JPS5394184A - Pattern forming method by lift-off - Google Patents

Pattern forming method by lift-off

Info

Publication number
JPS5394184A
JPS5394184A JP900277A JP900277A JPS5394184A JP S5394184 A JPS5394184 A JP S5394184A JP 900277 A JP900277 A JP 900277A JP 900277 A JP900277 A JP 900277A JP S5394184 A JPS5394184 A JP S5394184A
Authority
JP
Japan
Prior art keywords
lift
forming method
pattern forming
resist
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP900277A
Other languages
Japanese (ja)
Inventor
Sumio Yamamoto
Koichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP900277A priority Critical patent/JPS5394184A/en
Publication of JPS5394184A publication Critical patent/JPS5394184A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To facilitate permeation of solvent and remove unnecessary resist by depositing a metal film after the formation of resist patterns and making cracks by heating the resist at a temperature above specified temperature.
COPYRIGHT: (C)1978,JPO&Japio
JP900277A 1977-01-28 1977-01-28 Pattern forming method by lift-off Pending JPS5394184A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP900277A JPS5394184A (en) 1977-01-28 1977-01-28 Pattern forming method by lift-off

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP900277A JPS5394184A (en) 1977-01-28 1977-01-28 Pattern forming method by lift-off

Publications (1)

Publication Number Publication Date
JPS5394184A true JPS5394184A (en) 1978-08-17

Family

ID=11708452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP900277A Pending JPS5394184A (en) 1977-01-28 1977-01-28 Pattern forming method by lift-off

Country Status (1)

Country Link
JP (1) JPS5394184A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796551A (en) * 1980-12-09 1982-06-15 Nec Corp Manufacture of semiconductor device
JPS57193036A (en) * 1981-05-22 1982-11-27 Nippon Telegr & Teleph Corp <Ntt> Forming and treating method for pattern by lifting-off method
JPS57193037A (en) * 1981-05-22 1982-11-27 Nippon Telegr & Teleph Corp <Ntt> Forming and treating method for pattern by lifting-off method
JPS60120539A (en) * 1983-11-30 1985-06-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of forming conductor pattern
JP2008078631A (en) * 2006-08-25 2008-04-03 Fujifilm Corp Method of forming pattern of inorganic material film and structure

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5796551A (en) * 1980-12-09 1982-06-15 Nec Corp Manufacture of semiconductor device
JPS6258542B2 (en) * 1980-12-09 1987-12-07 Nippon Electric Co
JPS57193036A (en) * 1981-05-22 1982-11-27 Nippon Telegr & Teleph Corp <Ntt> Forming and treating method for pattern by lifting-off method
JPS57193037A (en) * 1981-05-22 1982-11-27 Nippon Telegr & Teleph Corp <Ntt> Forming and treating method for pattern by lifting-off method
JPH0159736B2 (en) * 1981-05-22 1989-12-19 Nippon Telegraph & Telephone
JPS60120539A (en) * 1983-11-30 1985-06-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of forming conductor pattern
JPH0234454B2 (en) * 1983-11-30 1990-08-03 Intaanashonaru Bijinesu Mashiinzu Corp
JP2008078631A (en) * 2006-08-25 2008-04-03 Fujifilm Corp Method of forming pattern of inorganic material film and structure

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