JPS54103694A - Production of transparent conductive film patterns of liquid crystal panel - Google Patents

Production of transparent conductive film patterns of liquid crystal panel

Info

Publication number
JPS54103694A
JPS54103694A JP1090078A JP1090078A JPS54103694A JP S54103694 A JPS54103694 A JP S54103694A JP 1090078 A JP1090078 A JP 1090078A JP 1090078 A JP1090078 A JP 1090078A JP S54103694 A JPS54103694 A JP S54103694A
Authority
JP
Japan
Prior art keywords
liquid crystal
transparent conductive
production
reduction
equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1090078A
Other languages
Japanese (ja)
Inventor
Yoshinori Tokai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Epson Corp
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK, Epson Corp filed Critical Seiko Epson Corp
Priority to JP1090078A priority Critical patent/JPS54103694A/en
Publication of JPS54103694A publication Critical patent/JPS54103694A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To achieve the reduction in the number of steps and the reduction in machines and equipment by printing organic matter of paste form on substrates in required patterns and drying and baking the same thereby forming transparent conductive films.
CONSTITUTION: Organic material 5 of paste form containing In, Sn is screen-printed through a mask formed with required patterns on substrates, e.g., glass substrates 1, which are opposedly disposed by way of liquid crystal, and the material 5 is oxidized by drying and baking at high temperature, whereby the transparent electrode films 2 mainly composed of In2O3 are formed. In this way, the electrode production processes are considerably reduced. For the production equipment, the need for etching apparatus, resist peeling apparatus, etc. is eliminated and the reduction of equipment may thus be achieved.
COPYRIGHT: (C)1979,JPO&Japio
JP1090078A 1978-02-01 1978-02-01 Production of transparent conductive film patterns of liquid crystal panel Pending JPS54103694A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1090078A JPS54103694A (en) 1978-02-01 1978-02-01 Production of transparent conductive film patterns of liquid crystal panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1090078A JPS54103694A (en) 1978-02-01 1978-02-01 Production of transparent conductive film patterns of liquid crystal panel

Publications (1)

Publication Number Publication Date
JPS54103694A true JPS54103694A (en) 1979-08-15

Family

ID=11763168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1090078A Pending JPS54103694A (en) 1978-02-01 1978-02-01 Production of transparent conductive film patterns of liquid crystal panel

Country Status (1)

Country Link
JP (1) JPS54103694A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993445A (en) * 1982-11-19 1984-05-29 Hitachi Ltd Composition for forming oxidized metallic film and formation of oxidized metallic film using said composition
JPH01223429A (en) * 1988-03-02 1989-09-06 Sharp Corp Production of active matrix type liquid crystal display device
JP2016021269A (en) * 2015-11-05 2016-02-04 株式会社ジャパンディスプレイ Method for manufacturing touch panel
JP2017126366A (en) * 2017-03-28 2017-07-20 株式会社ジャパンディスプレイ Method for manufacturing touch panel employing electrostatic capacity coupling system
US9952710B2 (en) 2008-04-22 2018-04-24 Japan Display Inc. Display device with touch panel that provides suppression of reduction characteristics of the display device
JP2021061073A (en) * 2021-01-25 2021-04-15 株式会社ジャパンディスプレイ Method for manufacturing a touch panel of electrostatic capacitive coupling system
JP2022019967A (en) * 2021-01-25 2022-01-27 株式会社ジャパンディスプレイ Method for manufacturing a touch panel of electrostatic capacitive coupling system

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993445A (en) * 1982-11-19 1984-05-29 Hitachi Ltd Composition for forming oxidized metallic film and formation of oxidized metallic film using said composition
JPH01223429A (en) * 1988-03-02 1989-09-06 Sharp Corp Production of active matrix type liquid crystal display device
US9952710B2 (en) 2008-04-22 2018-04-24 Japan Display Inc. Display device with touch panel that provides suppression of reduction characteristics of the display device
US10168828B2 (en) 2008-04-22 2019-01-01 Japan Display Inc. Display device with touch panel
US10719166B2 (en) 2008-04-22 2020-07-21 Japan Display Inc. Manufacturing method of touch panel
JP2016021269A (en) * 2015-11-05 2016-02-04 株式会社ジャパンディスプレイ Method for manufacturing touch panel
JP2017126366A (en) * 2017-03-28 2017-07-20 株式会社ジャパンディスプレイ Method for manufacturing touch panel employing electrostatic capacity coupling system
JP2021061073A (en) * 2021-01-25 2021-04-15 株式会社ジャパンディスプレイ Method for manufacturing a touch panel of electrostatic capacitive coupling system
JP2022019967A (en) * 2021-01-25 2022-01-27 株式会社ジャパンディスプレイ Method for manufacturing a touch panel of electrostatic capacitive coupling system

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