JPS6258542B2 - - Google Patents

Info

Publication number
JPS6258542B2
JPS6258542B2 JP55173523A JP17352380A JPS6258542B2 JP S6258542 B2 JPS6258542 B2 JP S6258542B2 JP 55173523 A JP55173523 A JP 55173523A JP 17352380 A JP17352380 A JP 17352380A JP S6258542 B2 JPS6258542 B2 JP S6258542B2
Authority
JP
Japan
Prior art keywords
photoresist
metal film
heat treatment
minutes
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55173523A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5796551A (en
Inventor
Koichi Higuchi
Masaaki Oohira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP17352380A priority Critical patent/JPS5796551A/ja
Publication of JPS5796551A publication Critical patent/JPS5796551A/ja
Publication of JPS6258542B2 publication Critical patent/JPS6258542B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP17352380A 1980-12-09 1980-12-09 Manufacture of semiconductor device Granted JPS5796551A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17352380A JPS5796551A (en) 1980-12-09 1980-12-09 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17352380A JPS5796551A (en) 1980-12-09 1980-12-09 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5796551A JPS5796551A (en) 1982-06-15
JPS6258542B2 true JPS6258542B2 (enrdf_load_html_response) 1987-12-07

Family

ID=15962097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17352380A Granted JPS5796551A (en) 1980-12-09 1980-12-09 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5796551A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4539222A (en) * 1983-11-30 1985-09-03 International Business Machines Corporation Process for forming metal patterns wherein metal is deposited on a thermally depolymerizable polymer and selectively removed

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394184A (en) * 1977-01-28 1978-08-17 Fujitsu Ltd Pattern forming method by lift-off

Also Published As

Publication number Publication date
JPS5796551A (en) 1982-06-15

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