JPS58186950A - 薄膜半導体装置の製造方法 - Google Patents
薄膜半導体装置の製造方法Info
- Publication number
- JPS58186950A JPS58186950A JP57068845A JP6884582A JPS58186950A JP S58186950 A JPS58186950 A JP S58186950A JP 57068845 A JP57068845 A JP 57068845A JP 6884582 A JP6884582 A JP 6884582A JP S58186950 A JPS58186950 A JP S58186950A
- Authority
- JP
- Japan
- Prior art keywords
- film
- glass substrate
- silicon film
- thin film
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57068845A JPS58186950A (ja) | 1982-04-26 | 1982-04-26 | 薄膜半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57068845A JPS58186950A (ja) | 1982-04-26 | 1982-04-26 | 薄膜半導体装置の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30328995A Division JPH08213324A (ja) | 1995-10-30 | 1995-10-30 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58186950A true JPS58186950A (ja) | 1983-11-01 |
| JPH0373149B2 JPH0373149B2 (enrdf_load_stackoverflow) | 1991-11-20 |
Family
ID=13385425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57068845A Granted JPS58186950A (ja) | 1982-04-26 | 1982-04-26 | 薄膜半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58186950A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01196837A (ja) * | 1988-02-02 | 1989-08-08 | Fujitsu Ltd | 半導体製造装置 |
| JP2006245567A (ja) * | 2005-03-03 | 2006-09-14 | Sharp Corp | 半導体装置の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56135968A (en) * | 1980-03-27 | 1981-10-23 | Canon Inc | Amorphous silicon thin film transistor and manufacture thereof |
-
1982
- 1982-04-26 JP JP57068845A patent/JPS58186950A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56135968A (en) * | 1980-03-27 | 1981-10-23 | Canon Inc | Amorphous silicon thin film transistor and manufacture thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01196837A (ja) * | 1988-02-02 | 1989-08-08 | Fujitsu Ltd | 半導体製造装置 |
| JP2006245567A (ja) * | 2005-03-03 | 2006-09-14 | Sharp Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0373149B2 (enrdf_load_stackoverflow) | 1991-11-20 |
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