JPS5831779A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS5831779A
JPS5831779A JP56129684A JP12968481A JPS5831779A JP S5831779 A JPS5831779 A JP S5831779A JP 56129684 A JP56129684 A JP 56129684A JP 12968481 A JP12968481 A JP 12968481A JP S5831779 A JPS5831779 A JP S5831779A
Authority
JP
Japan
Prior art keywords
layer
heat
oxide film
thermal head
resistant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56129684A
Other languages
Japanese (ja)
Inventor
Tadahisa Inoue
井上 忠久
Yoshihiko Sato
佐藤 恵彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56129684A priority Critical patent/JPS5831779A/en
Publication of JPS5831779A publication Critical patent/JPS5831779A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads

Abstract

PURPOSE:To obtain a thermal head having excellent heat response characteristic by forming a conductor layer serving as a heat transmission layer on an alumina base plate provided with graze and also an oxide film serving as a heat-shock resistant layer on the surface of the conductor layer. CONSTITUTION:Ta, Ti, Hf, Zr, etc., are adhered onto an alumina base plate 21 provided with a graze 1 by sputtering, vapor deposition, etc., and then an oxide film 3 is formed on the surface of the thin film of Ta, etc., by a heat oxidation or anodic oxidation method, etc. The oxide film 3 plays a role of a heat shock- resistant layer to protect the heat storage layer when patterning and etching a heating material. A metal layer 6 staying without being oxidized below the oxide film 3 has a function as a heat transmission layer by which the cooling effect of the heating material is raised and also the distribution of heat is equalized. On the oxide film 3, a heating resistor layer 4, an electrode conductor layer, and a wear-resistant layer 5 are formed.

Description

【発明の詳細な説明】 本発明ぼサーマルヘッドに関する。[Detailed description of the invention] The present invention relates to a thermal head.

情報化社会の進展に伴い、情報伝達の迅速化、省力化の
ためあるいはオフィス業務の合理化にファクシミリは急
速に普及しており、市場規模も年率20−以上で成長し
ている。
With the advancement of the information society, facsimiles are rapidly becoming popular for speeding up information transmission, saving labor, and rationalizing office operations, and the market size is growing at an annual rate of more than 20%.

7アクシIKは、静電記録、電解記録、放電破壊配置、
インクジェット記録、感熱記録、レーザ記録等の各種の
方式が実用されており、それぞれ一長一短がある。この
中で感熱記録は現儂定着が不要なので即時性があり、機
構が簡単で高信頼であり保守も容易な特長を有すること
から汎用ファクシ叱り装置に適している。
7Axi IK is electrostatic recording, electrolytic recording, discharge breakdown arrangement,
Various methods such as inkjet recording, thermal recording, and laser recording are in use, and each has advantages and disadvantages. Among these, thermal recording is suitable for general-purpose facsimile machines because it is instantaneous because it does not require in-house fixing, has a simple mechanism, is highly reliable, and is easy to maintain.

これ迄高解儂度、高速駆動を行なうような高級機には、
静電記録方式が使用されていたが、この種の装置にも感
熱記録方式が適用されはじめ【来ている。しかも高速性
、低消費電力、高品位記録を達成でき静電記録方式に匹
敵する記録を得るには薄膜型感熱記録方式が適している
Up until now, high-end machines with high resolution and high-speed drive,
An electrostatic recording method was used, but a thermal recording method is also beginning to be applied to this type of device. Moreover, the thin film type thermosensitive recording method is suitable for achieving high speed, low power consumption, and high quality recording, and for obtaining recording comparable to the electrostatic recording method.

従来、この種の薄膜型感熱記録方式に用いられる感熱ヘ
ッドの断面構造例は第1図に示すようなものであった。
Conventionally, an example of the cross-sectional structure of a thermal head used in this type of thin film type thermal recording system is as shown in FIG.

