JPS58102233A - フオトマスク - Google Patents

フオトマスク

Info

Publication number
JPS58102233A
JPS58102233A JP56201238A JP20123881A JPS58102233A JP S58102233 A JPS58102233 A JP S58102233A JP 56201238 A JP56201238 A JP 56201238A JP 20123881 A JP20123881 A JP 20123881A JP S58102233 A JPS58102233 A JP S58102233A
Authority
JP
Japan
Prior art keywords
substrate
photomask
thin film
film pattern
thermal expansion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56201238A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6336659B2 (enExample
Inventor
Akira Morishige
明 森重
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56201238A priority Critical patent/JPS58102233A/ja
Publication of JPS58102233A publication Critical patent/JPS58102233A/ja
Publication of JPS6336659B2 publication Critical patent/JPS6336659B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56201238A 1981-12-14 1981-12-14 フオトマスク Granted JPS58102233A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56201238A JPS58102233A (ja) 1981-12-14 1981-12-14 フオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56201238A JPS58102233A (ja) 1981-12-14 1981-12-14 フオトマスク

Publications (2)

Publication Number Publication Date
JPS58102233A true JPS58102233A (ja) 1983-06-17
JPS6336659B2 JPS6336659B2 (enExample) 1988-07-21

Family

ID=16437622

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56201238A Granted JPS58102233A (ja) 1981-12-14 1981-12-14 フオトマスク

Country Status (1)

Country Link
JP (1) JPS58102233A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002090982A (ja) * 2000-09-13 2002-03-27 Kimoto & Co Ltd フォトマスクの作製方法およびフォトマスク
JP2002169264A (ja) * 2000-11-30 2002-06-14 Kimoto & Co Ltd フォトマスクの作製方法およびフォトマスク

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0552253U (ja) * 1991-12-20 1993-07-13 東洋ラジエーター株式会社 内燃機関の燃料冷却器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002090982A (ja) * 2000-09-13 2002-03-27 Kimoto & Co Ltd フォトマスクの作製方法およびフォトマスク
JP2002169264A (ja) * 2000-11-30 2002-06-14 Kimoto & Co Ltd フォトマスクの作製方法およびフォトマスク

Also Published As

Publication number Publication date
JPS6336659B2 (enExample) 1988-07-21

Similar Documents

Publication Publication Date Title
JPH0690505B2 (ja) ホトマスク
JP2564337B2 (ja) マスク及びパターン転写方法並びに半導体集積回路の製造方法
JPS62189468A (ja) ホトマスク，及びそれを用いた投影露光方法、並びにホトマスクの製造方法
GB1323349A (en) Coloured transparent photo-mask and a method for producing the same
JPS58102233A (ja) フオトマスク
US3507592A (en) Method of fabricating photomasks
JPH0943830A (ja) ハーフトーン型位相シフトマスク及びハーフトーン型位相シフトマスクブランク並びにそれらの製造方法
JPS6087327A (ja) クロムマスクの製造方法
JPH0815848A (ja) フォトレチクル
JPH08106152A (ja) フォトマスク及びその作製方法
JPS59135468A (ja) 露光用マスク
JPS5670553A (en) Photomask for projection exposure
JP2712447B2 (ja) 露光用マスク
JPS5984245A (ja) フオトマスク
JPS60140347A (ja) フオトマスク
KR100548514B1 (ko) 마스크 제작 방법
JP2791757B2 (ja) 半導体マスク及びその製造方法
JPS5675650A (en) Photomask material for far ultraviolet exposure
KR100419971B1 (ko) 반도체소자 제조시의 패턴 형성을 위한 마스크 및 그 제조방법
JPH0455042U (enExample)
JPH0651493A (ja) フォトマスク
JPS5893052A (ja) ホトマスク
JPH0472714A (ja) 反射型ｘ線露光用マスク
JPH01245258A (ja) フォトマスク
JPS5929420A (ja) Ｘ線マスクの製造方法