JPS58162953A - 現像処理の制御装置 - Google Patents

現像処理の制御装置

Info

Publication number
JPS58162953A
JPS58162953A JP4459682A JP4459682A JPS58162953A JP S58162953 A JPS58162953 A JP S58162953A JP 4459682 A JP4459682 A JP 4459682A JP 4459682 A JP4459682 A JP 4459682A JP S58162953 A JPS58162953 A JP S58162953A
Authority
JP
Japan
Prior art keywords
development
recording medium
groove
grooves
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4459682A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0551898B2 (enrdf_load_stackoverflow
Inventor
Keizo Kato
恵三 加藤
Sho Ito
捷 伊藤
Masahiro Oshima
尾島　正啓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4459682A priority Critical patent/JPS58162953A/ja
Publication of JPS58162953A publication Critical patent/JPS58162953A/ja
Publication of JPH0551898B2 publication Critical patent/JPH0551898B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP4459682A 1982-03-23 1982-03-23 現像処理の制御装置 Granted JPS58162953A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4459682A JPS58162953A (ja) 1982-03-23 1982-03-23 現像処理の制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4459682A JPS58162953A (ja) 1982-03-23 1982-03-23 現像処理の制御装置

Publications (2)

Publication Number Publication Date
JPS58162953A true JPS58162953A (ja) 1983-09-27
JPH0551898B2 JPH0551898B2 (enrdf_load_stackoverflow) 1993-08-03

Family

ID=12695835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4459682A Granted JPS58162953A (ja) 1982-03-23 1982-03-23 現像処理の制御装置

Country Status (1)

Country Link
JP (1) JPS58162953A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231927A (ja) * 1984-05-01 1985-11-18 Matsushita Electric Ind Co Ltd 記録原盤の製造方法
JPS60231926A (ja) * 1984-05-01 1985-11-18 Matsushita Electric Ind Co Ltd 記録原盤の製造方法
US20100136468A1 (en) * 2007-03-02 2010-06-03 Josephus Marinus Wijn Diffraction order measurement

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5230429A (en) * 1975-09-03 1977-03-08 Canon Inc Photographic image recording and processing system
JPS56144332A (en) * 1980-07-30 1981-11-10 Yamatake Honeywell Co Ltd Combustion control device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5230429A (en) * 1975-09-03 1977-03-08 Canon Inc Photographic image recording and processing system
JPS56144332A (en) * 1980-07-30 1981-11-10 Yamatake Honeywell Co Ltd Combustion control device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231927A (ja) * 1984-05-01 1985-11-18 Matsushita Electric Ind Co Ltd 記録原盤の製造方法
JPS60231926A (ja) * 1984-05-01 1985-11-18 Matsushita Electric Ind Co Ltd 記録原盤の製造方法
US20100136468A1 (en) * 2007-03-02 2010-06-03 Josephus Marinus Wijn Diffraction order measurement

Also Published As

Publication number Publication date
JPH0551898B2 (enrdf_load_stackoverflow) 1993-08-03

Similar Documents

Publication Publication Date Title
JP3843308B2 (ja) マスクパターン画像形成装置
JP4327266B2 (ja) パターン寸法評価方法及びパターン形成方法
JPS58162953A (ja) 現像処理の制御装置
US7171034B2 (en) Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography
EP0134453B1 (en) Method for exposure dose calculation of photolithography projection printers
JPH0722109B2 (ja) 感光性ラツカ−層の露光量決定方法
EP0502533A1 (en) Apparatus for developing photoresist
JPH06167308A (ja) 重ね合わせ精度の測定方法
JP2822554B2 (ja) 検出装置
JPH01162254A (ja) 光ディスク原盤の製造方法
JPH0273357A (ja) 光ディスク用現像装置
JP2511736Y2 (ja) 光ディスク原盤の現像装置
JPH0474326A (ja) 光ディスク原盤とその現像装置および方法
JP2001208517A (ja) 光ディスク検査装置
JPH08329534A (ja) 光ディスク用原盤の製造方法
JPH0628719A (ja) 現像処理装置
JP2524326B2 (ja) 光ディスク原盤の製造方法
JPS58169356A (ja) 現像処理の制御装置
JP2745789B2 (ja) 光ディスク原盤現像装置および方法
JPH01220158A (ja) 光ディスク用現像装置
JPH06120115A (ja) 露光位置精度の検査方法
JPH04330652A (ja) 光ディスク原盤の露光方法
JPS59121337A (ja) レジスト現像装置
JPS58195848A (ja) 自動現像装置
JPH06180866A (ja) 光ディスク原盤の製造方法