約80μm厚程度のグレーズ1を施したアルミナセラミ
ック基板11上にはSi2゜からなる耐熱シ胃ツク層2
とTJIIOIからなる耐エツチング層3が積層されて
いる。この耐熱シ曽、り層2は発熱体の動作時における
熱衝撃が、熱的3弱い冑熱グレーズ層へ直接伝わるのを
、810゜膜を介することによって緩和している。該基
板上にさらK例えば8ドツト/!oIの線密度でTa−
8I系の発熱抵抗体層4を形成し、耐摩耗層5として耐
酸化保護を兼ねたSingと8iCを積層している。
On an alumina ceramic substrate 11 coated with a glaze 1 having a thickness of about 80 μm, a heat-resistant resistant layer 2 made of Si2° is disposed.
An etching-resistant layer 3 made of and TJIIOI is laminated. This heat-resistant aluminum layer 2 alleviates direct transmission of thermal shock during operation of the heating element to the thermally weak glaze layer through the 810° film. For example, 8 dots/! on the substrate. Ta- with linear density of oI
An 8I-based heating resistor layer 4 is formed, and a wear-resistant layer 5 is formed by laminating Sing, which also serves as oxidation protection, and 8iC.

かへる従来の感熱ヘッドに於て、高速駆動を行な5場合
発熱体で発生した熱の大部分は熱伝導率の低い蓄熱グレ
ーズ層1に蓄積され基板11@には伝導しないため前記
発熱体にかなりの温度上昇が生じて冷却に長時間を要す
る現象、即ち尾引き現象を引き起こし、記録すべき感熱
紙の印字部分の解儂度が態化するとともに濃度ムラ等に
より画品質が障なわれる。そのため駆動条件とじ【はパ
ルス幅2 m5ec、周期10m5ec高速化が限界で
あった。従っ【本発明の目的は、より高速駆動を可能に
し、高速ファクシミリを実現するための感熱へ、ドな提
供することにある。
In conventional thermal heads, when driven at high speed, most of the heat generated by the heating element is accumulated in the heat storage glaze layer 1, which has low thermal conductivity, and is not conducted to the substrate 11. A considerable temperature rise occurs in the body, causing a phenomenon that requires a long time to cool down, that is, a trailing phenomenon, which causes the degree of decomposition of the printed part of the thermal paper to be recorded to change, and the image quality is impaired due to density unevenness, etc. be exposed. Therefore, the driving conditions were limited to a pulse width of 2 m5 ec and a cycle of 10 m5 ec. Therefore, an object of the present invention is to provide a heat-sensitive device that enables higher-speed driving and realizes high-speed facsimile.

本発明は、アルミナセラミ、り基板上に施したグV−ズ
上全面に直i薄い導体層をスパッタリング法、蒸着法等
の手段により付着させ、その後熱酸化、陽極酸化等の方
法により該導体層の表向に酸化膜を形成するととくより
、誼酸化膜が耐熱シ璽ツク層を兼ねると同時に下層の導
体層が熱伝層として機能して発熱体の冷却効率を高める
とともに熱分布を均一にし、熱応答特性を改善すること
に特徴を有する。
In the present invention, a thin conductor layer is directly deposited on the entire surface of a glass V-shaped layer formed on an alumina ceramic substrate by means such as sputtering or vapor deposition, and then the conductor is deposited by a method such as thermal oxidation or anodic oxidation. By forming an oxide film on the surface of the layer, the oxide film doubles as a heat-resistant seal layer, and at the same time, the underlying conductor layer functions as a heat transfer layer, increasing the cooling efficiency of the heating element and ensuring uniform heat distribution. It is characterized by improved thermal response characteristics.

以下本発明の一実施例を図面を参照して説明する。An embodiment of the present invention will be described below with reference to the drawings.

第2図は、本発明による感熱ヘッドの断面構造の実施例
を示したものである。約8μm厚程度のブレース1を施
したアルミナ基板21上に、スパッタリング法、蒸着法
等により約1000ATaを付着させる0次に大気中で
500C11時間の熱酸化を行ない、約500〜700
AのTa、01膜3を形成する。この酸化膜は、発熱体
のパターン化工、チング時に蒸熱層を保護するためと、
耐熱シ嘗ツク層としての役割を果す。上記熱酸化により
酸化されずに残っている下層のTa層6は中種皮の熱伝
導層として機能し、発熱体の駆動時に生ずる残留温度を
即かに低下させ、しかも無印字状態での発熱体の温度の
均一化を図り熱応答特性を改善する。
FIG. 2 shows an embodiment of the cross-sectional structure of a thermal head according to the present invention. Approximately 1,000 ATa is deposited on the alumina substrate 21 on which the brace 1 with a thickness of approximately 8 μm has been applied by sputtering, vapor deposition, etc. Next, thermal oxidation is performed at 500C for 11 hours in the air to obtain approximately 500 to 700
A Ta,01 film 3 of A is formed. This oxide film is used to protect the vapor layer during patterning and heating of the heating element.
Acts as a heat-resistant thick layer. The lower Ta layer 6 that remains unoxidized by the thermal oxidation functions as a heat conductive layer of the seed coat, and immediately lowers the residual temperature that occurs when the heating element is driven. Improve the thermal response characteristics by making the temperature uniform.

