JPS58108735A - 縦型反応管用バスケツト - Google Patents

縦型反応管用バスケツト

Info

Publication number
JPS58108735A
JPS58108735A JP20715781A JP20715781A JPS58108735A JP S58108735 A JPS58108735 A JP S58108735A JP 20715781 A JP20715781 A JP 20715781A JP 20715781 A JP20715781 A JP 20715781A JP S58108735 A JPS58108735 A JP S58108735A
Authority
JP
Japan
Prior art keywords
basket
wafer
reaction tube
quartz
rings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20715781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6222526B2 (enExample
Inventor
Yasuo Uoochi
魚落　泰雄
Mamoru Maeda
守 前田
Haruo Shimoda
下田　春夫
Mikio Takagi
幹夫 高木
Takeshi Nishizawa
西沢　武志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20715781A priority Critical patent/JPS58108735A/ja
Publication of JPS58108735A publication Critical patent/JPS58108735A/ja
Publication of JPS6222526B2 publication Critical patent/JPS6222526B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP20715781A 1981-12-23 1981-12-23 縦型反応管用バスケツト Granted JPS58108735A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20715781A JPS58108735A (ja) 1981-12-23 1981-12-23 縦型反応管用バスケツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20715781A JPS58108735A (ja) 1981-12-23 1981-12-23 縦型反応管用バスケツト

Publications (2)

Publication Number Publication Date
JPS58108735A true JPS58108735A (ja) 1983-06-28
JPS6222526B2 JPS6222526B2 (enExample) 1987-05-19

Family

ID=16535164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20715781A Granted JPS58108735A (ja) 1981-12-23 1981-12-23 縦型反応管用バスケツト

Country Status (1)

Country Link
JP (1) JPS58108735A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189930A (ja) * 1984-03-12 1985-09-27 Toshiba Ceramics Co Ltd ウエハ−保持装置
JPS61183525U (enExample) * 1984-12-26 1986-11-15
JPH01239853A (ja) * 1988-03-18 1989-09-25 Tel Sagami Ltd 籠形ボート
JPH0247029U (enExample) * 1988-09-28 1990-03-30
JPH0350324U (enExample) * 1989-09-21 1991-05-16
US5310339A (en) * 1990-09-26 1994-05-10 Tokyo Electron Limited Heat treatment apparatus having a wafer boat
WO2006118215A1 (ja) * 2005-04-28 2006-11-09 Hitachi Kokusai Electric Inc. 基板処理装置および半導体デバイスの製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53157661U (enExample) * 1977-05-17 1978-12-11
JPS5588323A (en) * 1978-12-27 1980-07-04 Hitachi Ltd Manufacture of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53157661U (enExample) * 1977-05-17 1978-12-11
JPS5588323A (en) * 1978-12-27 1980-07-04 Hitachi Ltd Manufacture of semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60189930A (ja) * 1984-03-12 1985-09-27 Toshiba Ceramics Co Ltd ウエハ−保持装置
JPS61183525U (enExample) * 1984-12-26 1986-11-15
JPH01239853A (ja) * 1988-03-18 1989-09-25 Tel Sagami Ltd 籠形ボート
JPH0247029U (enExample) * 1988-09-28 1990-03-30
JPH0350324U (enExample) * 1989-09-21 1991-05-16
US5310339A (en) * 1990-09-26 1994-05-10 Tokyo Electron Limited Heat treatment apparatus having a wafer boat
WO2006118215A1 (ja) * 2005-04-28 2006-11-09 Hitachi Kokusai Electric Inc. 基板処理装置および半導体デバイスの製造方法

Also Published As

Publication number Publication date
JPS6222526B2 (enExample) 1987-05-19

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