JPS5797628A - Manufacture of mos integrated circuit - Google Patents
Manufacture of mos integrated circuitInfo
- Publication number
- JPS5797628A JPS5797628A JP17415880A JP17415880A JPS5797628A JP S5797628 A JPS5797628 A JP S5797628A JP 17415880 A JP17415880 A JP 17415880A JP 17415880 A JP17415880 A JP 17415880A JP S5797628 A JPS5797628 A JP S5797628A
- Authority
- JP
- Japan
- Prior art keywords
- type diffusion
- film
- etching
- lines
- scribe lines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 6
- 238000005530 etching Methods 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 5
- 238000001259 photo etching Methods 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17415880A JPS5797628A (en) | 1980-12-10 | 1980-12-10 | Manufacture of mos integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17415880A JPS5797628A (en) | 1980-12-10 | 1980-12-10 | Manufacture of mos integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5797628A true JPS5797628A (en) | 1982-06-17 |
Family
ID=15973699
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17415880A Pending JPS5797628A (en) | 1980-12-10 | 1980-12-10 | Manufacture of mos integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5797628A (ja) |
-
1980
- 1980-12-10 JP JP17415880A patent/JPS5797628A/ja active Pending
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