従って従来の感熱ヘッドで必要としたs量へ力ちなる耐
熱シ欝ツク層2を省略することができる利点をも有する
。その後の発熱抵抗層4、電極導体層、耐摩耗層5の形
成は従来の感熱ヘッドと同等のプロセスによる。
Therefore, it has the advantage that the heat-resistant shock layer 2, which reduces the amount of s required in conventional thermal heads, can be omitted. The subsequent formation of the heat generating resistor layer 4, electrode conductor layer, and abrasion resistant layer 5 is performed by the same process as that of a conventional thermal head.

以上の本発明による感熱ヘッドは、以下に説明する効果
を有する。ファクシミリの高蓮化は、パルス幅、周期共
に短かくするととKより達せられるが、この事はパルス
幅が短かくなる和、同一発色濃度を得るために高い印゛
加電力を必要とすることを意味する。しかも発熱体で発
生した熱の大部分は蓄熱グレーズ層1に蓄積されて基板
側に伝導しないため従来の感熱ヘッド構造に於ては残留
温度のかなりの温度上昇、不均一性が生じ高速化の障害
となっていた。
The thermal head according to the present invention described above has the effects described below. A high density facsimile machine can be achieved by shortening both the pulse width and period, but this means that a higher applied power is required to obtain the same color density as the pulse width becomes shorter. means. Moreover, most of the heat generated by the heating element is accumulated in the heat storage glaze layer 1 and is not conducted to the substrate side, so in the conventional thermal head structure, the residual temperature increases considerably and becomes non-uniform, which makes it difficult to increase the speed. It was a hindrance.

第3図は、発熱体にバ〃ス幅tpt’電力を印加した場
合の定性的な温度特性を示す。パルス周期の影響による
過渡的な発熱体の表両温度TACIsビーク温度TP 
パルス周期により次の印加パルスの際に過渡的な発熱体
の表面温度とし【残る残留温度TAC”が代表的な温度
水準である。図中点線は従来の感熱ヘッド構造の温度特
性である。
FIG. 3 shows qualitative temperature characteristics when a bus width tpt' power is applied to the heating element. Transient heating element temperature TACIs peak temperature TP due to the influence of pulse period
Depending on the pulse period, the surface temperature of the heating element is transient at the time of the next applied pulse, and the remaining residual temperature TAC is a typical temperature level.The dotted line in the figure is the temperature characteristic of the conventional thermal head structure.

本発明の感熱ヘッド構造によれば、発熱体で発生した熱
はTa層を通してより高速に広い面積で拡散していき、
しかも残留温度は均一となる。従って高速駆動に伴5印
加電力の増大による発熱抵抗体の信頼性を障なうことな
り、シかも残留温度の影響による濃度ムラとして記録さ
れる画品質を障なうことなく、例えばパルス幅1 m 
sec、パルス周期5ms@cでの高速印字が可能とな
った。第3図実線は本発明による感熱ヘッドの温度特性
であり、従来の感熱ヘッドと比較して熱応答特性が改善
され【いることがわかる。
According to the thermal head structure of the present invention, the heat generated by the heating element diffuses through the Ta layer at a higher speed and over a wider area.
Moreover, the residual temperature becomes uniform. Therefore, the reliability of the heating resistor is affected by the increase in applied power due to high-speed driving, and the image quality recorded as density unevenness due to the influence of residual temperature is not affected, for example, the pulse width is 1. m
sec, and high-speed printing with a pulse period of 5 ms@c is now possible. The solid line in FIG. 3 shows the temperature characteristics of the thermal head according to the present invention, and it can be seen that the thermal response characteristics are improved compared to the conventional thermal head.

以上に記述した実施例ははんの一例にすぎず、例えば本
発明において引例したTa薄膜は、他の類似の特性を有
する薄膜、例えばTi、 Hf、 Nb。
The embodiments described above are only examples of materials; for example, the Ta thin film cited in the present invention may be replaced with other thin films having similar properties, such as Ti, Hf, Nb.

