (en) | 1997-11-10 | 2001-07-24 | Murata Manufacturing Co., Ltd | Multilayer capacitor |
| US6292350B1 (en) | 1997-11-10 | 2001-09-18 | Murata Manufacturing, Co., Ltd | Multilayer capacitor |
| US6266228B1 (en) | 1997-11-10 | 2001-07-24 | Murata Manufacturing Co., Ltd | Multilayer capacitor |
| US6549395B1 (en) | 1997-11-14 | 2003-04-15 | Murata Manufacturing Co., Ltd | Multilayer capacitor |
| DE19758345A1 (de) * | 1997-12-22 | 1999-06-24 | Inst Halbleiterphysik Gmbh | Digital abstimmbare, elektronische Kapazität |
| JP3476127B2 (ja) | 1999-05-10 | 2003-12-10 | 株式会社村田製作所 | 積層コンデンサ |
| JP3548821B2 (ja) | 1999-05-10 | 2004-07-28 | 株式会社村田製作所 | 積層コンデンサ、ならびにこれを用いた電子装置および高周波回路 |
| US6327134B1 (en) | 1999-10-18 | 2001-12-04 | Murata Manufacturing Co., Ltd. | Multi-layer capacitor, wiring board, and high-frequency circuit |
| JP3489729B2 (ja) | 1999-11-19 | 2004-01-26 | 株式会社村田製作所 | 積層コンデンサ、配線基板、デカップリング回路および高周波回路 |
| US6574077B1 (en) | 1999-12-02 | 2003-06-03 | Seagate Technology Llc | Microactuator assembly having improved standoff configuration |
| US6477032B2 (en) * | 2001-01-31 | 2002-11-05 | Avx Corporation | Low inductance chip with center via contact |
| US7248458B2 (en) * | 2003-09-15 | 2007-07-24 | American Technical Ceramics Corporation | Orientation-insensitive ultra-wideband coupling capacitor and method of making |
| US7408763B2 (en) * | 2005-07-19 | 2008-08-05 | Apurba Roy | Low inductance multilayer capacitor |
| US8169014B2 (en) * | 2006-01-09 | 2012-05-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Interdigitated capacitive structure for an integrated circuit |
| US20100188799A1 (en) * | 2009-01-28 | 2010-07-29 | Avx Corporation | Controlled esr low inductance capacitor |
| JP2011228644A (ja) * | 2010-03-29 | 2011-11-10 | Murata Mfg Co Ltd | 電子部品及びその製造方法 |
| USD689053S1 (en) * | 2011-11-15 | 2013-09-03 | Connectblue Ab | Module |
| USD680119S1 (en) * | 2011-11-15 | 2013-04-16 | Connectblue Ab | Module |
| USD668658S1 (en) * | 2011-11-15 | 2012-10-09 | Connectblue Ab | Module |
| USD692896S1 (en) * | 2011-11-15 | 2013-11-05 | Connectblue Ab | Module |
| USD680545S1 (en) * | 2011-11-15 | 2013-04-23 | Connectblue Ab | Module |
| USD668659S1 (en) * | 2011-11-15 | 2012-10-09 | Connectblue Ab | Module |
| US20150021082A1 (en) | 2013-07-17 | 2015-01-22 | Samsung Electro-Mechanics Co., Ltd. | Multilayer ceramic capacitor and board having the same |
| US9627142B2 (en) * | 2013-09-24 | 2017-04-18 | Samsung Electro-Mechanics Co., Ltd. | Multilayer ceramic capacitor and board for mounting of the same |
| US9460855B2 (en) | 2013-10-01 | 2016-10-04 | Samsung Electro-Mechanics Co., Ltd. | Multilayer ceramic capacitor and board having the same |
| US9949378B2 (en) | 2014-04-14 | 2018-04-17 | Presidio Components, Inc. | Electrical devices with solder dam |
| KR101630034B1 (ko) * | 2014-04-21 | 2016-06-13 | 삼성전기주식회사 | 내장형 적층 세라믹 커패시터 및 내장형 적층 세라믹 커패시터가 실장된 회로 기판 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542142U (cg-RX-API-DMAC7.html) * | 1977-06-08 | 1979-01-09 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3388302A (en) * | 1966-12-30 | 1968-06-11 | Coors Porcelain Co | Ceramic housing for semiconductor components |
| US3448355A (en) * | 1967-03-01 | 1969-06-03 | Amp Inc | Laminated electrical capacitor and methods for making |
| US3538571A (en) * | 1969-04-04 | 1970-11-10 | Mallory & Co Inc P R | Apparatus for producing ceramic chip electrical components |
| US4030004A (en) * | 1971-04-16 | 1977-06-14 | Nl Industries, Inc. | Dielectric ceramic matrices with end barriers |
| US3962713A (en) * | 1972-06-02 | 1976-06-08 | Texas Instruments Incorporated | Large value capacitor |
| NL7310279A (cg-RX-API-DMAC7.html) * | 1972-07-31 | 1974-02-04 | ||
| US4017885A (en) * | 1973-10-25 | 1977-04-12 | Texas Instruments Incorporated | Large value capacitor |
| US3898541A (en) * | 1973-12-17 | 1975-08-05 | Vitramon Inc | Capacitors and method of adjustment |
| DE2545596C3 (de) * | 1975-10-11 | 1983-11-10 | Draloric Electronic GmbH, 8672 Selb | Kapazitives Netzwerk und dessen Verwendung |
| US4029531A (en) * | 1976-03-29 | 1977-06-14 | Rca Corporation | Method of forming grooves in the [011] crystalline direction |
| US4074340A (en) * | 1976-10-18 | 1978-02-14 | Vitramon, Incorporated | Trimmable monolithic capacitors |
| FR2475792A1 (fr) * | 1980-02-12 | 1981-08-14 | Thomson Csf | Multiplicateur de tension integre |
| US4328530A (en) * | 1980-06-30 | 1982-05-04 | International Business Machines Corporation | Multiple layer, ceramic carrier for high switching speed VLSI chips |
-
1982
- 1982-04-02 US US06/364,819 patent/US4419714A/en not_active Expired - Lifetime
-
1983
- 1983-02-04 JP JP58016329A patent/JPS58196008A/ja active Granted
- 1983-03-15 EP EP83102547A patent/EP0090964B1/en not_active Expired
- 1983-03-15 DE DE8383102547T patent/DE3377096D1/de not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542142U (cg-RX-API-DMAC7.html) * | 1977-06-08 | 1979-01-09 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0090964B1 (en) | 1988-06-15 |
| JPH0322684B2 (cg-RX-API-DMAC7.html) | 1991-03-27 |
| US4419714A (en) | 1983-12-06 |
| EP0090964A2 (en) | 1983-10-12 |
| EP0090964A3 (en) | 1984-09-05 |
| DE3377096D1 (en) | 1988-07-21 |
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