JPS5783474A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS5783474A
JPS5783474A JP15995380A JP15995380A JPS5783474A JP S5783474 A JPS5783474 A JP S5783474A JP 15995380 A JP15995380 A JP 15995380A JP 15995380 A JP15995380 A JP 15995380A JP S5783474 A JPS5783474 A JP S5783474A
Authority
JP
Japan
Prior art keywords
layer
thermal head
thin film
heat impact
resistance layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15995380A
Other languages
Japanese (ja)
Inventor
Akihiko Kawachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP15995380A priority Critical patent/JPS5783474A/en
Publication of JPS5783474A publication Critical patent/JPS5783474A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a thermal head which is highly reliable at a high speed and indestructible by a method wherein a protective layer is provided on the upper surface of a thin film resistance layer and a heat impact relaxing layer is fixed between said thin film resistance layer and the protective layer.
CONSTITUTION: A glass-glazing layer 2 is provided on an alumina substrate 1, on which a thin film heating resistance layer 3 is formed and, moreover, a lead electrode 4 is patterned by vacuum deposition, photoetching. Besides, after the protective layer 5 is provided by spattering, Ta2O5, Al2O3, etc. is formed by spattering to prepare a heat impact relaxing layer 7 and, moreover, a wear-proof layer 6 is provided to form a thermal head. When a heating resistance layer 3 is of Ta2N or Ta-Si, a heat impact relaxing layer can be formed by anode oxidation or thermal oxidation. This thermal head has a high reliability at a high speed and is useful as a recording head of facsimile or the like.
COPYRIGHT: (C)1982,JPO&Japio
JP15995380A 1980-11-13 1980-11-13 Thermal head Pending JPS5783474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15995380A JPS5783474A (en) 1980-11-13 1980-11-13 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15995380A JPS5783474A (en) 1980-11-13 1980-11-13 Thermal head

Publications (1)

Publication Number Publication Date
JPS5783474A true JPS5783474A (en) 1982-05-25

Family

ID=15704766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15995380A Pending JPS5783474A (en) 1980-11-13 1980-11-13 Thermal head

Country Status (1)

Country Link
JP (1) JPS5783474A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61229571A (en) * 1985-04-05 1986-10-13 Hitachi Ltd Electrode construction for thermal recording head
JP2005313591A (en) * 2003-10-17 2005-11-10 Kyocera Corp Thermal head and thermal printer using the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456453A (en) * 1977-10-13 1979-05-07 Canon Inc Thermal head for thermal recorders
JPS5539383A (en) * 1978-09-14 1980-03-19 Toshiba Corp Thermal head
JPS55126468A (en) * 1979-03-24 1980-09-30 Tamura Electric Works Ltd Thermal recording head

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456453A (en) * 1977-10-13 1979-05-07 Canon Inc Thermal head for thermal recorders
JPS5539383A (en) * 1978-09-14 1980-03-19 Toshiba Corp Thermal head
JPS55126468A (en) * 1979-03-24 1980-09-30 Tamura Electric Works Ltd Thermal recording head

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61229571A (en) * 1985-04-05 1986-10-13 Hitachi Ltd Electrode construction for thermal recording head
JP2005313591A (en) * 2003-10-17 2005-11-10 Kyocera Corp Thermal head and thermal printer using the same
JP4522183B2 (en) * 2003-10-17 2010-08-11 京セラ株式会社 Thermal head and thermal printer using the same

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