Zrあるいは腋金属間の化合物、皺金属と窒素、酸素、
シリコン、アルミニクム等の他の元素との化合物等であ
ってもよいことは勿論であり、また付着方法も真空蒸着
法、スパッタリングは、活性スパッタリング法等があり
、特に限定されるべきものではない。これらの薄膜から
なる酸化物層の形成方法としては熱酸化法のみならず、
陽極酸化法、プラズマ酸化法を用いてもよいことは当然
である。前記薄膜を付着すべき基板も特に限定されるべ
きものではなく、アルミナ基板上K SIC,Ta2へ
1人1.0.等の絶縁層を蒸熱層として形成してもよく
、また咳絶縁層がない場合であっても本発明の効果は特
に損なわれるものでもないことは論を待たない。
Compounds between Zr or armpit metals, wrinkled metals and nitrogen, oxygen,
It goes without saying that it may be a compound with other elements such as silicon or aluminum, and the deposition method may include vacuum evaporation, active sputtering, etc., and is not particularly limited. Methods for forming oxide layers consisting of these thin films include not only thermal oxidation methods, but also
It goes without saying that an anodic oxidation method and a plasma oxidation method may be used. The substrate to which the thin film is to be attached is not particularly limited, and one person deposits KSIC, Ta2 on an alumina substrate at a rate of 1.0. It goes without saying that the effects of the present invention will not be particularly impaired even if there is no cough insulation layer.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の感熱へ、ドを示す断面図である。 第2図は本発明の実施例の感熱ヘッドを示す断面図であ
る。第3図は、従来と本発明の感熱ヘッドの温度特性例
を示す。 尚、図において、lはグレーズ、2は耐熱シ1、り層、
3は耐エツチング層、4は発熱抵抗体層、5は耐摩耗層
、6はタンタル層、11はアルミナセラミック基板、2
1はアルミナ基板である。
FIG. 1 is a sectional view showing a conventional heat sensitive device. FIG. 2 is a sectional view showing a thermal head according to an embodiment of the present invention. FIG. 3 shows examples of temperature characteristics of the conventional thermal head and the present invention. In the figure, l is the glaze, 2 is the heat-resistant layer 1,
3 is an etching-resistant layer, 4 is a heating resistor layer, 5 is a wear-resistant layer, 6 is a tantalum layer, 11 is an alumina ceramic substrate, 2
1 is an alumina substrate.

Claims (1)

【特許請求の範囲】 絶縁性基板と、該基板上に付着され而も少なくトモタン
タル、チタン、ハ7ニクム、ジルコニウム等の離溶性金
属を含む薄膜と、該薄膜上に積層された酸化物層と、該
酸化物層上に積層された発熱抵抗体とを含むことを特徴
とするサーマルへ。 ド。
[Scope of Claims] An insulating substrate, a thin film containing a releasable metal such as tomo tantalum, titanium, honeycomb, and zirconium attached to the substrate, and an oxide layer laminated on the thin film. , and a heating resistor laminated on the oxide layer. Do.
JP56129684A 1981-08-19 1981-08-19 Thermal head Pending JPS5831779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56129684A JPS5831779A (en) 1981-08-19 1981-08-19 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56129684A JPS5831779A (en) 1981-08-19 1981-08-19 Thermal head

Publications (1)

Publication Number Publication Date
JPS5831779A true JPS5831779A (en) 1983-02-24

Family

ID=15015615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56129684A Pending JPS5831779A (en) 1981-08-19 1981-08-19 Thermal head

Country Status (1)

Country Link
JP (1) JPS5831779A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11394285B2 (en) 2019-05-31 2022-07-19 Minebea Mitsumi Inc. Vibration actuator and electronic device
US11418099B2 (en) 2018-08-28 2022-08-16 Minebea Mitsumi Inc. Vibration actuator and electronic equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11418099B2 (en) 2018-08-28 2022-08-16 Minebea Mitsumi Inc. Vibration actuator and electronic equipment
US11444524B2 (en) 2018-08-28 2022-09-13 Minebea Mitsumi Inc. Vibration actuator and electronic equipment
US11515775B2 (en) 2018-08-28 2022-11-29 Minebea Mitsumi Inc. Vibration actuator and electronic equipment
US11394285B2 (en) 2019-05-31 2022-07-19 Minebea Mitsumi Inc. Vibration actuator and electronic device

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