JPS58135675A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS58135675A
JPS58135675A JP57018635A JP1863582A JPS58135675A JP S58135675 A JPS58135675 A JP S58135675A JP 57018635 A JP57018635 A JP 57018635A JP 1863582 A JP1863582 A JP 1863582A JP S58135675 A JPS58135675 A JP S58135675A
Authority
JP
Japan
Prior art keywords
thin film
region
conductivity type
film
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57018635A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0263298B2 (enExample
Inventor
Masafumi Shinpo
新保　雅文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP57018635A priority Critical patent/JPS58135675A/ja
Publication of JPS58135675A publication Critical patent/JPS58135675A/ja
Publication of JPH0263298B2 publication Critical patent/JPH0263298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Junction Field-Effect Transistors (AREA)
JP57018635A 1982-02-08 1982-02-08 半導体装置の製造方法 Granted JPS58135675A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57018635A JPS58135675A (ja) 1982-02-08 1982-02-08 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57018635A JPS58135675A (ja) 1982-02-08 1982-02-08 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58135675A true JPS58135675A (ja) 1983-08-12
JPH0263298B2 JPH0263298B2 (enExample) 1990-12-27

Family

ID=11977064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57018635A Granted JPS58135675A (ja) 1982-02-08 1982-02-08 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58135675A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02249280A (ja) * 1989-03-22 1990-10-05 Komatsu Ltd 半導体装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02249280A (ja) * 1989-03-22 1990-10-05 Komatsu Ltd 半導体装置

Also Published As

Publication number Publication date
JPH0263298B2 (enExample) 1990-12-27

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