JPS5796551A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5796551A JPS5796551A JP17352380A JP17352380A JPS5796551A JP S5796551 A JPS5796551 A JP S5796551A JP 17352380 A JP17352380 A JP 17352380A JP 17352380 A JP17352380 A JP 17352380A JP S5796551 A JPS5796551 A JP S5796551A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- metal film
- lifting
- thermal processing
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 7
- 239000002184 metal Substances 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 2
- 238000005336 cracking Methods 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17352380A JPS5796551A (en) | 1980-12-09 | 1980-12-09 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17352380A JPS5796551A (en) | 1980-12-09 | 1980-12-09 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5796551A true JPS5796551A (en) | 1982-06-15 |
| JPS6258542B2 JPS6258542B2 (enrdf_load_html_response) | 1987-12-07 |
Family
ID=15962097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17352380A Granted JPS5796551A (en) | 1980-12-09 | 1980-12-09 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5796551A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60120539A (ja) * | 1983-11-30 | 1985-06-28 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 導電体パタ−ンの形成方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5394184A (en) * | 1977-01-28 | 1978-08-17 | Fujitsu Ltd | Pattern forming method by lift-off |
-
1980
- 1980-12-09 JP JP17352380A patent/JPS5796551A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5394184A (en) * | 1977-01-28 | 1978-08-17 | Fujitsu Ltd | Pattern forming method by lift-off |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60120539A (ja) * | 1983-11-30 | 1985-06-28 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 導電体パタ−ンの形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6258542B2 (enrdf_load_html_response) | 1987-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5240969A (en) | Process for production of semiconductor device | |
| JPS5796551A (en) | Manufacture of semiconductor device | |
| JPS57157249A (en) | Preparation of optical exposure mask | |
| JPS5591130A (en) | Production of semiconductor device | |
| JPS54103694A (en) | Production of transparent conductive film patterns of liquid crystal panel | |
| JPS5559741A (en) | Preparation of semiconductor device | |
| JPS642339A (en) | Manufacture of semiconductor device | |
| JPS5568655A (en) | Manufacturing method of wiring | |
| JPS5493971A (en) | Production of semiconductor device | |
| JPS5493970A (en) | Patttern forming method of multi-layer metallic thin film | |
| JPS5492179A (en) | Removing method for photo resist film | |
| JPS559415A (en) | Semiconductor manufacturing method | |
| JPS5797629A (en) | Manufacture of semiconductor device | |
| JPS5679451A (en) | Production of semiconductor device | |
| JPS5329673A (en) | Production of semiconductor device | |
| JPS5483771A (en) | Manufacture of semiconductor device | |
| JPS6484224A (en) | Electrode forming method | |
| JPS5492265A (en) | Production of thermal head | |
| JPS55130148A (en) | Forming method of bump electrode | |
| JPS53112673A (en) | Mask alignment method in semiconductor device manufacturing process and photo mask used for its execution | |
| JPS57128033A (en) | Forming method for electrode wire of semiconductor device | |
| JPS5494880A (en) | Circuit pattern forming method of semiconductor device | |
| JPS5226169A (en) | Photoetching method of silicone oxide layer | |
| JPS5544767A (en) | Formation of electrode pattern | |
| JPS5585030A (en) | Forming method for electrode of semiconductor device |