JPS58111939A - 微細パタ−ン形成法 - Google Patents

微細パタ−ン形成法

Info

Publication number
JPS58111939A
JPS58111939A JP56209424A JP20942481A JPS58111939A JP S58111939 A JPS58111939 A JP S58111939A JP 56209424 A JP56209424 A JP 56209424A JP 20942481 A JP20942481 A JP 20942481A JP S58111939 A JPS58111939 A JP S58111939A
Authority
JP
Japan
Prior art keywords
liquid
pattern
photosensitive
aromatic
aromatic azide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56209424A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0367257B2 (enExample
Inventor
Fumio Kataoka
文雄 片岡
Fusaji Shoji
房次 庄子
Ataru Yokono
中 横野
Daisuke Makino
大輔 牧野
Shigeru Koibuchi
滋 鯉渕
Asao Isobe
磯部　麻郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP56209424A priority Critical patent/JPS58111939A/ja
Priority to US06/452,198 priority patent/US4554237A/en
Priority to EP82111931A priority patent/EP0083078B1/en
Priority to DE8282111931T priority patent/DE3277646D1/de
Priority to KR8205781A priority patent/KR890001079B1/ko
Publication of JPS58111939A publication Critical patent/JPS58111939A/ja
Publication of JPH0367257B2 publication Critical patent/JPH0367257B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56209424A 1981-12-25 1981-12-25 微細パタ−ン形成法 Granted JPS58111939A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP56209424A JPS58111939A (ja) 1981-12-25 1981-12-25 微細パタ−ン形成法
US06/452,198 US4554237A (en) 1981-12-25 1982-12-22 Photosensitive resin composition and method for forming fine patterns with said composition
EP82111931A EP0083078B1 (en) 1981-12-25 1982-12-23 Photosensitive resin composition and method for forming fine patterns with said composition
DE8282111931T DE3277646D1 (en) 1981-12-25 1982-12-23 Photosensitive resin composition and method for forming fine patterns with said composition
KR8205781A KR890001079B1 (ko) 1981-12-25 1982-12-23 감광성의 수지조성물과 이것을 사용하여 미세한 패터언을 형성하는 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56209424A JPS58111939A (ja) 1981-12-25 1981-12-25 微細パタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS58111939A true JPS58111939A (ja) 1983-07-04
JPH0367257B2 JPH0367257B2 (enExample) 1991-10-22

Family

ID=16572631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56209424A Granted JPS58111939A (ja) 1981-12-25 1981-12-25 微細パタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS58111939A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145649A (ja) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd ネガ型感放射線性樹脂組成物
JPH02291559A (ja) * 1989-05-01 1990-12-03 Toyo Gosei Kogyo Kk 遠紫外光用ホトレジスト組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01145649A (ja) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd ネガ型感放射線性樹脂組成物
JPH02291559A (ja) * 1989-05-01 1990-12-03 Toyo Gosei Kogyo Kk 遠紫外光用ホトレジスト組成物

Also Published As

Publication number Publication date
JPH0367257B2 (enExample) 1991-10-22

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